Egg Bubble Smile Mask

QURET

Where to buy Possibly in stock

About this product

The QURET Egg Bubble Smile Mask is a sheet mask. Our analysis of its 31 ingredients (22 low-risk) rates it Excellent (96/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Sheet Mask
Ingredients
31
Low-risk
22
Fragrance
Contains fragrance
Origin
South Korea

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 5/8
Good for dry skin
Betaine Butylene Glycol Sodium Hyaluronate Glycerin Albumen Extract
Caution for dry skin
Lauric Acid Centella Asiatica Extract Sodium Cocoyl Apple Amino Acids Xanthan Gum Glycerin Hexylene Glycol Acrylates Copolymer Polysorbate 20
Oily/Acne-Prone Skin No data
Sensitive Skin 6/9
Good for sensitive skin
Centella Asiatica Extract Sodium Bicarbonate Anthemis Nobilis Flower Extract Glycerin Hydroxyacetophenone Pearl Extract
Caution for sensitive skin
Dipropylene Glycol Lauric Acid Sodium Chloride Arginine Anthemis Nobilis Flower Extract Butylene Glycol Glycerin Hexylene Glycol Phenoxyethanol

Ingredients list

31 total
Lower hazard (1) Higher hazard (4)
All31 Skin Conditioning21 Viscosity Controlling9 Solvent8 Fragrance8 Humectant8 Hair Conditioning6 Masking5 Antistatic Agent4
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
4
B
Cocamidopropyl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
Methyl Perfluoroisobutyl Ether
(Solvent, Viscosity Controlling)
4
Methyl Perfluorobutyl Ether
(Solvent, Viscosity Decreasing Agent, Viscosity Controlling)
2
Disiloxane
(Antifoaming Agent, Skin Conditioning)
2
B
Acrylates Copolymer
(Adhesive, Artificial Nail Builder, Binding Agent, Film Forming, Hair Fixing, Suspending Agent Nonsurfactant, Antistatic Agent, Binding)
1
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling)
1
A
Arginine
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent, Masking)
1
B
Sodium Cocoyl Apple Amino Acids
(Hair Conditioning, Skin Conditioning, Surfactant Foambooster, Foam Boosting)
1
A
1,2-Hexanediol
(Solvent)
1
A
Xanthan Gum
(Binding Agent, Emulsion Stabilising, Skin Conditioning, Surfactant Emulsifying Agent, Viscosity Increasing Agent, Binding, Gel Forming, Viscosity Controlling)
3
B
Polysorbate 20
(Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
A
Hexylene Glycol
(Fragrance, Solvent, Viscosity Decreasing Agent, Emulsifying, Perfuming, Skin Conditioning, Surfactant)
1
Hydroxyacetophenone
(Antioxidant)
1
A
Sodium Bicarbonate
(Abrasive, Buffering Agent, Deodorant, Oral Care Agent, Oral Health Care Drug, Phadjuster, Skin Protecting)
PARFUM
(Fragrance, Perfuming)
1
B
Betaine
(Hair Conditioning, Humectant, Antistatic Agent, Skin Conditioning, Viscosity Controlling)
1
A
Dipropylene Glycol
(Fragrance, Solvent, Viscosity Decreasing Agent, Masking, Viscosity Controlling)
1
A
Lauric Acid
(Fragrance, Sufactantsurfactant Cleansing Agent Is Included As A Function For The Soap Form Of Lauric Acid., Emulsifying)
Bad for Oily Skin
Bad for Oily Skin
Fungal Acne
Fungal Acne Trigger
1
A
Sodium Hyaluronate
(Skin Conditioning, Humectant)
Good for Dry Skin
Good for Dry Skin
1
A
Disodium EDTA
(Chelating Agent, Viscosity Controlling)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
Portulaca Oleracea Extract
(Skin Conditioning)
Albumen Extract
(Emollient, Hair Conditioning, Humectant, Skin Conditioning)
1
B
Centella Asiatica Extract
(Cleansing, Skin Conditioning, Smoothing, Soothing, Tonic)
NELUMBO NUCIFERA FLOWER EXTRACT
(Skin Conditioning)
1
Anthemis Nobilis Flower Extract
(Masking, Perfuming, Skin Conditioning)
Good for Sensitive Skin
Good for Sensitive Skin
Good for Dry Skin
Good for Dry Skin
Hydrolyzed Egg Shell Membrane
(Humectant, Skin Conditioning)
Pearl Extract
(Antioxidant)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben

My Ingredient Notes

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Key ingredients

Glycerin
Humectant, Skin Protecting
Cocamidopropyl Betaine
Skin Conditioning
Disiloxane
Skin Conditioning
Arginine
Skin Conditioning
Sodium Cocoyl Apple Amino Acids
Skin Conditioning
Xanthan Gum
Skin Conditioning

Benefits

No standout benefits flagged for this product.

Concerns

Contains paraben
Not fungal acne (malassezia) safe
May not suit dry skin
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cocamidopropyl Betaine
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Methyl Perfluoroisobutyl Ether
Solvent, Viscosity controlling
Limited public safety data.Read moreShow less
EWG N/A SolventViscosity controlling
Methyl Perfluorobutyl Ether
Solvent, Viscosity decreasing agent
Low-to-moderate hazard.Read moreShow less
EWG 4 SolventViscosity decreasing agentViscosity controlling
Disiloxane
Antifoaming agent, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 2 Antifoaming agentSkin conditioning
Acrylates Copolymer
Adhesive, Artificial nail builder
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B AdhesiveArtificial nail builderBinding agentFilm formingHair fixingSuspending agent -nonsurfactantAntistatic agentBinding
Sodium Chloride
Bulking agent, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 Bulking agentMaskingOral care agentViscosity controlling
Arginine
Fragrance, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceHair conditioningSkin conditioningAntistatic agentMasking
Sodium Cocoyl Apple Amino Acids
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningSkin conditioningSurfactant - foamboosterFoam boosting
1,2-Hexanediol
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Solvent
Xanthan Gum
Binding agent, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Binding agentEmulsion stabilisingSkin conditioningSurfactant -emulsifying agentViscosity increasing agentBindingGel formingViscosity controlling
Hexylene Glycol
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSolventViscosity decreasing agentEmulsifyingPerfumingSkin conditioningSurfactant
Hydroxyacetophenone
Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 Antioxidant
Sodium Bicarbonate
Abrasive, Buffering agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A AbrasiveBuffering agentDeodorantOral care agentOral health care drugPhadjusterSkin protecting
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
+ 9 more — see the full ingredients list above
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Polysorbate 20
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant Fungal-acne trigger
Lauric Acid
Fragrance, Sufactantsurfactant-cleansing agent is included as a function for the soap form of lauric acid.
Potentially comedogenic - can block poresRead moreShow less
EWG 1 CIR A FragranceSufactantsurfactant-cleansing agent is included as a function for the soap form of lauric acid.Emulsifying Bad for Oily SkinFungal-acne trigger
Sodium Hyaluronate
Skin conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningHumectant Good for Dry Skin
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Anthemis Nobilis Flower Extract
Masking, Perfuming
Low-hazard ingredient.Read moreShow less
EWG 1 MaskingPerfumingSkin conditioning Good for Sensitive SkinGood for Dry Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Officially notified as a cosmetic in Malaysia (NPRA). Government registration record.

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