Perfect Clean Style Refresher

NatureLab Tokyo

Where to buy Possibly in stock

About this product

The NatureLab Tokyo Perfect Clean Style Refresher is a misc. Our analysis of its 20 ingredients (8 low-risk) rates it Excellent (86/100). Based on its ingredients, it looks well-suited to oily / acne-prone skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
20
Low-risk
8
Fragrance
Contains fragrance
Origin
Japan

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 0/4
Caution for dry skin
Hydrated Silica Sodium Hydroxide Polysorbate 80 Alcohol Denat.
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Alcohol Denat.
Sensitive Skin 0/7
Caution for sensitive skin
Sodium Citrate Citric Acid Alcohol Denat. Linalool Alpha-Isomethyl Ionone Limonene Coumarin

Ingredients list

20 total
Lower hazard (1) Higher hazard (7)
All20 Skin Conditioning7 Masking5 Fragrance5 Solvent3 Perfuming3 Buffering Agent3 Ph Adjuster3 Deodorant2
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
4
Alcohol Denat.
(Antifoaming Agent, Antimicrobial, Astringent, Masking, Solvent, Viscosity Controlling)
Bad for Dry Skin
Bad for Dry Skin
Bad for Sensitive Skin
Bad for Sensitive Skin
1
Maranta Arundinacea Root Extract
(Smoothing)
PHYLLOSTACHYS BAMBUSOIDES EXTRACT
(Skin Conditioning)
A
Perilla Ocymoides Seed Oil
(Skin Conditioning)
Oryza Sativa Bran Extract
(Skin Conditioning, Skin Protecting)
rosmarinus officinalis extract
(Antimicrobial, Refreshing, Tonic)
Helianthus Annuus Extract
(Hair Conditioning, Skin Conditioning, Skin Conditioning Emollient)
TOCOPHEROL
(Antioxidant, Fragrance, Skin Conditioning)
1
A
Hydrated Silica
(Abrasive, Absorbent, Anticaking Agent, Bulking Agent, Opacifying, Oral Care Agent, Skin Conditioning, Viscosity Increasing Agent, Viscosity Controlling)
3
B
Polysorbate 80
(Denaturant, Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
Tetrasodium Glutamate Diacetate
(Chelating Agent)
3
B
Sodium Hydroxide
(Denaturant, Ph Adjuster, Buffering Agent)
1
A
Sodium Citrate
(Ph Adjuster, Buffering Agent, Chelating, Masking)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
PARFUM
(Fragrance, Perfuming)
7
Coumarin
(Fragrance, Masking)
Allergens
Allergens
6
Limonene
(Deodorant, Perfuming, Solvent)
Allergens
Allergens
5
Linalool
(Fragrance, Deodorant, Masking)
Allergens
Allergens
5
Alpha-Isomethyl Ionone
(Perfuming, Skin Conditioning)
Allergens
Allergens

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Alcohol Denat.
Astringent
PHYLLOSTACHYS BAMBUSOIDES EXTRACT
Skin Conditioning
Perilla Ocymoides Seed Oil
Skin Conditioning
Oryza Sativa Bran Extract
Skin Conditioning, Skin Protecting
Helianthus Annuus Extract
Skin Conditioning
TOCOPHEROL
Antioxidant, Skin Conditioning

Benefits

Good for oily/acne-prone skin

Concerns

Contains eu allergen
Not fungal acne (malassezia) safe
Coumarin — higher EWG
May not suit dry skin
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Maranta Arundinacea Root Extract
Smoothing
Low-hazard ingredient.Read moreShow less
EWG 1 Smoothing
PHYLLOSTACHYS BAMBUSOIDES EXTRACT
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Perilla Ocymoides Seed Oil
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A CIR A Skin conditioning
Oryza Sativa Bran Extract
Skin conditioning, Skin protecting
Limited public safety data.Read moreShow less
EWG N/A Skin conditioningSkin protecting
rosmarinus officinalis extract
Antimicrobial, Refreshing
Limited public safety data.Read moreShow less
EWG N/A AntimicrobialRefreshingTonic
Helianthus Annuus Extract
Hair conditioning, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Hair conditioningSkin conditioningSkin conditioning emollient
TOCOPHEROL
Antioxidant, Fragrance
Limited public safety data.Read moreShow less
EWG N/A AntioxidantFragranceSkin conditioning
Hydrated Silica
Abrasive, Absorbent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A AbrasiveAbsorbentAnticaking agentBulking agentOpacifyingOral care agentSkin conditioningViscosity increasing agentViscosity controlling
Tetrasodium Glutamate Diacetate
Chelating agent
Low-hazard ingredient.Read moreShow less
EWG 1 Chelating agent
Sodium Hydroxide
Denaturant, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B DenaturantPh adjusterBuffering agent
Sodium Citrate
Ph adjuster, Buffering agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Ph adjusterBuffering agentChelatingMasking
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Alcohol Denat.
Antifoaming agent, Antimicrobial
Causes moisture evaporation - prone to dry out skinRead moreShow less
EWG 4 Antifoaming agentAntimicrobialAstringentMaskingSolventViscosity controlling Bad for Dry SkinBad for Sensitive Skin
Polysorbate 80
Denaturant, Emulsifying
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B DenaturantEmulsifyingSurfactant Fungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Coumarin
Fragrance, Masking
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceMasking Allergens
Limonene
Deodorant, Perfuming
Moderate-hazard ingredient.Read moreShow less
EWG 6 DeodorantPerfumingSolvent Allergens
Linalool
Fragrance, Deodorant
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceDeodorantMasking Allergens
Alpha-Isomethyl Ionone
Perfuming, Skin conditioning
Moderate-hazard ingredient.Read moreShow less
EWG 5 PerfumingSkin conditioning Allergens

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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