Missing Person Eau De Parfum

Phlur

Missing Person Eau De Parfum

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About this product

The Phlur Missing Person Eau De Parfum is a misc. Our analysis of its 14 ingredients (3 low-risk) rates it Excellent (82/100). Based on its ingredients, it looks well-suited to oily / acne-prone skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
14
Low-risk
3
Fragrance
Contains fragrance
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe Minimal Ingredients

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 0/1
Caution for dry skin
Alcohol Denat.
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Alcohol Denat.
Sensitive Skin 0/5
Caution for sensitive skin
Ethylene Brassylate Isobutyl Methyl Tetrahydropyranol Alcohol Denat. Benzyl Salicylate Hydroxycitronellal

Ingredients list

14 total
Lower hazard (1) Higher hazard (7)
All14 Fragrance6 Masking5 Perfuming4 Skin Conditioning2 Solvent2 Uv Absorber2 Moisturising1 Antifoaming Agent1
EWG CIR Ingredient Name & Cosmetic Functions Notes
Saccharum Officinarum Extract
(Moisturising, Skin Conditioning)
4
Alcohol Denat.
(Antifoaming Agent, Antimicrobial, Astringent, Masking, Solvent, Viscosity Controlling)
Bad for Dry Skin
Bad for Dry Skin
Bad for Sensitive Skin
Bad for Sensitive Skin
PARFUM
(Fragrance, Perfuming)
1
Water
(Solvent)
Trimethyl-Propylcyclohexanepropanol
(Perfuming)
Cyclopentadecenone
(Perfuming)
3-Methyl-3-Octanol
(Perfuming)
7
Benzyl Salicylate
(Fragrance, Uv Absorber, Masking)
Allergens
Allergens
Dimethylcyclohexylethoxy Isobutylpropanoate
(Fragrance)
1
Ethylene Brassylate
(Fragrance, Masking, Tonic)
7
Hydroxycitronellal
(Fragrance, Masking)
Allergens
Allergens
1
Isobutyl Methyl Tetrahydropyranol
(Fragrance, Masking)
Sandalore
(Hair Conditioning)
Santalum Spicatum Seed Oil
(Skin Conditioning)

My Ingredient Notes

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Key ingredients

Saccharum Officinarum Extract
Moisturising, Skin Conditioning
Alcohol Denat.
Astringent
Benzyl Salicylate
Uv Absorber
Santalum Spicatum Seed Oil
Skin Conditioning

Benefits

Fungal-acne (Malassezia) safe
Good for oily/acne-prone skin

Concerns

Contains eu allergen
Benzyl Salicylate — higher EWG
Hydroxycitronellal — higher EWG
May not suit dry skin
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Saccharum Officinarum Extract
Moisturising, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A MoisturisingSkin conditioning
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Trimethyl-Propylcyclohexanepropanol
Perfuming
Limited public safety data.Read moreShow less
EWG N/A Perfuming
Cyclopentadecenone
Perfuming
Limited public safety data.Read moreShow less
EWG N/A Perfuming
3-Methyl-3-Octanol
Perfuming
Limited public safety data.Read moreShow less
EWG N/A Perfuming
Dimethylcyclohexylethoxy Isobutylpropanoate
Fragrance
Limited public safety data.Read moreShow less
EWG N/A Fragrance
Ethylene Brassylate
Fragrance, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 FragranceMaskingTonic
Isobutyl Methyl Tetrahydropyranol
Fragrance, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 FragranceMasking
Sandalore
Hair conditioning
Limited public safety data.Read moreShow less
EWG N/A Hair conditioning
Santalum Spicatum Seed Oil
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Alcohol Denat.
Antifoaming agent, Antimicrobial
Causes moisture evaporation - prone to dry out skinRead moreShow less
EWG 4 Antifoaming agentAntimicrobialAstringentMaskingSolventViscosity controlling Bad for Dry SkinBad for Sensitive Skin
Benzyl Salicylate
Fragrance, Uv absorber
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceUv absorberMasking Allergens
Hydroxycitronellal
Fragrance, Masking
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceMasking Allergens

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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