Light Reflecting Makeup Setting Mist

NARS Cosmetics

Light Reflecting Makeup Setting Mist

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About this product

The NARS Cosmetics Light Reflecting Makeup Setting Mist is a misc. Our analysis of its 15 ingredients (14 low-risk) rates it Excellent (100/100). Based on its ingredients, it looks well-suited to dry skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
15
Low-risk
14
Fragrance
Fragrance-free
Origin
France

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe Minimal Ingredients

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 3/1
Good for dry skin
Camellia Japonica Flower Extract Butylene Glycol Glycerin
Caution for dry skin
Glycerin
Oily/Acne-Prone Skin No data
Sensitive Skin 2/4
Good for sensitive skin
Glycerin Hydroxyacetophenone
Caution for sensitive skin
Disodium Phosphate Butylene Glycol Glycerin Citric Acid

Ingredients list

15 total
Lower hazard (1) Higher hazard (2)
All15 Solvent6 Skin Conditioning6 Fragrance4 Humectant3 Masking3 Anticorrosive2 Viscosity Controlling2 Buffering Agent2
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
Polyimide-1
(Film Forming, Hair Fixing)
1
A
1,2-Hexanediol
(Solvent)
1
SpiruLina Maxima Extract
(Smoothing)
1
Portulaca Oleracea Extract
(Skin Conditioning)
1
Camellia Japonica Flower Extract
(Emollient, Skin Conditioning)
1
Moringa Oleifera Seed Extract
(Skin Conditioning)
Theobroma Cacao Seed Extract
(Antioxidant)
1
Hydroxyacetophenone
(Antioxidant)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
Propanediol
(Solvent, Viscosity Decreasing Agent, Viscosity Controlling)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
A
Pentylene Glycol
(Skin Conditioning, Solvent)
1
B
Disodium Phosphate
(Buffering Agent, Anticorrosive, Fragrance, Ph Adjuster, Masking)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Glycerin
Humectant, Skin Protecting
Portulaca Oleracea Extract
Skin Conditioning
Camellia Japonica Flower Extract
Emollient, Skin Conditioning
Moringa Oleifera Seed Extract
Skin Conditioning
Theobroma Cacao Seed Extract
Antioxidant
Hydroxyacetophenone
Antioxidant

Benefits

Good for dry skin

Concerns

Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Polyimide-1
Film forming, Hair fixing
Low-hazard ingredient.Read moreShow less
EWG 1 Film formingHair fixing
1,2-Hexanediol
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Solvent
SpiruLina Maxima Extract
Smoothing
Low-hazard ingredient.Read moreShow less
EWG 1 Smoothing
Portulaca Oleracea Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Camellia Japonica Flower Extract
Emollient, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 EmollientSkin conditioning
Moringa Oleifera Seed Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Theobroma Cacao Seed Extract
Antioxidant
Limited public safety data.Read moreShow less
EWG N/A Antioxidant
Hydroxyacetophenone
Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 Antioxidant
Propanediol
Solvent, Viscosity decreasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 SolventViscosity decreasing agentViscosity controlling
Pentylene Glycol
Skin conditioning, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningSolvent
Disodium Phosphate
Buffering agent, Anticorrosive
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Buffering agentAnticorrosiveFragrancePh adjusterMasking
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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