Crème De Whipped Foam Nourishing Mask

Pai-Shau

Crème De Whipped Foam Nourishing Mask

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About this product

The Pai-Shau Crème De Whipped Foam Nourishing Mask is a misc. Our analysis of its 21 ingredients (13 low-risk) rates it Excellent (89/100). Based on its ingredients, it looks well-suited to oily / acne-prone and dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
21
Low-risk
13
Fragrance
Contains fragrance
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 4/2
Good for dry skin
Cetearyl Alcohol Sodium Hyaluronate Propylene Glycol Camellia Sinensis Leaf Extract
Caution for dry skin
Camellia Sinensis Leaf Extract Polysorbate 20
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Camellia Sinensis Leaf Extract
Sensitive Skin 1/5
Good for sensitive skin
Camellia Sinensis Leaf Extract
Caution for sensitive skin
Propylene Glycol Citric Acid Camellia Sinensis Leaf Extract Phenoxyethanol Isobutane

Ingredients list

21 total
Lower hazard (1) Higher hazard (7)
All21 Skin Conditioning10 Fragrance5 Humectant4 Hair Conditioning4 Antistatic Agent3 Masking2 Uv Absorber2 Perfuming2
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
7
A
Isobutane
(Propellant)
1
A
Cetearyl Alcohol
(Emulsion Stabilising, Opacifying, Foam Boosting, Viscosity Increasingagent Aqueous, Viscosity Increasing Agent, Emollient, Emulsifying, Viscosity Controlling)
3
B
Behentrimonium Chloride
(Antistatic Agent, Hair Conditioning, Preservative)
1
Bis-Hydroxy/Methoxy Amodimethicone
(Hair Conditioning)
1
Quaternium-80
(Antistatic Agent, Hair Conditioning)
4
A
Propane
(Propellant)
1
A
Polyquaternium-10
(Antistatic Agent, Film Forming, Hair Fixing)
cocos nucifera oil
(Fragrance, Hair Conditioning, Perfuming, Skin Conditioning)
1
A
Sodium Hyaluronate
(Skin Conditioning, Humectant)
Good for Dry Skin
Good for Dry Skin
6
Ethylhexyl Methoxycinnamate
(Uv Absorber, Uv Filter)
Bad for Oily Skin
Bad for Oily Skin
Bad for Sensitive Skin
Bad for Sensitive Skin
3
B
Polysorbate 20
(Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
Aspalathus Linearis Leaf Extract
(Skin Conditioning)
1
B
Camellia Sinensis Leaf Extract
(Antimicrobial, Antioxidant, Astringent, Emollient, Humectant, Masking, Oral Care Agent, Skin Conditioning, Skin Protecting, Tonic, Uv Absorber)
Good for Oily Skin
Good for Oily Skin
Monarda Didyma Leaf Extract
(Skin Conditioning)
Thymus Serpyllum Leaf Extract
(Skin Conditioning)
3
B
Propylene Glycol
(Fragrance, Humectant, Skin Conditioningagent Miscellaneous, Solvent, Viscosity Decreasing Agent, Skin Conditioning, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
PARFUM
(Fragrance, Perfuming)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Cetearyl Alcohol
Emollient
cocos nucifera oil
Skin Conditioning
Sodium Hyaluronate
Skin Conditioning, Humectant
Ethylhexyl Methoxycinnamate
Uv Absorber, Uv Filter
Aspalathus Linearis Leaf Extract
Skin Conditioning
Camellia Sinensis Leaf Extract
Antioxidant, Astringent

Benefits

Good for dry skin
Good for oily/acne-prone skin

Concerns

Contains paraben
Not fungal acne (malassezia) safe
Isobutane — higher EWG
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cetearyl Alcohol
Emulsion stabilising, Opacifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Emulsion stabilisingOpacifyingFoam boostingViscosity increasingagent - aqueousViscosity increasing agentEmollientEmulsifyingViscosity controlling
Behentrimonium Chloride
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B Antistatic agentHair conditioningPreservative
Bis-Hydroxy/Methoxy Amodimethicone
Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Hair conditioning
Quaternium-80
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Antistatic agentHair conditioning
Propane
Propellant
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A Propellant
Polyquaternium-10
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
cocos nucifera oil
Fragrance, Hair conditioning
Limited public safety data.Read moreShow less
EWG N/A FragranceHair conditioningPerfumingSkin conditioning
Aspalathus Linearis Leaf Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Monarda Didyma Leaf Extract
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Thymus Serpyllum Leaf Extract
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Isobutane
Propellant
Higher-hazard ingredient.Read moreShow less
EWG 7 CIR A Propellant
Sodium Hyaluronate
Skin conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningHumectant Good for Dry Skin
Ethylhexyl Methoxycinnamate
Uv absorber, Uv filter
Potentially a skin irritantRead moreShow less
EWG 6 Uv absorberUv filter Bad for Oily SkinBad for Sensitive Skin
Polysorbate 20
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant Fungal-acne trigger
Camellia Sinensis Leaf Extract
Antimicrobial, Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B AntimicrobialAntioxidantAstringentEmollientHumectantMaskingOral care agentSkin conditioningSkin protectingTonicUv absorber Good for Oily Skin
Propylene Glycol
Fragrance, Humectant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B FragranceHumectantSkin-conditioningagent - miscellaneousSolventViscosity decreasing agentSkin conditioningViscosity controlling Good for Dry Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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