Daily D-Clog Pore-Clearing Cleanser

Olehenriksen

Daily D-Clog Pore-Clearing Cleanser

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About this product

The Olehenriksen Daily D-Clog Pore-Clearing Cleanser is a cleanser. Our analysis of its 27 ingredients (20 low-risk) rates it Excellent (95/100). Based on its ingredients, it looks well-suited to oily / acne-prone skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Cleansers
Ingredients
27
Low-risk
20
Fragrance
Fragrance-free
Origin
Denmark

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

PH Level

(Know the PH? Submit it here! )

N/A - No submissions yet

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 4/9
Good for dry skin
Betaine Caprylyl Glycol Glycerin Lactic Acid
Caution for dry skin
Decyl Glucoside Lauryl Glucoside Sodium Methyl Cocoyl Taurate Sodium Cocoyl Isethionate Glycerin Salicylic Acid Sodium C14-16 Olefin Sulfonate Acrylates Copolymer Sodium Hydroxide
Oily/Acne-Prone Skin 2/0
Good for oily/acne-prone skin
Betaine Salicylate Salicylic Acid
Sensitive Skin 1/8
Good for sensitive skin
Glycerin
Caution for sensitive skin
Sodium Chloride Glycerin Salicylic Acid Citric Acid Sodium Benzoate Lactic Acid Phenoxyethanol Juniperus Communis Fruit Extract

Ingredients list

27 total
Lower hazard (1) Higher hazard (4)
All27 Skin Conditioning13 Hair Conditioning7 Humectant6 Fragrance6 Cleansing5 Surfactant5 Masking4 Antistatic Agent4
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
2
B
Sodium C14-16 Olefin Sulfonate
(Cleansing, Foaming, Surfactant)
Sulfate
Sulfate
1
Cocamidopropyl Hydroxysultaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
Juniperus Communis Fruit Extract
(Perfuming, Skin Conditioning)
1
Propanediol
(Solvent, Viscosity Decreasing Agent, Viscosity Controlling)
1
B
Sodium Cocoyl Isethionate
(Cleansing, Hair Conditioning, Surfactant)
Fungal Acne
Fungal Acne Trigger
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
2
B
Acrylates Copolymer
(Adhesive, Artificial Nail Builder, Binding Agent, Film Forming, Hair Fixing, Suspending Agent Nonsurfactant, Antistatic Agent, Binding)
1
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling)
4
B
Salicylic Acid
(Antiacne Agent, Antidandruff Agent, Corn/Callus/Wart Remover, Denaturant, Exfoliant, Fragrance, Hair Conditioning, Skin Conditioning, Keratolytic, Masking, Preservative)
Good for Oily Skin
Good for Oily Skin
Bad for Sensitive Skin
Bad for Sensitive Skin
1
Betaine Salicylate
(Antimicrobial Agent, Exfoliant, Keratolytic)
Lactobacillus Ferment Extract
(Skin Conditioning)
1
Lactobacillus Ferment
(Skin Conditioning)
Cucumis Sativus Fruit Extract
(Skin Conditioning, Skin Conditioning Emollient)
1
B
Betaine
(Hair Conditioning, Humectant, Antistatic Agent, Skin Conditioning, Viscosity Controlling)
1
A
Hydroxypropyl Guar Hydroxypropyltrimonium Chloride
(Antistatic Agent, Hair Conditioning)
1
B
Decyl Glucoside
(Cleansing, Emulsion Stabilising, Surfactant)
1
B
Lauryl Glucoside
(Cleansing, Surfactant)
1
B
Sodium Methyl Cocoyl Taurate
(Cleansing, Foaming, Surfactant)
Fungal Acne
Fungal Acne Trigger
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
4
B
Lactic Acid
(Exfoliant, Fragrance, Humectant, Ph Adjuster, Skin Conditioning Agent Humectant, Skin Conditioning, Buffering Agent)
Bad for Sensitive Skin
Bad for Sensitive Skin
3
B
Sodium Hydroxide
(Denaturant, Ph Adjuster, Buffering Agent)
1
Tetrasodium Glutamate Diacetate
(Chelating Agent)
1
A
Caprylyl Glycol
(Hair Conditioning, Skin Conditioning, Emollient, Humectant)
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
CI 77891
(Colorant)

My Ingredient Notes

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Key ingredients

Cocamidopropyl Hydroxysultaine
Skin Conditioning
Juniperus Communis Fruit Extract
Skin Conditioning
Glycerin
Humectant, Skin Protecting
Salicylic Acid
Exfoliant, Skin Conditioning
Betaine Salicylate
Exfoliant
Lactobacillus Ferment Extract
Skin Conditioning

Benefits

Good for oily/acne-prone skin

Concerns

Contains paraben
Contains sulfate
Not fungal acne (malassezia) safe
May not suit dry skin
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cocamidopropyl Hydroxysultaine
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Juniperus Communis Fruit Extract
Perfuming, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A PerfumingSkin conditioning
Propanediol
Solvent, Viscosity decreasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 SolventViscosity decreasing agentViscosity controlling
Acrylates Copolymer
Adhesive, Artificial nail builder
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B AdhesiveArtificial nail builderBinding agentFilm formingHair fixingSuspending agent -nonsurfactantAntistatic agentBinding
Sodium Chloride
Bulking agent, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 Bulking agentMaskingOral care agentViscosity controlling
Betaine Salicylate
Antimicrobial agent, Exfoliant
Low-hazard ingredient.Read moreShow less
EWG 1 Antimicrobial agentExfoliantKeratolytic
Lactobacillus Ferment Extract
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Lactobacillus Ferment
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Cucumis Sativus Fruit Extract
Skin conditioning, Skin conditioning emollient
Limited public safety data.Read moreShow less
EWG N/A Skin conditioningSkin conditioning emollient
Betaine
Hair conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningHumectantAntistatic agentSkin conditioningViscosity controlling
Hydroxypropyl Guar Hydroxypropyltrimonium Chloride
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioning
Decyl Glucoside
Cleansing, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingEmulsion stabilisingSurfactant
Lauryl Glucoside
Cleansing, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingSurfactant
Sodium Hydroxide
Denaturant, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B DenaturantPh adjusterBuffering agent
+ 4 more — see the full ingredients list above
Sodium C14-16 Olefin Sulfonate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B CleansingFoamingSurfactant Sulfate
Sodium Cocoyl Isethionate
Cleansing, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingHair conditioningSurfactant Fungal-acne trigger
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Salicylic Acid
Antiacne agent, Antidandruff agent
Skin irritation can occur at high concentrationRead moreShow less
EWG 4 CIR B Antiacne agentAntidandruff agentCorn/callus/wart removerDenaturantExfoliantFragranceHair conditioningSkin conditioningKeratolyticMaskingPreservative Good for Oily SkinBad for Sensitive Skin
Sodium Methyl Cocoyl Taurate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingFoamingSurfactant Fungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Lactic Acid
Exfoliant, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 4 CIR B ExfoliantFragranceHumectantPh adjusterSkin-conditioning agent -humectantSkin conditioningBuffering agent Bad for Sensitive Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben

How to use

How to use

  • 1 Where it fits: Use as the first step, on clean hands, before the rest of your routine.
  • 2 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Pregnancy & breastfeeding

Contains ingredients some choose to avoid or double-check while pregnant or nursing.

Use with caution
BHA (salicylic) (Salicylic Acid, Betaine Salicylate)

Low-strength topical salicylic acid (BHA) is generally considered fine. Caution is usually reserved for high-strength leave-on products and salicylic peels.

This is general information, not medical advice. Pregnancy guidance varies and depends on concentration and your individual situation — always check with your doctor, midwife or pharmacist. How we flag this.

Effective levels — general guide

The concentrations these actives are typically effective at in research — not a measurement of this product.

BHA (salicylic) 0.5–2%

Salicylic acid is OTC-capped at 2%; 0.5–2% is the usual leave-on range. Much below that it acts more as a soothing agent than an exfoliant.

Salicylic Acid, Betaine Salicylate

AHA (acid exfoliant) 5–10% (OTC)

OTC leave-on AHAs are usually 5–10%. The effect also depends on pH and free-acid value, not the percentage alone.

Lactic Acid

INCI lists don't disclose amounts, and we don't claim to know this product's levels — these are the ranges these ingredients are usually effective at, so you can tell a real formula from "fairy-dusting" a marketed active. How we estimate this.

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