Awapuhi Moisture Mist

Paul Mitchell

Where to buy Possibly in stock

About this product

The Paul Mitchell Awapuhi Moisture Mist is a misc. Our analysis of its 30 ingredients (16 low-risk) rates it Great (76/100). Based on its ingredients, it looks well-suited to dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
30
Low-risk
16
Fragrance
Contains fragrance
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 3/3
Good for dry skin
Sodium PCA Propylene Glycol Lactic Acid
Caution for dry skin
Terpineol PEG-40 Hydrogenated Castor Oil Eugenol
Oily/Acne-Prone Skin No data
Sensitive Skin 1/18
Good for sensitive skin
Spirulina Platensis Extract
Caution for sensitive skin
Hedychium Coronarium Root Extract Linalyl Acetate Vanillin Propylene Glycol Terpineol PEG-40 Hydrogenated Castor Oil Lactic Acid Phenoxyethanol Linalool Benzyl Alcohol Citronellol Hexyl Cinnamal Benzyl Benzoate Benzyl Salicylate Eugenol Geraniol Hydroxycitronellal Amyl Cinnamal

Ingredients list

30 total
Lower hazard (1) Higher hazard (7)
All30 Fragrance16 Masking13 Skin Conditioning11 Solvent5 Humectant5 Preservative4 Perfuming4 Tonic3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
3
B
Propylene Glycol
(Fragrance, Humectant, Skin Conditioningagent Miscellaneous, Solvent, Viscosity Decreasing Agent, Skin Conditioning, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
Hedychium Coronarium Root Extract
(Masking, Skin Conditioning, Tonic)
1
Spirulina Platensis Extract
(Skin Protecting)
1
Lactobacillus Ferment
(Skin Conditioning)
Chondrus Crispus Extract
(Skin Conditioning, Viscosity Controlling)
1
B
Sodium PCA
(Hair Conditioning, Humectant, Antistatic Agent, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
3
B
PEG-40 Hydrogenated Castor Oil
(Fragrance, Emulsifying, Surfactant, Perfuming)
Fungal Acne
Fungal Acne Trigger
3
Bisamino PEG/PPG-41/3 Aminoethyl PG-Propyl Dimethicone
(Hair Conditioning)
3
A
PEG-12 Dimethicone
(Hair Conditioning, Skin Conditioning)
1
Polyquaternium-4
(Antistatic Agent, Film Forming, Hair Fixing)
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
4
B
Lactic Acid
(Exfoliant, Fragrance, Humectant, Ph Adjuster, Skin Conditioning Agent Humectant, Skin Conditioning, Buffering Agent)
Bad for Sensitive Skin
Bad for Sensitive Skin
2
A
Chlorphenesin
(Cosmetic Biocide, Antimicrobial, Preservative)
1
A
Sodium Dehydroacetate
(Preservative)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
PARFUM
(Fragrance, Perfuming)
7
Hydroxycitronellal
(Fragrance, Masking)
Allergens
Allergens
5
A
Benzyl Alcohol
(External Analgesic, Fragrance, Oral Health Care Drug, Preservative, Solvent, Viscosity Decreasing Agent, Masking)
Allergens
Allergens
1
Terpineol
(Denaturant, Masking, Perfuming, Solvent)
1
Vanillin
(Flavoring Agent, Fragrance, Masking)
5
Linalool
(Fragrance, Deodorant, Masking)
Allergens
Allergens
5
Hexyl Cinnamal
(Fragrance, Masking)
Allergens
Allergens
1
Linalyl Acetate
(Fragrance, Masking)
Amyl Cinnamal
(Perfuming)
Allergens
Allergens
5
Citronellol
(Fragrance, Masking)
Allergens
Allergens
7
Benzyl Salicylate
(Fragrance, Uv Absorber, Masking)
Allergens
Allergens
7
Geraniol
(Fragrance, Masking, Tonic)
Allergens
Allergens
7
Eugenol
(Denaturant, Fragrance, Masking, Tonic)
Allergens
Allergens
6
A
Benzyl Benzoate
(Fragrance, Solvent, Antimicrobial, Masking)
Allergens
Allergens

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Propylene Glycol
Humectant, Skin Conditioning
Hedychium Coronarium Root Extract
Skin Conditioning
Spirulina Platensis Extract
Skin Protecting
Lactobacillus Ferment
Skin Conditioning
Chondrus Crispus Extract
Skin Conditioning
Sodium PCA
Humectant, Skin Conditioning

Benefits

No standout benefits flagged for this product.

Concerns

Contains paraben
Contains eu allergen
Not fungal acne (malassezia) safe
Hydroxycitronellal — higher EWG
Benzyl Salicylate — higher EWG
Geraniol — higher EWG
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Hedychium Coronarium Root Extract
Masking, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 MaskingSkin conditioningTonic
Spirulina Platensis Extract
Skin protecting
Low-hazard ingredient.Read moreShow less
EWG 1 Skin protecting
Lactobacillus Ferment
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Chondrus Crispus Extract
Skin conditioning, Viscosity controlling
Limited public safety data.Read moreShow less
EWG N/A Skin conditioningViscosity controlling
Bisamino PEG/PPG-41/3 Aminoethyl PG-Propyl Dimethicone
Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 3 Hair conditioning
PEG-12 Dimethicone
Hair conditioning, Skin conditioning
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Hair conditioningSkin conditioning
Polyquaternium-4
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 Antistatic agentFilm formingHair fixing
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Chlorphenesin
Cosmetic biocide, Antimicrobial
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Cosmetic biocideAntimicrobialPreservative
Sodium Dehydroacetate
Preservative
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Preservative
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Terpineol
Denaturant, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 DenaturantMaskingPerfumingSolvent
Vanillin
Flavoring agent, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 1 Flavoring agentFragranceMasking
Linalyl Acetate
Fragrance, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 FragranceMasking
Propylene Glycol
Fragrance, Humectant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B FragranceHumectantSkin-conditioningagent - miscellaneousSolventViscosity decreasing agentSkin conditioningViscosity controlling Good for Dry Skin
Sodium PCA
Hair conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningHumectantAntistatic agentSkin conditioning Good for Dry Skin
PEG-40 Hydrogenated Castor Oil
Fragrance, Emulsifying
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B FragranceEmulsifyingSurfactantPerfuming Fungal-acne trigger
Lactic Acid
Exfoliant, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 4 CIR B ExfoliantFragranceHumectantPh adjusterSkin-conditioning agent -humectantSkin conditioningBuffering agent Bad for Sensitive Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Hydroxycitronellal
Fragrance, Masking
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceMasking Allergens
Benzyl Alcohol
External analgesic, Fragrance
Moderate-hazard ingredient.Read moreShow less
EWG 5 CIR A External analgesicFragranceOral health care drugPreservativeSolventViscosity decreasing agentMasking Allergens
Linalool
Fragrance, Deodorant
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceDeodorantMasking Allergens
Hexyl Cinnamal
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens
Amyl Cinnamal
Perfuming
Limited public safety data.Read moreShow less
EWG N/A Perfuming Allergens
Citronellol
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens
Benzyl Salicylate
Fragrance, Uv absorber
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceUv absorberMasking Allergens
Geraniol
Fragrance, Masking
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceMaskingTonic Allergens
Eugenol
Denaturant, Fragrance
Higher-hazard ingredient.Read moreShow less
EWG 7 DenaturantFragranceMaskingTonic Allergens
Benzyl Benzoate
Fragrance, Solvent
Moderate-hazard ingredient.Read moreShow less
EWG 6 CIR A FragranceSolventAntimicrobialMasking Allergens

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.
  • 2 Wear SPF the next day: Acids and retinoids increase sun sensitivity — daily sunscreen is a must while using this.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Officially notified as a cosmetic in Malaysia (NPRA). Government registration record.

Effective levels — general guide

The concentrations these actives are typically effective at in research — not a measurement of this product.

AHA (acid exfoliant) 5–10% (OTC)

OTC leave-on AHAs are usually 5–10%. The effect also depends on pH and free-acid value, not the percentage alone.

Lactic Acid

INCI lists don't disclose amounts, and we don't claim to know this product's levels — these are the ranges these ingredients are usually effective at, so you can tell a real formula from "fairy-dusting" a marketed active. How we estimate this.

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