Moisture Clean Evening Soothe Makeup Remover Wipes

Pond's

Moisture Clean Evening Soothe Makeup Remover Wipes

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About this product

The Pond's Moisture Clean Evening Soothe Makeup Remover Wipes is a makeup remover. Our analysis of its 16 ingredients (12 low-risk) rates it Excellent (88/100). Based on its ingredients, it looks well-suited to oily / acne-prone and dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Makeup Removers
Ingredients
16
Low-risk
12
Fragrance
Contains fragrance
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 4/4
Good for dry skin
Anhydroxylitol Xylitol Xylitylglucoside Camellia Sinensis Leaf Extract
Caution for dry skin
Hexylene Glycol Camellia Sinensis Leaf Extract Polysorbate 20 PEG-40 Hydrogenated Castor Oil
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Camellia Sinensis Leaf Extract
Sensitive Skin 3/7
Good for sensitive skin
Anthemis Nobilis Flower Extract Camellia Sinensis Leaf Extract Tocopheryl Acetate
Caution for sensitive skin
Anthemis Nobilis Flower Extract Hexylene Glycol Citric Acid Camellia Sinensis Leaf Extract PEG-40 Hydrogenated Castor Oil Benzyl Alcohol DMDM Hydantoin

Ingredients list

16 total
Lower hazard (1) Higher hazard (7)
All16 Skin Conditioning8 Fragrance5 Humectant5 Perfuming4 Masking4 Solvent3 Emulsifying3 Surfactant3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
A
Hexylene Glycol
(Fragrance, Solvent, Viscosity Decreasing Agent, Emulsifying, Perfuming, Skin Conditioning, Surfactant)
1
B
Camellia Sinensis Leaf Extract
(Antimicrobial, Antioxidant, Astringent, Emollient, Humectant, Masking, Oral Care Agent, Skin Conditioning, Skin Protecting, Tonic, Uv Absorber)
Good for Oily Skin
Good for Oily Skin
1
Anthemis Nobilis Flower Extract
(Masking, Perfuming, Skin Conditioning)
Good for Sensitive Skin
Good for Sensitive Skin
Good for Dry Skin
Good for Dry Skin
3
Tocopheryl Acetate
(Antioxidant, Skin Conditioning)
Bad for Oily Skin
Bad for Oily Skin
3
B
Polysorbate 20
(Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
Sodium Lauroamphoacetate
(Hair Conditioning, Sufactant, Foam Boosting, Foaming)
3
B
PEG-40 Hydrogenated Castor Oil
(Fragrance, Emulsifying, Surfactant, Perfuming)
Fungal Acne
Fungal Acne Trigger
5
A
Benzyl Alcohol
(External Analgesic, Fragrance, Oral Health Care Drug, Preservative, Solvent, Viscosity Decreasing Agent, Masking)
Allergens
Allergens
1
Xylitylglucoside
(Humectant, Skin Conditioning)
1
Anhydroxylitol
(Humectant, Skin Conditioning)
1
Xylitol
(Flavoring Agent, Humectant, Skin Conditioning)
PARFUM
(Fragrance, Perfuming)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
7
A
DMDM Hydantoin
(Preservative)
4
6
B
Iodopropynyl Butylcarbamate
(Preservative)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Hexylene Glycol
Skin Conditioning
Camellia Sinensis Leaf Extract
Antioxidant, Astringent
Anthemis Nobilis Flower Extract
Skin Conditioning
Tocopheryl Acetate
Antioxidant, Skin Conditioning
Xylitylglucoside
Humectant, Skin Conditioning
Anhydroxylitol
Humectant, Skin Conditioning

Benefits

Good for oily/acne-prone skin

Concerns

Contains eu allergen
Not fungal acne (malassezia) safe
DMDM Hydantoin — higher EWG
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Hexylene Glycol
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSolventViscosity decreasing agentEmulsifyingPerfumingSkin conditioningSurfactant
Sodium Lauroamphoacetate
Hair conditioning, Sufactant
Low-hazard ingredient.Read moreShow less
EWG 1 Hair conditioningSufactantFoam boostingFoaming
Xylitylglucoside
Humectant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 HumectantSkin conditioning
Anhydroxylitol
Humectant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 HumectantSkin conditioning
Xylitol
Flavoring agent, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 Flavoring agentHumectantSkin conditioning
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Camellia Sinensis Leaf Extract
Antimicrobial, Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B AntimicrobialAntioxidantAstringentEmollientHumectantMaskingOral care agentSkin conditioningSkin protectingTonicUv absorber Good for Oily Skin
Anthemis Nobilis Flower Extract
Masking, Perfuming
Low-hazard ingredient.Read moreShow less
EWG 1 MaskingPerfumingSkin conditioning Good for Sensitive SkinGood for Dry Skin
Tocopheryl Acetate
Antioxidant, Skin conditioning
Potentially comedogenic - can block poresRead moreShow less
EWG 3 AntioxidantSkin conditioning Bad for Oily Skin
Polysorbate 20
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant Fungal-acne trigger
PEG-40 Hydrogenated Castor Oil
Fragrance, Emulsifying
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B FragranceEmulsifyingSurfactantPerfuming Fungal-acne trigger
Benzyl Alcohol
External analgesic, Fragrance
Moderate-hazard ingredient.Read moreShow less
EWG 5 CIR A External analgesicFragranceOral health care drugPreservativeSolventViscosity decreasing agentMasking Allergens
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
DMDM Hydantoin
Preservative
Higher-hazard ingredient.Read moreShow less
EWG 7 CIR A Preservative
Iodopropynyl Butylcarbamate
Preservative
Moderate-hazard ingredient.Read moreShow less
EWG 4–6 CIR B Preservative

How to use

How to use

  • 1 Where it fits: Use as the first step, on clean hands, before the rest of your routine.
  • 2 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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