Root Revive Pro+ - Hair Growth Shampoo

Ominira Naturals

Root Revive Pro+ - Hair Growth Shampoo

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About this product

The Ominira Naturals Root Revive Pro+ - Hair Growth Shampoo is a misc. Our analysis of its 13 ingredients (8 low-risk) rates it Excellent (97/100).

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
13
Low-risk
8
Fragrance
Fragrance-free
Origin
United Kingdom

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe Minimal Ingredients

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 2/3
Good for dry skin
Phyllanthus Emblica Fruit Extract Glycerin
Caution for dry skin
Glycerin Potassium Cocoate Potassium Oleate
Oily/Acne-Prone Skin No data
Sensitive Skin 2/4
Good for sensitive skin
Melia Azadirachta Leaf Extract Glycerin
Caution for sensitive skin
Glycerin Citric Acid Phenoxyethanol Mentha Arvensis Leaf Oil

Ingredients list

13 total
Lower hazard (1) Higher hazard (4)
All13 Fragrance4 Skin Conditioning3 Humectant3 Skin Protecting3 Ph Adjuster2 Chelating Agent2 Buffering Agent2 Masking2
EWG CIR Ingredient Name & Cosmetic Functions Notes
Rosmarinus Officinalis Water
(Fragrance)
2
Potassium Oleate
(Sufactant, Emulsifying, Surfactant)
1
A
Potassium Cocoate
(Sufactant, Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
Phyllanthus Emblica Fruit Extract
(Humectant, Skin Conditioning)
Sapindus Mukorossi Fruit Oil
(Skin Protecting)
Trigonella Foenum-Graecum Hydroxypropyltrimonium Chloride
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
1
Melia Azadirachta Leaf Extract
(Antimicrobial, Skin Protecting)
1
Acacia Concinna Fruit Extract
(Skin Conditioning)
Mentha Arvensis Leaf Oil
(Masking)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
1
A
Potassium Citrate
(Buffering Agent, Chelating Agent, Ph Adjuster)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Glycerin
Humectant, Skin Protecting
Phyllanthus Emblica Fruit Extract
Humectant, Skin Conditioning
Sapindus Mukorossi Fruit Oil
Skin Protecting
Trigonella Foenum-Graecum Hydroxypropyltrimonium Chloride
Skin Conditioning
Melia Azadirachta Leaf Extract
Skin Protecting
Acacia Concinna Fruit Extract
Skin Conditioning

Benefits

No standout benefits flagged for this product.

Concerns

Contains paraben
Not fungal acne (malassezia) safe
May not suit dry skin
May not suit sensitive skin

Ingredients explained

Rosmarinus Officinalis Water
Fragrance
Limited public safety data.Read moreShow less
EWG N/A Fragrance
Potassium Oleate
Sufactant, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 2 SufactantEmulsifyingSurfactant
Phyllanthus Emblica Fruit Extract
Humectant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 HumectantSkin conditioning
Sapindus Mukorossi Fruit Oil
Skin protecting
Limited public safety data.Read moreShow less
EWG N/A Skin protecting
Trigonella Foenum-Graecum Hydroxypropyltrimonium Chloride
Antistatic agent, Hair conditioning
Limited public safety data.Read moreShow less
EWG N/A Antistatic agentHair conditioningSkin conditioning
Melia Azadirachta Leaf Extract
Antimicrobial, Skin protecting
Low-hazard ingredient.Read moreShow less
EWG 1 AntimicrobialSkin protecting
Acacia Concinna Fruit Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Mentha Arvensis Leaf Oil
Masking
Limited public safety data.Read moreShow less
EWG N/A Masking
Potassium Citrate
Buffering agent, Chelating agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Buffering agentChelating agentPh adjuster
Potassium Cocoate
Sufactant, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A SufactantEmulsifyingSurfactant Fungal-acne trigger
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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