Hydro Boost Water Gel Cleanser

Neutrogena

Hydro Boost Water Gel Cleanser

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About this product

The Neutrogena Hydro Boost Water Gel Cleanser is a cleanser. Our analysis of its 18 ingredients (14 low-risk) rates it Excellent (97/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Cleansers
Ingredients
18
Low-risk
14
Fragrance
Contains fragrance
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

PH Level

(Know the PH? Submit it here! )

N/A - No submissions yet

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 2/5
Good for dry skin
Glycerin Hydrolyzed Hyaluronic Acid
Caution for dry skin
Sodium Methyl Cocoyl Taurate Sodium Cocoyl Isethionate Glycerin Sodium Hydroxide Polysorbate 20
Oily/Acne-Prone Skin No data
Sensitive Skin 2/3
Good for sensitive skin
Glycerin Hydroxyacetophenone
Caution for sensitive skin
Glycerin Citric Acid Phenoxyethanol

Ingredients list

18 total
Lower hazard (1) Higher hazard (4)
All18 Skin Conditioning5 Fragrance4 Hair Conditioning4 Humectant3 Film Forming3 Surfactant3 Antistatic Agent3 Chelating Agent2
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
Cocamidopropyl Hydroxysultaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
1
B
Sodium Cocoyl Isethionate
(Cleansing, Hair Conditioning, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
B
Sodium Methyl Cocoyl Taurate
(Cleansing, Foaming, Surfactant)
Fungal Acne
Fungal Acne Trigger
Sodium Hydrolyzed Potato Starch Dodecenylsuccinate
(Surfactant Cleansing, Surfactant Foam Boosting)
Potassium Acrylates Copolymer
(Binding, Film Forming)
1
Hydroxyacetophenone
(Antioxidant)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
PARFUM
(Fragrance, Perfuming)
1
Linoleamidopropyl PG-Dimonium Chloride Phosphate
(Antistatic Agent)
1
A
Polyquaternium-10
(Antistatic Agent, Film Forming, Hair Fixing)
3
B
Polysorbate 20
(Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
3
B
Sodium Hydroxide
(Denaturant, Ph Adjuster, Buffering Agent)
1
A
Disodium EDTA
(Chelating Agent, Viscosity Controlling)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
1
Hydrolyzed Hyaluronic Acid
(Hair Conditioning, Humectant, Skin Conditioning)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Glycerin
Humectant, Skin Protecting
Cocamidopropyl Hydroxysultaine
Skin Conditioning
Hydroxyacetophenone
Antioxidant
Ethylhexylglycerin
Skin Conditioning
Hydrolyzed Hyaluronic Acid
Humectant, Skin Conditioning

Benefits

No standout benefits flagged for this product.

Concerns

Contains paraben
Not fungal acne (malassezia) safe
May not suit dry skin
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cocamidopropyl Hydroxysultaine
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Sodium Hydrolyzed Potato Starch Dodecenylsuccinate
Surfactant - cleansing, Surfactant - foam boosting
Limited public safety data.Read moreShow less
EWG N/A Surfactant - cleansingSurfactant - foam boosting
Potassium Acrylates Copolymer
Binding, Film forming
Limited public safety data.Read moreShow less
EWG N/A BindingFilm forming
Hydroxyacetophenone
Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 Antioxidant
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Linoleamidopropyl PG-Dimonium Chloride Phosphate
Antistatic agent
Low-hazard ingredient.Read moreShow less
EWG 1 Antistatic agent
Polyquaternium-10
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
Sodium Hydroxide
Denaturant, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B DenaturantPh adjusterBuffering agent
Disodium EDTA
Chelating agent, Viscosity controlling
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentViscosity controlling
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Hydrolyzed Hyaluronic Acid
Hair conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 Hair conditioningHumectantSkin conditioning
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Sodium Cocoyl Isethionate
Cleansing, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingHair conditioningSurfactant Fungal-acne trigger
Sodium Methyl Cocoyl Taurate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingFoamingSurfactant Fungal-acne trigger
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Polysorbate 20
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant Fungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Where it fits: Use as the first step, on clean hands, before the rest of your routine.
  • 2 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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