Nourishing + Coconut Milk Shampoo Bar

OGX Beauty

Nourishing + Coconut Milk Shampoo Bar

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About this product

The OGX Beauty Nourishing + Coconut Milk Shampoo Bar is a misc. Our analysis of its 15 ingredients (10 low-risk) rates it Excellent (100/100). Based on its ingredients, it looks well-suited to dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
15
Low-risk
10
Fragrance
Contains fragrance
Origin
United Kingdom

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe Minimal Ingredients

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 3/3
Good for dry skin
Glycerin Polyglyceryl-4 Laurate Hydrogenated Vegetable Oil
Caution for dry skin
Sodium Cocoyl Isethionate Glycerin Polyglyceryl-4 Laurate
Oily/Acne-Prone Skin No data
Sensitive Skin 1/2
Good for sensitive skin
Glycerin
Caution for sensitive skin
Glycerin Citric Acid

Ingredients list

15 total
Lower hazard (1) Higher hazard (2)
All15 Hair Conditioning7 Skin Conditioning7 Fragrance4 Perfuming3 Surfactant2 Emollient2 Solvent2 Antistatic Agent2
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
B
Sodium Cocoyl Isethionate
(Cleansing, Hair Conditioning, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
A
Hydrogenated Vegetable Oil
(Viscosity Increasing Agent, Emollient, Skin Conditioning)
Bad for Oily Skin
Bad for Oily Skin
1
Water
(Solvent)
1
B
Polyglyceryl-4 Laurate
(Skin Conditioning, Emollient, Emulsifying, Surfactant)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
PARFUM
(Fragrance, Perfuming)
Butyrospermum Parkii Butter
(Skin Conditioning, Viscosity Controlling)
Cocos Nucifera Fruit Extract
(Hair Conditioning, Skin Conditioning, Skin Conditioning Emollient)
1
Hydrolyzed Milk Protein
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Albumen
(Film Forming, Hair Conditioning, Skin Conditioning)
cocos nucifera oil
(Fragrance, Hair Conditioning, Perfuming, Skin Conditioning)
1
A
Hydroxypropyl Guar Hydroxypropyltrimonium Chloride
(Antistatic Agent, Hair Conditioning)
1
Tetrasodium Glutamate Diacetate
(Chelating Agent)
1
Leuconostoc/Radish Root Ferment Filtrate
(Antidandruff Agent, Antimicrobial)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Hydrogenated Vegetable Oil
Emollient, Skin Conditioning
Polyglyceryl-4 Laurate
Skin Conditioning, Emollient
Glycerin
Humectant, Skin Protecting
Butyrospermum Parkii Butter
Skin Conditioning
Cocos Nucifera Fruit Extract
Skin Conditioning
Hydrolyzed Milk Protein
Skin Conditioning

Benefits

No standout benefits flagged for this product.

Concerns

Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Polyglyceryl-4 Laurate
Skin conditioning, Emollient
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Skin conditioningEmollientEmulsifyingSurfactant
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Butyrospermum Parkii Butter
Skin conditioning, Viscosity controlling
Limited public safety data.Read moreShow less
EWG N/A Skin conditioningViscosity controlling
Cocos Nucifera Fruit Extract
Hair conditioning, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Hair conditioningSkin conditioningSkin conditioning emollient
Hydrolyzed Milk Protein
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Antistatic agentHair conditioningSkin conditioning
Albumen
Film forming, Hair conditioning
Limited public safety data.Read moreShow less
EWG N/A Film formingHair conditioningSkin conditioning
cocos nucifera oil
Fragrance, Hair conditioning
Limited public safety data.Read moreShow less
EWG N/A FragranceHair conditioningPerfumingSkin conditioning
Hydroxypropyl Guar Hydroxypropyltrimonium Chloride
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioning
Tetrasodium Glutamate Diacetate
Chelating agent
Low-hazard ingredient.Read moreShow less
EWG 1 Chelating agent
Leuconostoc/Radish Root Ferment Filtrate
Antidandruff agent, Antimicrobial
Low-hazard ingredient.Read moreShow less
EWG 1 Antidandruff agentAntimicrobial
Sodium Cocoyl Isethionate
Cleansing, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingHair conditioningSurfactant Fungal-acne trigger
Hydrogenated Vegetable Oil
Viscosity increasing agent, Emollient
Potentially comedogenic - can block poresRead moreShow less
EWG 1 CIR A Viscosity increasing agentEmollientSkin conditioning Bad for Oily Skin
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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