Daily Nutrition Shampoo

Not Your Mother’s

Where to buy Possibly in stock

About this product

The Not Your Mother’s Daily Nutrition Shampoo is a misc. Our analysis of its 15 ingredients (12 low-risk) rates it Excellent (94/100). Based on its ingredients, it looks well-suited to oily / acne-prone skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
15
Low-risk
12
Fragrance
Contains fragrance
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe Minimal Ingredients

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 1/3
Good for dry skin
Camellia Sinensis Leaf Extract
Caution for dry skin
Sodium Lauroyl Methyl Isethionate Sodium Cocoyl Isethionate Camellia Sinensis Leaf Extract
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Camellia Sinensis Leaf Extract
Sensitive Skin 2/4
Good for sensitive skin
Malus Domestica Fruit Extract Camellia Sinensis Leaf Extract
Caution for sensitive skin
Citric Acid Camellia Sinensis Leaf Extract Phenoxyethanol Linalool

Ingredients list

15 total
Lower hazard (1) Higher hazard (5)
All15 Skin Conditioning5 Fragrance4 Masking3 Chelating Agent2 Cleansing2 Hair Conditioning2 Surfactant2 Antistatic Agent2
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
B
Sodium Cocoyl Isethionate
(Cleansing, Hair Conditioning, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
B
Sodium Lauroyl Methyl Isethionate
(Cleansing, Surfactant)
1
Cocamidopropyl Hydroxysultaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
3
A
PEG-120 Methyl Glucose Dioleate
(Sufactant, Emulsifying)
1
A
Polyquaternium-10
(Antistatic Agent, Film Forming, Hair Fixing)
1
B
Camellia Sinensis Leaf Extract
(Antimicrobial, Antioxidant, Astringent, Emollient, Humectant, Masking, Oral Care Agent, Skin Conditioning, Skin Protecting, Tonic, Uv Absorber)
Good for Oily Skin
Good for Oily Skin
1
B
Malus Domestica Fruit Extract
(Antioxidant)
1
Leuconostoc/Radish Root Ferment Filtrate
(Antidandruff Agent, Antimicrobial)
1
Tetrasodium Glutamate Diacetate
(Chelating Agent)
PARFUM
(Fragrance, Perfuming)
5
Linalool
(Fragrance, Deodorant, Masking)
Allergens
Allergens
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

Browse similar misc
No close formula match yet — browse other products like this

Key ingredients

Cocamidopropyl Hydroxysultaine
Skin Conditioning
Camellia Sinensis Leaf Extract
Antioxidant, Astringent
Malus Domestica Fruit Extract
Antioxidant
Ethylhexylglycerin
Skin Conditioning

Benefits

Good for oily/acne-prone skin

Concerns

Contains paraben
Contains eu allergen
Not fungal acne (malassezia) safe
May not suit dry skin
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Sodium Lauroyl Methyl Isethionate
Cleansing, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingSurfactant
Cocamidopropyl Hydroxysultaine
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
PEG-120 Methyl Glucose Dioleate
Sufactant, Emulsifying
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A SufactantEmulsifying
Polyquaternium-10
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
Malus Domestica Fruit Extract
Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Antioxidant
Leuconostoc/Radish Root Ferment Filtrate
Antidandruff agent, Antimicrobial
Low-hazard ingredient.Read moreShow less
EWG 1 Antidandruff agentAntimicrobial
Tetrasodium Glutamate Diacetate
Chelating agent
Low-hazard ingredient.Read moreShow less
EWG 1 Chelating agent
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Sodium Cocoyl Isethionate
Cleansing, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingHair conditioningSurfactant Fungal-acne trigger
Camellia Sinensis Leaf Extract
Antimicrobial, Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B AntimicrobialAntioxidantAstringentEmollientHumectantMaskingOral care agentSkin conditioningSkin protectingTonicUv absorber Good for Oily Skin
Linalool
Fragrance, Deodorant
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceDeodorantMasking Allergens
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

From the community

0
Reviews
0
Saved by users
0
In collections

Ratings & reviews

Write a Review
0.0
from 0 ratings

Used this product? Rate it in 10 seconds

Alternatives