Myrrh Clay (MC)

NIOD

Where to buy Possibly in stock

About this product

The NIOD Myrrh Clay (MC) is a wash-off mask. Our analysis of its 16 ingredients (11 low-risk) rates it Excellent (97/100). Based on its ingredients, it looks well-suited to dry skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Wash-Off Mask
Ingredients
16
Low-risk
11
Fragrance
Fragrance-free
Origin
Canada

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 2/1
Good for dry skin
Caprylyl Glycol Glycerin
Caution for dry skin
Glycerin
Oily/Acne-Prone Skin No data
Sensitive Skin 1/4
Good for sensitive skin
Glycerin
Caution for sensitive skin
Glycerin Hydroxypropyl Cyclodextrin Acacia Senegal Gum Phenoxyethanol

Ingredients list

16 total
Lower hazard (1) Higher hazard (4)
All16 Skin Conditioning8 Solvent5 Humectant3 Fragrance3 Preservative2 Masking2 Viscosity Controlling2 Viscosity Decreasing Agent2
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Peat
(Skin Conditioning)
Solum Fullonum
(Absorbent, Anticaking, Bulking, Gel Forming, Opacifying, Viscosity Controlling)
1
Propanediol
(Solvent, Viscosity Decreasing Agent, Viscosity Controlling)
1
Water
(Solvent)
Fragaria Vesca Leaf Extract
(Astringent, Skin Conditioning)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
A
Hydroxypropyl Cyclodextrin
(Chelating Agent, Emulsion Stabilising, Masking, Skin Conditioning)
Commiphora Myrrha Resin Extract
(Nail Conditioning, Skin Conditioning)
1
Evodia Rutaecarpa Fruit Extract
(Skin Conditioning)
Carrageenan
3
A
Acacia Senegal Gum
(Adhesive, Fragrance, Film Forming, Masking)
1
A
Pentylene Glycol
(Skin Conditioning, Solvent)
1
A
1,2-Hexanediol
(Solvent)
1
A
Caprylyl Glycol
(Hair Conditioning, Skin Conditioning, Emollient, Humectant)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
2
A
Chlorphenesin
(Cosmetic Biocide, Antimicrobial, Preservative)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Peat
Skin Conditioning
Fragaria Vesca Leaf Extract
Astringent, Skin Conditioning
Glycerin
Humectant, Skin Protecting
Hydroxypropyl Cyclodextrin
Skin Conditioning
Commiphora Myrrha Resin Extract
Skin Conditioning
Evodia Rutaecarpa Fruit Extract
Skin Conditioning

Benefits

Good for dry skin

Concerns

Contains paraben
Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Peat
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Solum Fullonum
Absorbent, Anticaking
Limited public safety data.Read moreShow less
EWG N/A AbsorbentAnticakingBulkingGel formingOpacifyingViscosity controlling
Propanediol
Solvent, Viscosity decreasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 SolventViscosity decreasing agentViscosity controlling
Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Fragaria Vesca Leaf Extract
Astringent, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A AstringentSkin conditioning
Hydroxypropyl Cyclodextrin
Chelating agent, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentEmulsion stabilisingMaskingSkin conditioning
Commiphora Myrrha Resin Extract
Nail conditioning, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Nail conditioningSkin conditioning
Evodia Rutaecarpa Fruit Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Carrageenan
Other
Limited public safety data.Read moreShow less
EWG N/A
Acacia Senegal Gum
Adhesive, Fragrance
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A AdhesiveFragranceFilm formingMasking
Pentylene Glycol
Skin conditioning, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningSolvent
1,2-Hexanediol
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Solvent
Caprylyl Glycol
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Hair conditioningSkin conditioningEmollientHumectant
Chlorphenesin
Cosmetic biocide, Antimicrobial
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Cosmetic biocideAntimicrobialPreservative
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben

How to use

How to use

  • 1 Where it fits: Use as the first step, on clean hands, before the rest of your routine.
  • 2 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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