Low pH Mild Body Wash

Pyunkang Yul

Where to buy Possibly in stock

About this product

The Pyunkang Yul Low pH Mild Body Wash is a misc. Our analysis of its 43 ingredients (35 low-risk) rates it Excellent (100/100). Based on its ingredients, it looks well-suited to oily / acne-prone and dry skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
43
Low-risk
35
Fragrance
Fragrance-free
Origin
South Korea

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 14/8
Good for dry skin
Macadamia Ternifolia Seed Oil Cetyl Ethylhexanoate Sodium Acetylated Hyaluronate Sodium Hyaluronate Crosspolymer Ethylhexyl Palmitate Caprylic/Capric Triglyceride Caprylyl Glycol Butylene Glycol Sodium Hyaluronate Glycerin Hydroxypropyltrimonium Hyaluronate Hydrolyzed Hyaluronic Acid Scutellaria Baicalensis Root Extract Camellia Sinensis Leaf Extract
Caution for dry skin
Lauryl Glucoside Centella Asiatica Extract Glycerin Polyglyceryl-10 Myristate Hexylene Glycol Scutellaria Baicalensis Root Extract Hydrogenated Lecithin Camellia Sinensis Leaf Extract
Oily/Acne-Prone Skin 2/0
Good for oily/acne-prone skin
Scutellaria Baicalensis Root Extract Camellia Sinensis Leaf Extract
Sensitive Skin 6/9
Good for sensitive skin
Centella Asiatica Extract Glycerin Polygonum Cuspidatum Root Extract Scutellaria Baicalensis Root Extract Hydroxyacetophenone Camellia Sinensis Leaf Extract
Caution for sensitive skin
Dipropylene Glycol Sodium Chloride Ethylhexyl Palmitate Caprylic/Capric Triglyceride Butylene Glycol Glycerin Hexylene Glycol Citric Acid Camellia Sinensis Leaf Extract

Ingredients list

43 total
Lower hazard (1) Higher hazard (2)
All43 Skin Conditioning39 Humectant11 Fragrance11 Solvent8 Hair Conditioning7 Emollient6 Masking6 Foam Boosting5
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
B
Lauryl Glucoside
(Cleansing, Surfactant)
1
A
Disodium Cocoamphodiacetate
(Hair Conditioning, Sufactant, Foam Boosting, Hydrotrope, Skin Conditioning)
1
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling)
1
B
Lauryl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
B
Coco-Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
A
Caprylyl Glycol
(Hair Conditioning, Skin Conditioning, Emollient, Humectant)
1
Hydroxyacetophenone
(Antioxidant)
1
A
Pentylene Glycol
(Skin Conditioning, Solvent)
1
A
Dipropylene Glycol
(Fragrance, Solvent, Viscosity Decreasing Agent, Masking, Viscosity Controlling)
1
Hippophae Rhamnoides Fruit Extract
(Skin Conditioning)
BUTYROSPERMUM PARKII BUTTER EXTRACT
(Skin Conditioning)
1
A
Disodium EDTA
(Chelating Agent, Viscosity Controlling)
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
1
A
Hexylene Glycol
(Fragrance, Solvent, Viscosity Decreasing Agent, Emulsifying, Perfuming, Skin Conditioning, Surfactant)
TOCOPHEROL
(Antioxidant, Fragrance, Skin Conditioning)
1
A
1,2-Hexanediol
(Solvent)
1
B
Centella Asiatica Extract
(Cleansing, Skin Conditioning, Smoothing, Soothing, Tonic)
1
Polyglyceryl-10 Myristate
(Skin Conditioning, Emulsifying, Surfactant)
1
Polygonum Cuspidatum Root Extract
(Antioxidant)
1
Scutellaria Baicalensis Root Extract
(Astringent, Humectant, Soothing)
1
Macadamia Ternifolia Seed Oil
(Emollient)
1
Mineral Salts
(Skin Conditioning)
Olea Europaea Fruit Oil
(Fragrance, Perfuming, Skin Conditioning)
Lonicera Japonica Flower Extract
(Skin Conditioning)
1
B
Camellia Sinensis Leaf Extract
(Antimicrobial, Antioxidant, Astringent, Emollient, Humectant, Masking, Oral Care Agent, Skin Conditioning, Skin Protecting, Tonic, Uv Absorber)
Good for Oily Skin
Good for Oily Skin
Glycyrrhiza Uralensis Root Extract
(Skin Conditioning)
Helianthus Annuus Seed Oil
(Fragrance, Skin Conditioning, Skin Conditioning Emollient)
1
B
Ethylhexyl Palmitate
(Fragrance, Skin Conditioning, Emollient, Perfuming)
Fungal Acne
Fungal Acne Trigger
CHAMOMILLA RECUTITA FLOWER EXTRACT
(Fragrance, Skin Conditioning)
1
A
Caprylic/Capric Triglyceride
(Emollient, Masking, Perfuming, Skin Conditioning, Solvent)
1
B
Cetyl Ethylhexanoate
(Skin Conditioning, Emollient)
rosmarinus officinalis leaf extract
(Antimicrobial, Fragrance, Skin Conditioning)
1
A
Sodium Hyaluronate
(Skin Conditioning, Humectant)
Good for Dry Skin
Good for Dry Skin
2
A
Hydrogenated Lecithin
(Skin Conditioning, Emulsifying, Surfactant, Suspending Agent Nonsurfactant)
1
Ceramide NP
(Hair Conditioning, Skin Conditioning)
1
Hydrolyzed Hyaluronic Acid
(Hair Conditioning, Humectant, Skin Conditioning)
1
Hydroxypropyltrimonium Hyaluronate
(Film Forming, Humectant)
1
Sodium Hyaluronate Crosspolymer
(Humectant, Skin Conditioning)
1
Sodium Acetylated Hyaluronate
(Humectant)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Disodium Cocoamphodiacetate
Skin Conditioning
Lauryl Betaine
Skin Conditioning
Glycerin
Humectant, Skin Protecting
Coco-Betaine
Skin Conditioning
Butylene Glycol
Skin Conditioning, Humectant
Caprylyl Glycol
Skin Conditioning, Emollient

Benefits

Good for dry skin
Good for oily/acne-prone skin

Concerns

Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Lauryl Glucoside
Cleansing, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingSurfactant
Disodium Cocoamphodiacetate
Hair conditioning, Sufactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Hair conditioningSufactantFoam boostingHydrotropeSkin conditioning
Sodium Chloride
Bulking agent, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 Bulking agentMaskingOral care agentViscosity controlling
Lauryl Betaine
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agent
Coco-Betaine
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Caprylyl Glycol
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Hair conditioningSkin conditioningEmollientHumectant
Hydroxyacetophenone
Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 Antioxidant
Pentylene Glycol
Skin conditioning, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningSolvent
Dipropylene Glycol
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSolventViscosity decreasing agentMaskingViscosity controlling
Hippophae Rhamnoides Fruit Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
BUTYROSPERMUM PARKII BUTTER EXTRACT
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Disodium EDTA
Chelating agent, Viscosity controlling
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentViscosity controlling
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Hexylene Glycol
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSolventViscosity decreasing agentEmulsifyingPerfumingSkin conditioningSurfactant
+ 22 more — see the full ingredients list above
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Camellia Sinensis Leaf Extract
Antimicrobial, Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B AntimicrobialAntioxidantAstringentEmollientHumectantMaskingOral care agentSkin conditioningSkin protectingTonicUv absorber Good for Oily Skin
Ethylhexyl Palmitate
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B FragranceSkin conditioningEmollientPerfuming Fungal-acne trigger
Sodium Hyaluronate
Skin conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningHumectant Good for Dry Skin

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Officially notified as a cosmetic in Malaysia (NPRA). Government registration record.

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