Ekos Murumuru Anti-Damage Shampoo

Natura

Ekos Murumuru Anti-Damage Shampoo

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About this product

The Natura Ekos Murumuru Anti-Damage Shampoo is a misc. Our analysis of its 32 ingredients (25 low-risk) rates it Excellent (88/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
32
Low-risk
25
Fragrance
Contains fragrance
Origin
Brazil

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 7/8
Good for dry skin
Glycol Distearate Sorbitol Astrocaryum Murumuru Seed Butter Glycerin Coconut Acid PEG-6 Caprylic/Capric Glycerides PEG-7 Glyceryl Cocoate
Caution for dry skin
Decyl Glucoside Sodium Cocoyl Isethionate Glycerin Coconut Acid Sodium Hydroxide PEG-6 Caprylic/Capric Glycerides PEG-7 Glyceryl Cocoate Laureth-4
Oily/Acne-Prone Skin No data
Sensitive Skin 2/12
Good for sensitive skin
Glycerin Hydroxyacetophenone
Caution for sensitive skin
Sodium Chloride Sorbitol Glycerin Citric Acid Benzoic Acid Sodium Benzoate Potassium Sorbate Linalool Limonene Benzyl Salicylate Coumarin Laureth-4

Ingredients list

32 total
Lower hazard (1) Higher hazard (7)
All32 Fragrance10 Masking8 Skin Conditioning8 Surfactant6 Emulsifying6 Viscosity Controlling5 Emollient5 Bulking Agent4
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
B
Sodium Cocoyl Isethionate
(Cleansing, Hair Conditioning, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
B
Decyl Glucoside
(Cleansing, Emulsion Stabilising, Surfactant)
4
B
Cocamidopropyl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
A
Coconut Acid
(Cleansing, Emollient, Emulsifying, Surfactant)
PARFUM
(Fragrance, Perfuming)
4
B
PEG-7 Glyceryl Cocoate
(Skin Conditioning, Emollient, Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
Acrylates/C10-30 Alkyl Acrylate Crosspolymer
(Emulsion Stabilising, Film Forming, Viscosity Controlling)
1
Hydroxyacetophenone
(Antioxidant)
1
A
Glycol Distearate
(Opacifying, Viscosity Increasing Agent, Emollient, Emulsifying, Skin Conditioning, Viscosity Controlling)
Fungal Acne
Fungal Acne Trigger
1
Sorbitol
(Flavoring Agent, Fragrance, Humectant, Plasticizer, Skin Conditioning)
3
A
Potassium Sorbate
(Fragrance, Preservative)
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
2
3
B
Laureth-4
(Antistatic Agent, Emulsifying, Masking, Surfactant)
Bad for Oily Skin
Bad for Oily Skin
1
A
Polyquaternium-10
(Antistatic Agent, Film Forming, Hair Fixing)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
3
B
Sodium Hydroxide
(Denaturant, Ph Adjuster, Buffering Agent)
1
A
Sodium Gluconate
(Chelating Agent, Skin Conditioning)
7
Benzyl Salicylate
(Fragrance, Uv Absorber, Masking)
Allergens
Allergens
5
Linalool
(Fragrance, Deodorant, Masking)
Allergens
Allergens
6
Limonene
(Deodorant, Perfuming, Solvent)
Allergens
Allergens
7
Coumarin
(Fragrance, Masking)
Allergens
Allergens
1
A
Astrocaryum Murumuru Seed Butter
(Emollient, Skin Conditioning)
3
A
Benzoic Acid
(Fragrance, Ph Adjuster, Preservative, Bulking Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
3
A
PEG-150 Pentaerythrityl Tetrastearate
(Viscosity Increasing Agent, Emulsifying)
3
B
PEG-6 Caprylic/Capric Glycerides
(Skin Conditioning, Emollient, Emulsifying, Surfactant)
1
A
Sodium Carbonate
(Ph Adjuster, Buffering Agent, Bulking Agent)
3
CI 19140
(Colorant, Cosmetic Colorant)
2
CI 15510
(Cosmetic Colorant)
1
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling)
1
B
Sodium Sulfate
(Viscosity Increasing Agent, Bulking Agent, Viscosity Controlling)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Cocamidopropyl Betaine
Skin Conditioning
Glycerin
Humectant, Skin Protecting
Coconut Acid
Emollient
PEG-7 Glyceryl Cocoate
Skin Conditioning, Emollient
Hydroxyacetophenone
Antioxidant
Glycol Distearate
Emollient, Skin Conditioning

Benefits

No standout benefits flagged for this product.

Concerns

Contains eu allergen
Not fungal acne (malassezia) safe
Benzyl Salicylate — higher EWG
Coumarin — higher EWG
May not suit dry skin
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Decyl Glucoside
Cleansing, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingEmulsion stabilisingSurfactant
Cocamidopropyl Betaine
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Coconut Acid
Cleansing, Emollient
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A CleansingEmollientEmulsifyingSurfactant
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Acrylates/C10-30 Alkyl Acrylate Crosspolymer
Emulsion stabilising, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 Emulsion stabilisingFilm formingViscosity controlling
Hydroxyacetophenone
Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 Antioxidant
Sorbitol
Flavoring agent, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 1 Flavoring agentFragranceHumectantPlasticizerSkin conditioning
Potassium Sorbate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservative
Sodium Benzoate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservativeAnticorrosiveMasking
Polyquaternium-10
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
Sodium Hydroxide
Denaturant, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B DenaturantPh adjusterBuffering agent
Sodium Gluconate
Chelating agent, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentSkin conditioning
Astrocaryum Murumuru Seed Butter
Emollient, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmollientSkin conditioning
PEG-150 Pentaerythrityl Tetrastearate
Viscosity increasing agent, Emulsifying
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Viscosity increasing agentEmulsifying
+ 6 more — see the full ingredients list above
Sodium Cocoyl Isethionate
Cleansing, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingHair conditioningSurfactant Fungal-acne trigger
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
PEG-7 Glyceryl Cocoate
Skin conditioning, Emollient
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Skin conditioningEmollientEmulsifyingSurfactant Fungal-acne trigger
Glycol Distearate
Opacifying, Viscosity increasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A OpacifyingViscosity increasing agentEmollientEmulsifyingSkin conditioningViscosity controlling Fungal-acne trigger
Laureth-4
Antistatic agent, Emulsifying
Potentially comedogenic - can block poresRead moreShow less
EWG 2–3 CIR B Antistatic agentEmulsifyingMaskingSurfactant Bad for Oily Skin
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Benzyl Salicylate
Fragrance, Uv absorber
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceUv absorberMasking Allergens
Linalool
Fragrance, Deodorant
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceDeodorantMasking Allergens
Limonene
Deodorant, Perfuming
Moderate-hazard ingredient.Read moreShow less
EWG 6 DeodorantPerfumingSolvent Allergens
Coumarin
Fragrance, Masking
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceMasking Allergens
Benzoic Acid
Fragrance, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePh adjusterPreservativeBulking agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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