Moisture Milk

Pattern by Tracee Ellis Ross

Where to buy Possibly in stock

About this product

The Pattern by Tracee Ellis Ross Moisture Milk is a emulsion. Our analysis of its 31 ingredients (16 low-risk) rates it Excellent (83/100). Based on its ingredients, it looks well-suited to dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Emulsion
Ingredients
31
Low-risk
16
Fragrance
Contains fragrance
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 5/4
Good for dry skin
C12-15 Alkyl Benzoate Cetearyl Alcohol Phyllanthus Emblica Fruit Extract Glycerin Hydroxypropyl Bis-Hydroxyethyldimonium Chloride
Caution for dry skin
Glyceryl Stearate SE Behentrimonium Methosulfate Glycerin Polysorbate 60
Oily/Acne-Prone Skin No data
Sensitive Skin 1/12
Good for sensitive skin
Glycerin
Caution for sensitive skin
Disodium Phosphate Glycerin Phenoxyethanol Linalool Benzyl Alcohol Citronellol Hexyl Cinnamal Limonene Benzyl Benzoate Coumarin Hydroxycitronellal Amyl Cinnamal

Ingredients list

31 total
Lower hazard (1) Higher hazard (7)
All31 Fragrance13 Skin Conditioning11 Masking8 Solvent6 Hair Conditioning5 Perfuming5 Humectant4 Emulsion Stabilising4
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
A
Cetearyl Alcohol
(Emulsion Stabilising, Opacifying, Foam Boosting, Viscosity Increasingagent Aqueous, Viscosity Increasing Agent, Emollient, Emulsifying, Viscosity Controlling)
1
A
C12-15 Alkyl Benzoate
(Skin Conditioning, Emollient, Antimicrobial)
cocos nucifera oil
(Fragrance, Hair Conditioning, Perfuming, Skin Conditioning)
1
B
Behentrimonium Methosulfate
(Antistatic Agent, Hair Conditioning, Surfactant)
Sesamum Indicum Seed Oil
(Fragrance, Hair Conditioning, Skin Conditioning, Skin Conditioning Emollient)
Agave Rigida Extract
(Bulking)
Chondrus Crispus Extract
(Skin Conditioning, Viscosity Controlling)
1
Phyllanthus Emblica Fruit Extract
(Humectant, Skin Conditioning)
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
1
A
Glyceryl Stearate SE
(Emulsifying, Surfactant)
Bad for Oily Skin
Bad for Oily Skin
1
B
Polyquaternium-37
(Antistatic Agent, Film Forming, Hair Fixing)
1
Hydroxypropyl Bis-Hydroxyethyldimonium Chloride
(Humectant, Skin Conditioning)
5
A
Benzyl Alcohol
(External Analgesic, Fragrance, Oral Health Care Drug, Preservative, Solvent, Viscosity Decreasing Agent, Masking)
Allergens
Allergens
3
B
Polysorbate 60
(Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
A
Hydroxyethylcellulose
(Binding Agent, Emulsion Stabilising, Film Forming, Viscosity Increasing Agent, Binding, Stabilising, Viscosity Controlling)
1
A
Pentylene Glycol
(Skin Conditioning, Solvent)
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
1
B
Disodium Phosphate
(Buffering Agent, Anticorrosive, Fragrance, Ph Adjuster, Masking)
1
B
Sodium Phosphate
(Buffering Agent)
PARFUM
(Fragrance, Perfuming)
Amyl Cinnamal
(Perfuming)
Allergens
Allergens
6
A
Benzyl Benzoate
(Fragrance, Solvent, Antimicrobial, Masking)
Allergens
Allergens
5
Citronellol
(Fragrance, Masking)
Allergens
Allergens
7
Coumarin
(Fragrance, Masking)
Allergens
Allergens
6
Limonene
(Deodorant, Perfuming, Solvent)
Allergens
Allergens
5
Hexyl Cinnamal
(Fragrance, Masking)
Allergens
Allergens
7
Hydroxycitronellal
(Fragrance, Masking)
Allergens
Allergens
5
Linalool
(Fragrance, Deodorant, Masking)
Allergens
Allergens

My Ingredient Notes

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Key ingredients

Glycerin
Humectant, Skin Protecting
Cetearyl Alcohol
Emollient
C12-15 Alkyl Benzoate
Skin Conditioning, Emollient
cocos nucifera oil
Skin Conditioning
Sesamum Indicum Seed Oil
Skin Conditioning
Chondrus Crispus Extract
Skin Conditioning

Benefits

Good for dry skin

Concerns

Contains paraben
Contains eu allergen
Not fungal acne (malassezia) safe
Coumarin — higher EWG
Hydroxycitronellal — higher EWG
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cetearyl Alcohol
Emulsion stabilising, Opacifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Emulsion stabilisingOpacifyingFoam boostingViscosity increasingagent - aqueousViscosity increasing agentEmollientEmulsifyingViscosity controlling
C12-15 Alkyl Benzoate
Skin conditioning, Emollient
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningEmollientAntimicrobial
cocos nucifera oil
Fragrance, Hair conditioning
Limited public safety data.Read moreShow less
EWG N/A FragranceHair conditioningPerfumingSkin conditioning
Behentrimonium Methosulfate
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Antistatic agentHair conditioningSurfactant
Sesamum Indicum Seed Oil
Fragrance, Hair conditioning
Limited public safety data.Read moreShow less
EWG N/A FragranceHair conditioningSkin conditioningSkin conditioning emollient
Agave Rigida Extract
Bulking
Limited public safety data.Read moreShow less
EWG N/A Bulking
Chondrus Crispus Extract
Skin conditioning, Viscosity controlling
Limited public safety data.Read moreShow less
EWG N/A Skin conditioningViscosity controlling
Phyllanthus Emblica Fruit Extract
Humectant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 HumectantSkin conditioning
Polyquaternium-37
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Antistatic agentFilm formingHair fixing
Hydroxypropyl Bis-Hydroxyethyldimonium Chloride
Humectant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 HumectantSkin conditioning
Hydroxyethylcellulose
Binding agent, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Binding agentEmulsion stabilisingFilm formingViscosity increasing agentBindingStabilisingViscosity controlling
Pentylene Glycol
Skin conditioning, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningSolvent
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Disodium Phosphate
Buffering agent, Anticorrosive
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Buffering agentAnticorrosiveFragrancePh adjusterMasking
+ 2 more — see the full ingredients list above
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Glyceryl Stearate SE
Emulsifying, Surfactant
Potentially comedogenic - can block poresRead moreShow less
EWG 1 CIR A EmulsifyingSurfactant Bad for Oily Skin
Benzyl Alcohol
External analgesic, Fragrance
Moderate-hazard ingredient.Read moreShow less
EWG 5 CIR A External analgesicFragranceOral health care drugPreservativeSolventViscosity decreasing agentMasking Allergens
Polysorbate 60
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant Fungal-acne trigger
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Amyl Cinnamal
Perfuming
Limited public safety data.Read moreShow less
EWG N/A Perfuming Allergens
Benzyl Benzoate
Fragrance, Solvent
Moderate-hazard ingredient.Read moreShow less
EWG 6 CIR A FragranceSolventAntimicrobialMasking Allergens
Citronellol
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens
Coumarin
Fragrance, Masking
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceMasking Allergens
Limonene
Deodorant, Perfuming
Moderate-hazard ingredient.Read moreShow less
EWG 6 DeodorantPerfumingSolvent Allergens
Hexyl Cinnamal
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens
Hydroxycitronellal
Fragrance, Masking
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceMasking Allergens
Linalool
Fragrance, Deodorant
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceDeodorantMasking Allergens

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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