Keep Calm And Cooling Body Mist

Offon

Keep Calm And Cooling Body Mist

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About this product

The Offon Keep Calm And Cooling Body Mist is a misc. Our analysis of its 24 ingredients (19 low-risk) rates it Excellent (98/100). Based on its ingredients, it looks well-suited to oily / acne-prone and dry skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
24
Low-risk
19
Fragrance
Fragrance-free
Origin
South Korea

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 8/2
Good for dry skin
Gluconolactone Sodium Acetylated Hyaluronate Sodium Hyaluronate Crosspolymer Butylene Glycol Sodium Hyaluronate Hydroxypropyltrimonium Hyaluronate Hydrolyzed Hyaluronic Acid Hyaluronic Acid
Caution for dry skin
Centella Asiatica Extract Alcohol Denat.
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Alcohol Denat.
Sensitive Skin 2/8
Good for sensitive skin
Centella Asiatica Extract Hydroxyacetophenone
Caution for sensitive skin
Gluconolactone Mentha Arvensis Leaf Extract Sodium Citrate Butylene Glycol Pinus Sylvestris Cone Extract Citric Acid Alcohol Denat. Pinus Koraiensis Seed Extract

Ingredients list

24 total
Lower hazard (1) Higher hazard (4)
All24 Skin Conditioning15 Humectant8 Masking6 Solvent5 Fragrance4 Viscosity Controlling3 Antimicrobial2 Ph Adjuster2
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
4
Alcohol Denat.
(Antifoaming Agent, Antimicrobial, Astringent, Masking, Solvent, Viscosity Controlling)
Bad for Dry Skin
Bad for Dry Skin
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
A
1,2-Hexanediol
(Solvent)
1
Hydroxyacetophenone
(Antioxidant)
1
A
Sodium Citrate
(Ph Adjuster, Buffering Agent, Chelating, Masking)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Disodium EDTA
(Chelating Agent, Viscosity Controlling)
1
Gluconolactone
(Fragrance, Humectant, Solvent)
1
B
Centella Asiatica Extract
(Cleansing, Skin Conditioning, Smoothing, Soothing, Tonic)
1
Mentha Arvensis Leaf Extract
(Masking, Refreshing)
1
Moringa Oleifera Seed Extract
(Skin Conditioning)
Pinus Koraiensis Seed Extract
(Perfuming, Tonic)
2
Pinus Sylvestris Cone Extract
(Masking, Perfuming)
rosmarinus officinalis leaf extract
(Antimicrobial, Fragrance, Skin Conditioning)
Thymus Vulgaris Leaf Extract
(Skin Protecting)
Chamaecyparis Obtusa Leaf Extract
(Skin Conditioning)
1
A
Sodium Hyaluronate
(Skin Conditioning, Humectant)
Good for Dry Skin
Good for Dry Skin
1
Hydroxypropyltrimonium Hyaluronate
(Film Forming, Humectant)
1
Hydrolyzed Hyaluronic Acid
(Hair Conditioning, Humectant, Skin Conditioning)
1
Sodium Acetylated Hyaluronate
(Humectant)
1
A
Hyaluronic Acid
(Skin Conditioning, Viscosity Increasing Agent, Antistatic Agent, Humectant, Moisturising)
1
Sodium Hyaluronate Crosspolymer
(Humectant, Skin Conditioning)
1
Potassium Hyaluronate
(Skin Conditioning)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Alcohol Denat.
Astringent
Butylene Glycol
Skin Conditioning, Humectant
Hydroxyacetophenone
Antioxidant
Gluconolactone
Humectant
Centella Asiatica Extract
Skin Conditioning, Soothing
Moringa Oleifera Seed Extract
Skin Conditioning

Benefits

Fungal-acne (Malassezia) safe
Good for dry skin
Good for oily/acne-prone skin

Concerns

May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
1,2-Hexanediol
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Solvent
Hydroxyacetophenone
Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 Antioxidant
Sodium Citrate
Ph adjuster, Buffering agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Ph adjusterBuffering agentChelatingMasking
Disodium EDTA
Chelating agent, Viscosity controlling
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentViscosity controlling
Gluconolactone
Fragrance, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 FragranceHumectantSolvent
Centella Asiatica Extract
Cleansing, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingSkin conditioningSmoothingSoothingTonic
Mentha Arvensis Leaf Extract
Masking, Refreshing
Low-hazard ingredient.Read moreShow less
EWG 1 MaskingRefreshing
Moringa Oleifera Seed Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Pinus Koraiensis Seed Extract
Perfuming, Tonic
Limited public safety data.Read moreShow less
EWG N/A PerfumingTonic
Pinus Sylvestris Cone Extract
Masking, Perfuming
Low-hazard ingredient.Read moreShow less
EWG 2 MaskingPerfuming
rosmarinus officinalis leaf extract
Antimicrobial, Fragrance
Limited public safety data.Read moreShow less
EWG N/A AntimicrobialFragranceSkin conditioning
Thymus Vulgaris Leaf Extract
Skin protecting
Limited public safety data.Read moreShow less
EWG N/A Skin protecting
Chamaecyparis Obtusa Leaf Extract
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Hydroxypropyltrimonium Hyaluronate
Film forming, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 Film formingHumectant
+ 5 more — see the full ingredients list above
Alcohol Denat.
Antifoaming agent, Antimicrobial
Causes moisture evaporation - prone to dry out skinRead moreShow less
EWG 4 Antifoaming agentAntimicrobialAstringentMaskingSolventViscosity controlling Bad for Dry SkinBad for Sensitive Skin
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Sodium Hyaluronate
Skin conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningHumectant Good for Dry Skin

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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