Ultra Sensitive Body Wash

Odele

Where to buy Possibly in stock

About this product

The Odele Ultra Sensitive Body Wash is a emulsion. Our analysis of its 14 ingredients (12 low-risk) rates it Excellent (100/100).

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Emulsion
Ingredients
14
Low-risk
12
Fragrance
Fragrance-free
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe Minimal Ingredients

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 1/3
Good for dry skin
Glycerin
Caution for dry skin
Glycerin Sodium C14-16 Olefin Sulfonate Sodium Hydroxide
Oily/Acne-Prone Skin No data
Sensitive Skin 1/5
Good for sensitive skin
Glycerin
Caution for sensitive skin
Sodium Chloride Glycerin Citric Acid Sodium Benzoate Potassium Sorbate

Ingredients list

14 total
Lower hazard (1) Higher hazard (3)
All14 Fragrance4 Viscosity Controlling4 Solvent3 Masking3 Hair Conditioning3 Preservative2 Buffering Agent2 Ph Adjuster2
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
2
B
Sodium C14-16 Olefin Sulfonate
(Cleansing, Foaming, Surfactant)
Sulfate
Sulfate
1
Cocamidopropyl Hydroxysultaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
Dimethyl Lauramide/Myristamide
(Solvent, Surfactant Cleansing, Surfactant Emulsifying, Surfactant Foam Boosting, Viscosity Controlling)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
Avena Sativa Kernel Flour
(Abrasive, Absorbent, Bulking, Viscosity Controlling)
1
Leuconostoc/Radish Root Ferment Filtrate
(Antidandruff Agent, Antimicrobial)
1
A
Hydroxypropyl Guar Hydroxypropyltrimonium Chloride
(Antistatic Agent, Hair Conditioning)
1
Tetrasodium Glutamate Diacetate
(Chelating Agent)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
3
B
Sodium Hydroxide
(Denaturant, Ph Adjuster, Buffering Agent)
1
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling)
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
3
A
Potassium Sorbate
(Fragrance, Preservative)

My Ingredient Notes

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Key ingredients

Cocamidopropyl Hydroxysultaine
Skin Conditioning
Glycerin
Humectant, Skin Protecting

Benefits

No standout benefits flagged for this product.

Concerns

Contains sulfate
Not fungal acne (malassezia) safe
May not suit dry skin
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cocamidopropyl Hydroxysultaine
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Dimethyl Lauramide/Myristamide
Solvent, Surfactant cleansing
Limited public safety data.Read moreShow less
EWG N/A SolventSurfactant cleansingSurfactant emulsifyingSurfactant foam boostingViscosity controlling
Avena Sativa Kernel Flour
Abrasive, Absorbent
Limited public safety data.Read moreShow less
EWG N/A AbrasiveAbsorbentBulkingViscosity controlling
Leuconostoc/Radish Root Ferment Filtrate
Antidandruff agent, Antimicrobial
Low-hazard ingredient.Read moreShow less
EWG 1 Antidandruff agentAntimicrobial
Hydroxypropyl Guar Hydroxypropyltrimonium Chloride
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioning
Tetrasodium Glutamate Diacetate
Chelating agent
Low-hazard ingredient.Read moreShow less
EWG 1 Chelating agent
Sodium Hydroxide
Denaturant, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B DenaturantPh adjusterBuffering agent
Sodium Chloride
Bulking agent, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 Bulking agentMaskingOral care agentViscosity controlling
Sodium Benzoate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservativeAnticorrosiveMasking
Potassium Sorbate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservative
Sodium C14-16 Olefin Sulfonate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B CleansingFoamingSurfactant Sulfate
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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