Shampoo For Moisture & Control

Oribe

Shampoo For Moisture & Control

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About this product

The Oribe Shampoo For Moisture & Control is a misc. Our analysis of its 46 ingredients (39 low-risk) rates it Excellent (97/100). Based on its ingredients, it looks well-suited to dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
46
Low-risk
39
Fragrance
Contains fragrance
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 9/7
Good for dry skin
Glycol Distearate Glycereth-26 Butylene Glycol Sodium PCA Glycerin Coconut Acid Histidine Sodium Lactate PCA
Caution for dry skin
Sodium Isethionate Sodium Cocoyl Isethionate Glycerin Coconut Acid Trideceth-12 Laureth-5 Carboxylic Acid Sodium Hydroxide
Oily/Acne-Prone Skin No data
Sensitive Skin 1/20
Good for sensitive skin
Glycerin
Caution for sensitive skin
Glycine Valine Styrax Benzoin Resin Extract Serine Aspartic Acid Alanine Arginine Isoleucine Butylene Glycol Glycerin Threonine Phenylalanine Proline Histidine Citric Acid Sodium Benzoate Potassium Sorbate Phenoxyethanol Hexyl Cinnamal Limonene

Ingredients list

46 total
Lower hazard (1) Higher hazard (6)
All46 Skin Conditioning32 Fragrance20 Hair Conditioning18 Antistatic Agent15 Masking10 Humectant9 Viscosity Controlling6 Solvent6
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
B
Sodium Cocoyl Isethionate
(Cleansing, Hair Conditioning, Surfactant)
Fungal Acne
Fungal Acne Trigger
2
Laureth-5 Carboxylic Acid
(Cleansing, Emulsifying, Surfactant)
1
Silicone Quaternium-3
(Antistatic Agent, Hair Conditioning)
1
A
Amodimethicone
(Antistatic Agent, Hair Conditioning)
Silicone
Silicone
1
Glycereth-26
(Humectant, Viscosity Decreasing Agent, Solvent, Viscosity Controlling)
1
A
Coconut Acid
(Cleansing, Emollient, Emulsifying, Surfactant)
1
Cocamide MIPA
(Foam Boosting, Viscosity Increasing Agent, Emulsifying, Emulsion Stabilising, Viscosity Controlling)
1
A
Glycol Distearate
(Opacifying, Viscosity Increasing Agent, Emollient, Emulsifying, Skin Conditioning, Viscosity Controlling)
Fungal Acne
Fungal Acne Trigger
1
B
Sodium Isethionate
(Antistatic Agent, Cleansing, Hair Conditioning, Skin Conditioning)
PARFUM
(Fragrance, Perfuming)
1
Propanediol
(Solvent, Viscosity Decreasing Agent, Viscosity Controlling)
1
A
Polyquaternium-10
(Antistatic Agent, Film Forming, Hair Fixing)
3
B
Sodium Hydroxide
(Denaturant, Ph Adjuster, Buffering Agent)
1
Trideceth-12
(Emulsifying, Surfactant)
3
A
Potassium Sorbate
(Fragrance, Preservative)
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
1
A
Disodium EDTA
(Chelating Agent, Viscosity Controlling)
1
Polyquaternium-59
(Uv Absorber)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
B
Sodium PCA
(Hair Conditioning, Humectant, Antistatic Agent, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
3
B
Sodium Lactate
(Buffering Agent, Exfoliant, Humectant, Keratolytic)
1
A
Arginine
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent, Masking)
1
A
Aspartic Acid
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent, Masking)
Helianthus Annuus Seed Oil
(Fragrance, Skin Conditioning, Skin Conditioning Emollient)
3
B
PCA
(Humectant, Moisturising)
Citrullus Lanatus Fruit Extract
(Skin Conditioning)
Leontopodium Alpinum Flower/Leaf Extract
(Skin Conditioning)
1
Litchi Chinensis Fruit Extract
(Skin Conditioning)
1
A
Glycine
(Buffering Agent, Fragrance, Hair Conditioning, Skin Conditioning Agent Miscellaneous, Antistatic Agent, Skin Conditioning)
1
A
Alanine
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent, Masking)
1
A
Serine
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent, Masking)
1
A
Valine
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent, Masking)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
1
A
Isoleucine
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent)
1
A
Proline
(Fragrance, Hair Conditioning, Skin Conditioning)
1
A
Threonine
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent, Hair Waving Or Straightening)
1
Styrax Benzoin Resin Extract
(Film Forming, Masking, Perfuming)
1
A
Histidine
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent, Humectant)
1
A
Phenylalanine
(Fragrance, Hair Conditioning, Skin Conditioning)
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
6
Limonene
(Deodorant, Perfuming, Solvent)
Allergens
Allergens
5
Hexyl Cinnamal
(Fragrance, Masking)
Allergens
Allergens

My Ingredient Notes

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Key ingredients

Glycereth-26
Humectant
Coconut Acid
Emollient
Glycol Distearate
Emollient, Skin Conditioning
Sodium Isethionate
Skin Conditioning
Ethylhexylglycerin
Skin Conditioning
Polyquaternium-59
Uv Absorber

Benefits

Good for dry skin

Concerns

Contains paraben
Contains silicone
Contains eu allergen
Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Laureth-5 Carboxylic Acid
Cleansing, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 2 CleansingEmulsifyingSurfactant
Silicone Quaternium-3
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Antistatic agentHair conditioning
Glycereth-26
Humectant, Viscosity decreasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 HumectantViscosity decreasing agentSolventViscosity controlling
Coconut Acid
Cleansing, Emollient
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A CleansingEmollientEmulsifyingSurfactant
Cocamide MIPA
Foam boosting, Viscosity increasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 Foam boostingViscosity increasing agentEmulsifyingEmulsion stabilisingViscosity controlling
Sodium Isethionate
Antistatic agent, Cleansing
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Antistatic agentCleansingHair conditioningSkin conditioning
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Propanediol
Solvent, Viscosity decreasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 SolventViscosity decreasing agentViscosity controlling
Polyquaternium-10
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
Sodium Hydroxide
Denaturant, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B DenaturantPh adjusterBuffering agent
Trideceth-12
Emulsifying, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 EmulsifyingSurfactant
Potassium Sorbate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservative
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Disodium EDTA
Chelating agent, Viscosity controlling
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentViscosity controlling
+ 20 more — see the full ingredients list above
Sodium Cocoyl Isethionate
Cleansing, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingHair conditioningSurfactant Fungal-acne trigger
Amodimethicone
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioning Silicone
Glycol Distearate
Opacifying, Viscosity increasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A OpacifyingViscosity increasing agentEmollientEmulsifyingSkin conditioningViscosity controlling Fungal-acne trigger
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Sodium PCA
Hair conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningHumectantAntistatic agentSkin conditioning Good for Dry Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Limonene
Deodorant, Perfuming
Moderate-hazard ingredient.Read moreShow less
EWG 6 DeodorantPerfumingSolvent Allergens
Hexyl Cinnamal
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Officially notified as a cosmetic in Malaysia (NPRA). Government registration record.

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