Shampoo Reparador Murumuru - Ekos

Natura

Shampoo Reparador Murumuru - Ekos

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About this product

The Natura Shampoo Reparador Murumuru - Ekos is a misc. Our analysis of its 40 ingredients (26 low-risk) rates it Excellent (84/100). Based on its ingredients, it looks well-suited to dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
40
Low-risk
26
Fragrance
Contains fragrance
Origin
Brazil

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 12/10
Good for dry skin
Glycol Distearate Glyceryl Stearate Glyceryl Oleate Dimethiconol Sorbitol Astrocaryum Murumuru Seed Butter Glycerin Propylene Glycol Hydroxyethyl Urea PEG-120 Methyl Glucose Trioleate PEG-200 Ammonium Lactate
Caution for dry skin
Glyceryl Oleate Decyl Glucoside Glycerin Coco-glucoside Sodium Hydroxide Triethanolamine PEG-4 Dilaurate PEG-4 Laurate Sodium Lauryl Sulfate TEA-Dodecylbenzenesulfonate
Oily/Acne-Prone Skin No data
Sensitive Skin 1/14
Good for sensitive skin
Glycerin
Caution for sensitive skin
Glyceryl Oleate Sodium Chloride Sorbitol Glycerin Propylene Glycol Citric Acid Benzoic Acid Sodium Benzoate Phenoxyethanol Linalool Triethanolamine Limonene Methylisothiazolinone Benzyl Salicylate

Ingredients list

40 total
Lower hazard (1) Higher hazard (7)
All40 Fragrance12 Skin Conditioning10 Humectant9 Surfactant8 Masking7 Emulsifying7 Viscosity Controlling7 Emollient6
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
2
Sodium Lauryl Sulfate
(Cleansing, Denaturant, Emulsifying, Foaming, Surfactant)
Bad for Oily Skin
Bad for Oily Skin
Sulfate
Sulfate
1
B
Decyl Glucoside
(Cleansing, Emulsion Stabilising, Surfactant)
4
B
Cocamidopropyl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
PARFUM
(Fragrance, Perfuming)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
1
A
Dimethiconol
(Antifoaming Agent, Skin Conditioning, Emollient, Moisturising)
Silicone
Silicone
1
Sorbitol
(Flavoring Agent, Fragrance, Humectant, Plasticizer, Skin Conditioning)
1
A
Polyquaternium-10
(Antistatic Agent, Film Forming, Hair Fixing)
1
A
Glycol Distearate
(Opacifying, Viscosity Increasing Agent, Emollient, Emulsifying, Skin Conditioning, Viscosity Controlling)
Fungal Acne
Fungal Acne Trigger
5
B
Triethanolamine
(Fragrance, Ph Adjuster, Emulsifying, Surfactant, Buffering Agent, Masking)
3
B
Propylene Glycol
(Fragrance, Humectant, Skin Conditioningagent Miscellaneous, Solvent, Viscosity Decreasing Agent, Skin Conditioning, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
3
A
PEG-120 Methyl Glucose Trioleate
(Skin Conditioning, Emollient, Sufactant, Viscosity Increasingagent Aqueous, Viscosity Controlling)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Carbomer
(Emulsion Stabilising, Viscosity Increasing Agent, Gel Forming, Viscosity Controlling)
1
B
Coco-glucoside
(Cleansing, Foaming, Surfactant)
1
A
Astrocaryum Murumuru Seed Butter
(Emollient, Skin Conditioning)
3
B
Sodium Hydroxide
(Denaturant, Ph Adjuster, Buffering Agent)
1
Hydroxyethyl Urea
(Hair Conditioning, Humectant, Skin Conditioning)
1
A
Glyceryl Stearate
(Emollient, Emulsifying)
Fungal Acne
Fungal Acne Trigger
1
A
Glyceryl Oleate
(Fragrance, Skin Conditioning, Emollient, Emulsifying, Surfactant, Perfuming)
Fungal Acne
Fungal Acne Trigger
2
A
Tetrasodium EDTA
(Chelating Agent)
5
B
PEG-4 Laurate
(Emulsifying, Surfactant)
5
B
PEG-4 Dilaurate
(Emulsifying, Surfactant)
TEA-Dodecylbenzenesulfonate
(Cleansing, Foaming, Surfactant)
Sulfate
Sulfate
3
A
PEG-200
(Binding Agent, Humectant, Solvent)
Bad for Oily Skin
Bad for Oily Skin
4
6
B
Iodopropynyl Butylcarbamate
(Preservative)
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
3
A
Benzoic Acid
(Fragrance, Ph Adjuster, Preservative, Bulking Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
4
B
Ammonium Lactate
(Buffering Agent, Exfoliant, Humectant, Keratolytic, Skin Conditioning)
1
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling)
6
B
Methylchloroisothiazolinone
(Preservative)
7
B
Methylisothiazolinone
(Preservative)
1
B
Sodium Sulfate
(Viscosity Increasing Agent, Bulking Agent, Viscosity Controlling)
7
Benzyl Salicylate
(Fragrance, Uv Absorber, Masking)
Allergens
Allergens
5
Linalool
(Fragrance, Deodorant, Masking)
Allergens
Allergens
6
Limonene
(Deodorant, Perfuming, Solvent)
Allergens
Allergens
3
CI 19140
(Colorant, Cosmetic Colorant)
2
CI 15510
(Cosmetic Colorant)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Cocamidopropyl Betaine
Skin Conditioning
Glycerin
Humectant, Skin Protecting
Dimethiconol
Skin Conditioning, Emollient
Sorbitol
Humectant, Skin Conditioning
Glycol Distearate
Emollient, Skin Conditioning
Propylene Glycol
Humectant, Skin Conditioning

Benefits

Good for dry skin

Concerns

Contains paraben
Contains sulfate
Contains silicone
Contains eu allergen
Not fungal acne (malassezia) safe
Methylisothiazolinone — higher EWG
Benzyl Salicylate — higher EWG
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Decyl Glucoside
Cleansing, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingEmulsion stabilisingSurfactant
Cocamidopropyl Betaine
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Sorbitol
Flavoring agent, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 1 Flavoring agentFragranceHumectantPlasticizerSkin conditioning
Polyquaternium-10
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
PEG-120 Methyl Glucose Trioleate
Skin conditioning, Emollient
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Skin conditioningEmollientSufactantViscosity increasingagent - aqueousViscosity controlling
Carbomer
Emulsion stabilising, Viscosity increasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Emulsion stabilisingViscosity increasing agentGel formingViscosity controlling
Coco-glucoside
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingFoamingSurfactant
Astrocaryum Murumuru Seed Butter
Emollient, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmollientSkin conditioning
Sodium Hydroxide
Denaturant, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B DenaturantPh adjusterBuffering agent
Hydroxyethyl Urea
Hair conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 Hair conditioningHumectantSkin conditioning
Tetrasodium EDTA
Chelating agent
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Chelating agent
Sodium Benzoate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservativeAnticorrosiveMasking
Ammonium Lactate
Buffering agent, Exfoliant
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Buffering agentExfoliantHumectantKeratolyticSkin conditioning
+ 4 more — see the full ingredients list above
Sodium Lauryl Sulfate
Cleansing, Denaturant
Potentially comedogenic - can block poresRead moreShow less
EWG 1–2 CleansingDenaturantEmulsifyingFoamingSurfactant Bad for Oily SkinSulfate
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Dimethiconol
Antifoaming agent, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antifoaming agentSkin conditioningEmollientMoisturising Silicone
Glycol Distearate
Opacifying, Viscosity increasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A OpacifyingViscosity increasing agentEmollientEmulsifyingSkin conditioningViscosity controlling Fungal-acne trigger
Triethanolamine
Fragrance, Ph adjuster
Moderate-hazard ingredient.Read moreShow less
EWG 5 CIR B FragrancePh adjusterEmulsifyingSurfactantBuffering agentMasking
Propylene Glycol
Fragrance, Humectant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B FragranceHumectantSkin-conditioningagent - miscellaneousSolventViscosity decreasing agentSkin conditioningViscosity controlling Good for Dry Skin
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Glyceryl Stearate
Emollient, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmollientEmulsifying Fungal-acne trigger
Glyceryl Oleate
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningEmollientEmulsifyingSurfactantPerfuming Fungal-acne trigger
PEG-4 Laurate
Emulsifying, Surfactant
Moderate-hazard ingredient.Read moreShow less
EWG 5 CIR B EmulsifyingSurfactant
PEG-4 Dilaurate
Emulsifying, Surfactant
Moderate-hazard ingredient.Read moreShow less
EWG 5 CIR B EmulsifyingSurfactant
TEA-Dodecylbenzenesulfonate
Cleansing, Foaming
Limited public safety data.Read moreShow less
EWG N/A CleansingFoamingSurfactant Sulfate
PEG-200
Binding agent, Humectant
Potentially comedogenic - can block poresRead moreShow less
EWG 3 CIR A Binding agentHumectantSolvent Bad for Oily Skin
Iodopropynyl Butylcarbamate
Preservative
Moderate-hazard ingredient.Read moreShow less
EWG 4–6 CIR B Preservative
+ 6 more — see the full ingredients list above

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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