Styling Custard

Pattern by Tracee Ellis Ross

Where to buy Possibly in stock

About this product

The Pattern by Tracee Ellis Ross Styling Custard is a misc. Our analysis of its 23 ingredients (9 low-risk) rates it Excellent (80/100). Based on its ingredients, it looks well-suited to dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
23
Low-risk
9
Fragrance
Contains fragrance
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 2/2
Good for dry skin
Methyl Gluceth-10 Glycerin
Caution for dry skin
Glycerin Polysorbate 20
Oily/Acne-Prone Skin No data
Sensitive Skin 1/11
Good for sensitive skin
Glycerin
Caution for sensitive skin
Caramel Glycerin Phenoxyethanol Linalool Citronellol Hexyl Cinnamal Limonene Benzyl Benzoate Coumarin Hydroxycitronellal Amyl Cinnamal

Ingredients list

23 total
Lower hazard (1) Higher hazard (7)
All23 Fragrance10 Masking7 Skin Conditioning6 Perfuming5 Solvent4 Film Forming4 Deodorant3 Humectant3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
B
Polyquaternium-37
(Antistatic Agent, Film Forming, Hair Fixing)
3
B
Polysorbate 20
(Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
A
Polyquaternium-11
(Antistatic Agent, Film Forming, Hair Fixing)
1
A
Methyl Gluceth-10
(Emulsifying, Humectant, Moisturising)
Linum Usitatissimum Seed Oil
(Perfuming, Skin Conditioning)
Chondrus Crispus Extract
(Skin Conditioning, Viscosity Controlling)
Chamomilla Recutita Extract
(Skin Conditioning)
Agave Rigida Extract
(Bulking)
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
PARFUM
(Fragrance, Perfuming)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
6
A
Benzyl Benzoate
(Fragrance, Solvent, Antimicrobial, Masking)
Allergens
Allergens
5
Hexyl Cinnamal
(Fragrance, Masking)
Allergens
Allergens
Amyl Cinnamal
(Perfuming)
Allergens
Allergens
7
Hydroxycitronellal
(Fragrance, Masking)
Allergens
Allergens
5
Linalool
(Fragrance, Deodorant, Masking)
Allergens
Allergens
5
Citronellol
(Fragrance, Masking)
Allergens
Allergens
6
Limonene
(Deodorant, Perfuming, Solvent)
Allergens
Allergens
7
Coumarin
(Fragrance, Masking)
Allergens
Allergens
1
Caramel
(Colorant, Fragrance, Cosmetic Colorant, Masking)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Glycerin
Humectant, Skin Protecting
Methyl Gluceth-10
Humectant, Moisturising
Linum Usitatissimum Seed Oil
Skin Conditioning
Chondrus Crispus Extract
Skin Conditioning
Chamomilla Recutita Extract
Skin Conditioning
Panthenol
Skin Conditioning

Benefits

No standout benefits flagged for this product.

Concerns

Contains paraben
Contains eu allergen
Not fungal acne (malassezia) safe
Hydroxycitronellal — higher EWG
Coumarin — higher EWG
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Polyquaternium-37
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Antistatic agentFilm formingHair fixing
Polyquaternium-11
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
Methyl Gluceth-10
Emulsifying, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmulsifyingHumectantMoisturising
Linum Usitatissimum Seed Oil
Perfuming, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A PerfumingSkin conditioning
Chondrus Crispus Extract
Skin conditioning, Viscosity controlling
Limited public safety data.Read moreShow less
EWG N/A Skin conditioningViscosity controlling
Chamomilla Recutita Extract
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Agave Rigida Extract
Bulking
Limited public safety data.Read moreShow less
EWG N/A Bulking
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Caramel
Colorant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 1 ColorantFragranceCosmetic colorantMasking
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Polysorbate 20
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant Fungal-acne trigger
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Benzyl Benzoate
Fragrance, Solvent
Moderate-hazard ingredient.Read moreShow less
EWG 6 CIR A FragranceSolventAntimicrobialMasking Allergens
Hexyl Cinnamal
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens
Amyl Cinnamal
Perfuming
Limited public safety data.Read moreShow less
EWG N/A Perfuming Allergens
Hydroxycitronellal
Fragrance, Masking
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceMasking Allergens
Linalool
Fragrance, Deodorant
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceDeodorantMasking Allergens
Citronellol
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens
Limonene
Deodorant, Perfuming
Moderate-hazard ingredient.Read moreShow less
EWG 6 DeodorantPerfumingSolvent Allergens
Coumarin
Fragrance, Masking
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceMasking Allergens

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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