Color Protect Conditioner

Paul Mitchell

Where to buy Possibly in stock

About this product

The Paul Mitchell Color Protect Conditioner is a emulsion. Our analysis of its 22 ingredients (8 low-risk) rates it Great (74/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Emulsion
Ingredients
22
Low-risk
8
Fragrance
Contains fragrance
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 1/3
Good for dry skin
Butylene Glycol
Caution for dry skin
Terpineol Cetrimonium Chloride Polysorbate 20
Oily/Acne-Prone Skin No data
Sensitive Skin 0/13
Caution for sensitive skin
Butylene Glycol Terpineol Tetramethyl Acetyloctahydronaphthalenes Phenoxyethanol Linalool Citronellol Hexyl Cinnamal Limonene Benzyl Benzoate Benzyl Salicylate Geraniol Hydroxycitronellal Hexamethylindanopyran

Ingredients list

22 total
Lower hazard (1) Higher hazard (7)
All22 Masking11 Fragrance10 Skin Conditioning7 Perfuming6 Solvent5 Deodorant3 Uv Absorber2 Antistatic Agent2
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
Helianthus Annuus Seed Extract
(Skin Conditioning)
Citrus Aurantium Amara Peel Oil
(Skin Conditioning)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
1
Cinnamidopropyltrimonium Chloride
(Antistatic Agent, Hair Conditioning)
3
B
Cetrimonium Chloride
(Antistatic Agent, Cosmetic Biocide, Emulsifying, Surfactant, Antimicrobial, Preservative)
3
B
Polysorbate 20
(Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
7
Hydroxycitronellal
(Fragrance, Masking)
Allergens
Allergens
7
Geraniol
(Fragrance, Masking, Tonic)
Allergens
Allergens
Hexamethylindanopyran
(Masking, Perfuming)
1
Tetramethyl Acetyloctahydronaphthalenes
(Masking, Perfuming, Skin Conditioning)
PARFUM
(Fragrance, Perfuming)
Acetylcedrene
(Perfuming)
5
Linalool
(Fragrance, Deodorant, Masking)
Allergens
Allergens
5
Hexyl Cinnamal
(Fragrance, Masking)
Allergens
Allergens
7
Benzyl Salicylate
(Fragrance, Uv Absorber, Masking)
Allergens
Allergens
5
Citronellol
(Fragrance, Masking)
Allergens
Allergens
6
A
Benzyl Benzoate
(Fragrance, Solvent, Antimicrobial, Masking)
Allergens
Allergens
6
Limonene
(Deodorant, Perfuming, Solvent)
Allergens
Allergens
1
Terpineol
(Denaturant, Masking, Perfuming, Solvent)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Helianthus Annuus Seed Extract
Skin Conditioning
Citrus Aurantium Amara Peel Oil
Skin Conditioning
Butylene Glycol
Skin Conditioning, Humectant
Ethylhexylglycerin
Skin Conditioning
Tetramethyl Acetyloctahydronaphthalenes
Skin Conditioning
Benzyl Salicylate
Uv Absorber

Benefits

No standout benefits flagged for this product.

Concerns

Contains paraben
Contains eu allergen
Not fungal acne (malassezia) safe
Hydroxycitronellal — higher EWG
Geraniol — higher EWG
Benzyl Salicylate — higher EWG
May not suit dry skin
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Helianthus Annuus Seed Extract
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Citrus Aurantium Amara Peel Oil
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Cinnamidopropyltrimonium Chloride
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Antistatic agentHair conditioning
Cetrimonium Chloride
Antistatic agent, Cosmetic biocide
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B Antistatic agentCosmetic biocideEmulsifyingSurfactantAntimicrobialPreservative
Hexamethylindanopyran
Masking, Perfuming
Limited public safety data.Read moreShow less
EWG N/A MaskingPerfuming
Tetramethyl Acetyloctahydronaphthalenes
Masking, Perfuming
Low-hazard ingredient.Read moreShow less
EWG 1 MaskingPerfumingSkin conditioning
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Acetylcedrene
Perfuming
Limited public safety data.Read moreShow less
EWG N/A Perfuming
Terpineol
Denaturant, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 DenaturantMaskingPerfumingSolvent
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Polysorbate 20
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant Fungal-acne trigger
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Hydroxycitronellal
Fragrance, Masking
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceMasking Allergens
Geraniol
Fragrance, Masking
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceMaskingTonic Allergens
Linalool
Fragrance, Deodorant
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceDeodorantMasking Allergens
Hexyl Cinnamal
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens
Benzyl Salicylate
Fragrance, Uv absorber
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceUv absorberMasking Allergens
Citronellol
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens
Benzyl Benzoate
Fragrance, Solvent
Moderate-hazard ingredient.Read moreShow less
EWG 6 CIR A FragranceSolventAntimicrobialMasking Allergens
Limonene
Deodorant, Perfuming
Moderate-hazard ingredient.Read moreShow less
EWG 6 DeodorantPerfumingSolvent Allergens

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Officially notified as a cosmetic in Malaysia (NPRA). Government registration record.

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