Maintenance Plus 1

Nail Tek

Where to buy Possibly in stock

About this product

The Nail Tek Maintenance Plus 1 is a misc. Our analysis of its 16 ingredients (9 low-risk) rates it Great (77/100). Based on its ingredients, it looks well-suited to oily / acne-prone skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
16
Low-risk
9
Fragrance
Fragrance-free
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 0/6
Caution for dry skin
Nitrocellulose Acrylates Copolymer Alcohol Denat. Formaldehyde Camphor n-Butyl Alcohol
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Alcohol Denat.
Sensitive Skin 1/7
Good for sensitive skin
Camphor
Caution for sensitive skin
Butyl Acetate Ethyl Acetate Isopropyl Alcohol Alcohol Denat. Formaldehyde Camphor n-Butyl Alcohol

Ingredients list

16 total
Lower hazard (1) Higher hazard (10)
All16 Plasticizer7 Film Forming6 Solvent5 Fragrance4 Perfuming3 Denaturant3 Antistatic Agent3 Masking3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Ethyl Acetate
(Fragrance, Solvent, Perfuming)
4
Alcohol Denat.
(Antifoaming Agent, Antimicrobial, Astringent, Masking, Solvent, Viscosity Controlling)
Bad for Dry Skin
Bad for Dry Skin
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Butyl Acetate
(Fragrance, Solvent, Masking)
1
Nitrocellulose
(Film Forming, Suspending Agent Nonsurfactant)
4
Tosylamide/Formaldehyde Resin
(Film Forming, Plasticizer)
2
B
Acrylates Copolymer
(Adhesive, Artificial Nail Builder, Binding Agent, Film Forming, Hair Fixing, Suspending Agent Nonsurfactant, Antistatic Agent, Binding)
5
Triphenyl Phosphate
(Plasticizer)
2
Trimethyl Pentanyl Diisobutyrate
(Plasticizer)
2
A
Isopropyl Alcohol
(Antifoaming Agent, Fragrance, Solvent, Viscosity Decreasing Agent, Perfuming, Viscosity Controlling)
Bad for Sensitive Skin
Bad for Sensitive Skin
3
4
n-Butyl Alcohol
(Denaturant, Perfuming, Solvent)
10
Formaldehyde
(Cosmetic Biocide, Denaturant, Preservative)
2
Camphor
(Denaturant, External Analgesic, Fragrance, Plasticizer, Masking)
Good for Oily Skin
Good for Oily Skin
4
A
Benzophenone-1
(Uv Absorber)
1
B
Hydrolyzed Wheat Protein
(Film Forming, Hair Conditioning, Skin Conditioning, Antistatic Agent)
1
Calcium Pantothenate
(Antistatic Agent, Hair Conditioning)
4
CI 60725
(Colorant, Cosmetic Colorant)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Alcohol Denat.
Astringent
Benzophenone-1
Uv Absorber
Hydrolyzed Wheat Protein
Skin Conditioning

Benefits

Fungal-acne (Malassezia) safe
Good for oily/acne-prone skin

Concerns

Formaldehyde — higher EWG
May not suit dry skin
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Ethyl Acetate
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 FragranceSolventPerfuming
Butyl Acetate
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSolventMasking
Nitrocellulose
Film forming, Suspending agent - nonsurfactant
Low-hazard ingredient.Read moreShow less
EWG 1 Film formingSuspending agent - nonsurfactant
Tosylamide/Formaldehyde Resin
Film forming, Plasticizer
Low-to-moderate hazard.Read moreShow less
EWG 4 Film formingPlasticizer
Acrylates Copolymer
Adhesive, Artificial nail builder
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B AdhesiveArtificial nail builderBinding agentFilm formingHair fixingSuspending agent -nonsurfactantAntistatic agentBinding
Trimethyl Pentanyl Diisobutyrate
Plasticizer
Low-hazard ingredient.Read moreShow less
EWG 2 Plasticizer
n-Butyl Alcohol
Denaturant, Perfuming
Low-to-moderate hazard.Read moreShow less
EWG 3–4 DenaturantPerfumingSolvent
Benzophenone-1
Uv absorber
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A Uv absorber
Hydrolyzed Wheat Protein
Film forming, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Film formingHair conditioningSkin conditioningAntistatic agent
Calcium Pantothenate
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Antistatic agentHair conditioning
CI 60725
Colorant, Cosmetic colorant
Low-to-moderate hazard.Read moreShow less
EWG 4 ColorantCosmetic colorant
Alcohol Denat.
Antifoaming agent, Antimicrobial
Causes moisture evaporation - prone to dry out skinRead moreShow less
EWG 4 Antifoaming agentAntimicrobialAstringentMaskingSolventViscosity controlling Bad for Dry SkinBad for Sensitive Skin
Triphenyl Phosphate
Plasticizer
Moderate-hazard ingredient.Read moreShow less
EWG 5 Plasticizer
Isopropyl Alcohol
Antifoaming agent, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Antifoaming agentFragranceSolventViscosity decreasing agentPerfumingViscosity controlling Bad for Sensitive Skin
Formaldehyde
Cosmetic biocide, Denaturant
Higher-hazard ingredient.Read moreShow less
EWG 10 Cosmetic biocideDenaturantPreservative
Camphor
Denaturant, External analgesic
Low-hazard ingredient.Read moreShow less
EWG 2 DenaturantExternal analgesicFragrancePlasticizerMasking Good for Oily Skin

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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