Super Sculpt Styling Glaze

Paul Mitchell

Where to buy Possibly in stock

About this product

The Paul Mitchell Super Sculpt Styling Glaze is a misc. Our analysis of its 18 ingredients (12 low-risk) rates it Excellent (89/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
18
Low-risk
12
Fragrance
Contains fragrance
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 2/3
Good for dry skin
Glycerin Propylene Glycol
Caution for dry skin
Glycerin Polysorbate 20 Polysorbate 60
Oily/Acne-Prone Skin No data
Sensitive Skin 1/6
Good for sensitive skin
Glycerin
Caution for sensitive skin
Disodium Phosphate Glycerin Propylene Glycol Phenoxyethanol Benzyl Salicylate Hexamethylindanopyran

Ingredients list

18 total
Lower hazard (1) Higher hazard (7)
All18 Skin Conditioning6 Fragrance6 Film Forming4 Humectant4 Masking3 Perfuming3 Viscosity Controlling3 Solvent3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
A
Polyquaternium-11
(Antistatic Agent, Film Forming, Hair Fixing)
Pyrus Malus Fruit Extract
(Skin Conditioning)
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
3
B
Polysorbate 20
(Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
3
B
Polysorbate 60
(Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
Octanediol
(Plasticizer)
1
A
Hydroxyethylcellulose
(Binding Agent, Emulsion Stabilising, Film Forming, Viscosity Increasing Agent, Binding, Stabilising, Viscosity Controlling)
3
B
Propylene Glycol
(Fragrance, Humectant, Skin Conditioningagent Miscellaneous, Solvent, Viscosity Decreasing Agent, Skin Conditioning, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
4
B
Cocamidopropyl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
B
Disodium Phosphate
(Buffering Agent, Anticorrosive, Fragrance, Ph Adjuster, Masking)
1
B
Sodium Phosphate
(Buffering Agent)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
PARFUM
(Fragrance, Perfuming)
Hexamethylindanopyran
(Masking, Perfuming)
7
Benzyl Salicylate
(Fragrance, Uv Absorber, Masking)
Allergens
Allergens

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

Browse similar misc
No close formula match yet — browse other products like this

Key ingredients

Pyrus Malus Fruit Extract
Skin Conditioning
Panthenol
Skin Conditioning
Ethylhexylglycerin
Skin Conditioning
Propylene Glycol
Humectant, Skin Conditioning
Cocamidopropyl Betaine
Skin Conditioning
Glycerin
Humectant, Skin Protecting

Benefits

No standout benefits flagged for this product.

Concerns

Contains paraben
Contains eu allergen
Not fungal acne (malassezia) safe
Benzyl Salicylate — higher EWG
May not suit dry skin
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Polyquaternium-11
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
Pyrus Malus Fruit Extract
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Octanediol
Plasticizer
Low-hazard ingredient.Read moreShow less
EWG 1 Plasticizer
Hydroxyethylcellulose
Binding agent, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Binding agentEmulsion stabilisingFilm formingViscosity increasing agentBindingStabilisingViscosity controlling
Cocamidopropyl Betaine
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Disodium Phosphate
Buffering agent, Anticorrosive
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Buffering agentAnticorrosiveFragrancePh adjusterMasking
Sodium Phosphate
Buffering agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Buffering agent
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Hexamethylindanopyran
Masking, Perfuming
Limited public safety data.Read moreShow less
EWG N/A MaskingPerfuming
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Polysorbate 20
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant Fungal-acne trigger
Polysorbate 60
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant Fungal-acne trigger
Propylene Glycol
Fragrance, Humectant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B FragranceHumectantSkin-conditioningagent - miscellaneousSolventViscosity decreasing agentSkin conditioningViscosity controlling Good for Dry Skin
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Benzyl Salicylate
Fragrance, Uv absorber
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceUv absorberMasking Allergens

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Officially notified as a cosmetic in Malaysia (NPRA). Government registration record.

From the community

0
Reviews
0
Saved by users
0
In collections

Ratings & reviews

Write a Review
0.0
from 0 ratings

Used this product? Rate it in 10 seconds

Alternatives