T.2 Night Restoring Scalp Serum

Nutrire

T.2 Night Restoring Scalp Serum

0.0
from 0 Ratings
Where to buy Possibly in stock

About this product

The Nutrire T.2 Night Restoring Scalp Serum is a misc. Our analysis of its 50 ingredients (35 low-risk) rates it Excellent (98/100). Based on its ingredients, it looks well-suited to oily / acne-prone skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
50
Low-risk
35
Fragrance
Fragrance-free
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 10/12
Good for dry skin
Gluconolactone Cetyl Palmitate Calcium Gluconate Butylene Glycol Glycerin Polyglyceryl-4 Caprate Polyglyceryl-6 Caprylate Scutellaria Baicalensis Root Extract Camellia Sinensis Leaf Extract Lactic Acid
Caution for dry skin
Lauryl Glucoside Sorbitan Stearate Glycerin Polyglyceryl-4 Caprate Polyglyceryl-6 Ricinoleate Polyglyceryl-6 Caprylate Scutellaria Baicalensis Root Extract Polyglyceryl-3 Cocoate Camellia Sinensis Leaf Extract Cetrimonium Chloride Sodium Hydroxide Polysorbate 60
Oily/Acne-Prone Skin 2/0
Good for oily/acne-prone skin
Scutellaria Baicalensis Root Extract Camellia Sinensis Leaf Extract
Sensitive Skin 4/14
Good for sensitive skin
Glycerin Scutellaria Baicalensis Root Extract Camellia Sinensis Leaf Extract Tocopheryl Acetate
Caution for sensitive skin
Gluconolactone Disodium Phosphate Cetyl Palmitate Sorbitan Stearate Arginine Caffeine Butylene Glycol Glycerin Citric Acid Camellia Sinensis Leaf Extract Sodium Benzoate Potassium Sorbate Lactic Acid Phenoxyethanol

Ingredients list

50 total
Lower hazard (1) Higher hazard (4)
All50 Skin Conditioning33 Fragrance15 Masking8 Humectant8 Surfactant8 Emulsifying7 Film Forming6 Antistatic Agent5
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
4
B
Lactic Acid
(Exfoliant, Fragrance, Humectant, Ph Adjuster, Skin Conditioning Agent Humectant, Skin Conditioning, Buffering Agent)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
Propanediol
(Solvent, Viscosity Decreasing Agent, Viscosity Controlling)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
1
B
Polyglyceryl-3 Cocoate
(Emulsifying, Surfactant)
1
B
Polyglyceryl-4 Caprate
(Skin Conditioning, Emollient, Emulsifying, Surfactant)
1
B
Polyglyceryl-6 Caprylate
(Skin Conditioning, Emollient, Emulsifying, Surfactant)
1
B
Polyglyceryl-6 Ricinoleate
(Skin Conditioning, Emulsifying, Surfactant)
1
A
Polyquaternium-10
(Antistatic Agent, Film Forming, Hair Fixing)
3
B
Cetrimonium Chloride
(Antistatic Agent, Cosmetic Biocide, Emulsifying, Surfactant, Antimicrobial, Preservative)
3
A
Polyquaternium-7
(Antistatic Agent, Film Forming, Hair Fixing)
3
B
Sodium Hydroxide
(Denaturant, Ph Adjuster, Buffering Agent)
1
A
Hydroxyethylcellulose
(Binding Agent, Emulsion Stabilising, Film Forming, Viscosity Increasing Agent, Binding, Stabilising, Viscosity Controlling)
1
A
Arginine
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent, Masking)
1
Menthyl Ethylamido Oxalate
(Skin Conditioning)
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
Glycine Soja Germ Extract
(Skin Conditioning Miscellaneous)
Triticum Vulgare Germ Extract
(Skin Conditioning, Skin Protecting)
1
Caffeine
(Fragrance, Skin Conditioning, Masking)
1
Serenoa Serrulata Fruit Extract
(Lytic Agent, Skin Conditioning)
Urtica Dioica Leaf Extract
(Skin Conditioning)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
1
Gluconolactone
(Fragrance, Humectant, Solvent)
Avena Sativa Bran Extract
(Abrasive)
1
B
Camellia Sinensis Leaf Extract
(Antimicrobial, Antioxidant, Astringent, Emollient, Humectant, Masking, Oral Care Agent, Skin Conditioning, Skin Protecting, Tonic, Uv Absorber)
Good for Oily Skin
Good for Oily Skin
SIMMONDSIA CHINENSIS SEED OIL
(Hair Conditioning, Skin Conditioning, Skin Conditioning Emollient)
1
Scutellaria Baicalensis Root Extract
(Astringent, Humectant, Soothing)
ganoderma lucidum extract
(Skin Protecting)
Sh-Polypeptide-50
(Skin Conditioning)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
Leuconostoc/Radish Root Ferment Filtrate
(Antidandruff Agent, Antimicrobial)
Cucurbita Pepo Seed Extract
(Skin Conditioning)
1
B
Disodium Phosphate
(Buffering Agent, Anticorrosive, Fragrance, Ph Adjuster, Masking)
3
B
Polysorbate 60
(Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
Linum Usitatissimum Seed Extract
(Perfuming, Skin Conditioning)
1
B
Cetyl Palmitate
(Fragrance, Emollient, Masking, Skin Conditioning)
Helianthus Annuus Seed Oil
(Fragrance, Skin Conditioning, Skin Conditioning Emollient)
1
B
Lauryl Glucoside
(Cleansing, Surfactant)
Melaleuca Alternifolia Leaf Oil
(Antioxidant, Perfuming)
1
A
Sorbitan Stearate
(Fragrance, Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
Oenothera Biennis Root Extract
(Skin Conditioning)
1
A
Calcium Gluconate
(Skin Conditioning, Humectant, Oral Care Agent)
1
B
Sodium Phosphate
(Buffering Agent)
1
Lactobacillus Ferment
(Skin Conditioning)
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
rosmarinus officinalis leaf extract
(Antimicrobial, Fragrance, Skin Conditioning)
3
Tocopheryl Acetate
(Antioxidant, Skin Conditioning)
Bad for Oily Skin
Bad for Oily Skin
3
A
Potassium Sorbate
(Fragrance, Preservative)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

Browse similar misc
No close formula match yet — browse other products like this

Key ingredients

Glycerin
Humectant, Skin Protecting
Lactic Acid
Exfoliant, Humectant
Polyglyceryl-4 Caprate
Skin Conditioning, Emollient
Polyglyceryl-6 Caprylate
Skin Conditioning, Emollient
Polyglyceryl-6 Ricinoleate
Skin Conditioning
Arginine
Skin Conditioning

Benefits

Good for oily/acne-prone skin

Concerns

Contains paraben
Not fungal acne (malassezia) safe
May not suit dry skin
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Propanediol
Solvent, Viscosity decreasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 SolventViscosity decreasing agentViscosity controlling
Polyglyceryl-3 Cocoate
Emulsifying, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B EmulsifyingSurfactant
Polyglyceryl-4 Caprate
Skin conditioning, Emollient
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Skin conditioningEmollientEmulsifyingSurfactant
Polyglyceryl-6 Caprylate
Skin conditioning, Emollient
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Skin conditioningEmollientEmulsifyingSurfactant
Polyglyceryl-6 Ricinoleate
Skin conditioning, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Skin conditioningEmulsifyingSurfactant
Polyquaternium-10
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
Cetrimonium Chloride
Antistatic agent, Cosmetic biocide
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B Antistatic agentCosmetic biocideEmulsifyingSurfactantAntimicrobialPreservative
Polyquaternium-7
Antistatic agent, Film forming
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Antistatic agentFilm formingHair fixing
Sodium Hydroxide
Denaturant, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B DenaturantPh adjusterBuffering agent
Hydroxyethylcellulose
Binding agent, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Binding agentEmulsion stabilisingFilm formingViscosity increasing agentBindingStabilisingViscosity controlling
Arginine
Fragrance, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceHair conditioningSkin conditioningAntistatic agentMasking
Menthyl Ethylamido Oxalate
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Glycine Soja Germ Extract
Skin conditioning miscellaneous
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning miscellaneous
Triticum Vulgare Germ Extract
Skin conditioning, Skin protecting
Limited public safety data.Read moreShow less
EWG N/A Skin conditioningSkin protecting
+ 25 more — see the full ingredients list above
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Lactic Acid
Exfoliant, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 4 CIR B ExfoliantFragranceHumectantPh adjusterSkin-conditioning agent -humectantSkin conditioningBuffering agent Bad for Sensitive Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Camellia Sinensis Leaf Extract
Antimicrobial, Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B AntimicrobialAntioxidantAstringentEmollientHumectantMaskingOral care agentSkin conditioningSkin protectingTonicUv absorber Good for Oily Skin
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Polysorbate 60
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant Fungal-acne trigger
Sorbitan Stearate
Fragrance, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceEmulsifyingSurfactant Fungal-acne trigger
Tocopheryl Acetate
Antioxidant, Skin conditioning
Potentially comedogenic - can block poresRead moreShow less
EWG 3 AntioxidantSkin conditioning Bad for Oily Skin

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.
  • 2 Wear SPF the next day: Acids and retinoids increase sun sensitivity — daily sunscreen is a must while using this.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Effective levels — general guide

The concentrations these actives are typically effective at in research — not a measurement of this product.

AHA (acid exfoliant) 5–10% (OTC)

OTC leave-on AHAs are usually 5–10%. The effect also depends on pH and free-acid value, not the percentage alone.

Lactic Acid

INCI lists don't disclose amounts, and we don't claim to know this product's levels — these are the ranges these ingredients are usually effective at, so you can tell a real formula from "fairy-dusting" a marketed active. How we estimate this.

From the community

0
Reviews
0
Saved by users
0
In collections

Ratings & reviews

Write a Review
0.0
from 0 ratings

Used this product? Rate it in 10 seconds

Alternatives