Teacup Anti-Pollution Detox Rinse

R & Co

Teacup Anti-Pollution Detox Rinse

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About this product

The R & Co Teacup Anti-Pollution Detox Rinse is a misc. Our analysis of its 23 ingredients (18 low-risk) rates it Excellent (96/100). Based on its ingredients, it looks well-suited to dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
23
Low-risk
18
Fragrance
Contains fragrance
Origin
Australia

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 5/3
Good for dry skin
Moringa Oleifera Seed Oil Butylene Glycol Glycerin Propylene Glycol PEG-12
Caution for dry skin
Glycerin Cetrimonium Chloride Polysorbate 80
Oily/Acne-Prone Skin No data
Sensitive Skin 3/8
Good for sensitive skin
Melia Azadirachta Leaf Extract Glycerin Tocopheryl Acetate
Caution for sensitive skin
Sodium Citrate Butylene Glycol Glycerin Propylene Glycol Citric Acid Potassium Sorbate Phenoxyethanol Limonene

Ingredients list

23 total
Lower hazard (1) Higher hazard (6)
All23 Skin Conditioning11 Fragrance7 Solvent6 Humectant6 Film Forming4 Masking3 Perfuming3 Preservative3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
3
B
Propylene Glycol
(Fragrance, Humectant, Skin Conditioningagent Miscellaneous, Solvent, Viscosity Decreasing Agent, Skin Conditioning, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
3
B
Polysorbate 80
(Denaturant, Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
3
B
Cetrimonium Chloride
(Antistatic Agent, Cosmetic Biocide, Emulsifying, Surfactant, Antimicrobial, Preservative)
3
A
PEG-12 Dimethicone
(Hair Conditioning, Skin Conditioning)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
PARFUM
(Fragrance, Perfuming)
1
A
Hydroxyethylcellulose
(Binding Agent, Emulsion Stabilising, Film Forming, Viscosity Increasing Agent, Binding, Stabilising, Viscosity Controlling)
1
A
Polyquaternium-10
(Antistatic Agent, Film Forming, Hair Fixing)
PEG-12 Allyl Ether
(Binding)
3
A
Potassium Sorbate
(Fragrance, Preservative)
3
A
PEG-12
(Humectant, Solvent)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
Eclipta Prostrata Extract
(Skin Conditioning)
1
Melia Azadirachta Leaf Extract
(Antimicrobial, Skin Protecting)
3
Tocopheryl Acetate
(Antioxidant, Skin Conditioning)
Bad for Oily Skin
Bad for Oily Skin
1
Saccharomyces/Xylinum/Black Tea Ferment
(Skin Conditioning)
1
A
Sodium Citrate
(Ph Adjuster, Buffering Agent, Chelating, Masking)
1
A
Moringa Oleifera Seed Oil
(Emollient, Skin Conditioning)
Prunus Persica Leaf Extract
(Moisturising, Skin Conditioning, Skin Conditioning Emollient)
6
Limonene
(Deodorant, Perfuming, Solvent)
Allergens
Allergens

My Ingredient Notes

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Key ingredients

Propylene Glycol
Humectant, Skin Conditioning
PEG-12 Dimethicone
Skin Conditioning
Glycerin
Humectant, Skin Protecting
PEG-12
Humectant
Butylene Glycol
Skin Conditioning, Humectant
Eclipta Prostrata Extract
Skin Conditioning

Benefits

Good for dry skin

Concerns

Contains paraben
Contains eu allergen
Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cetrimonium Chloride
Antistatic agent, Cosmetic biocide
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B Antistatic agentCosmetic biocideEmulsifyingSurfactantAntimicrobialPreservative
PEG-12 Dimethicone
Hair conditioning, Skin conditioning
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Hair conditioningSkin conditioning
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Hydroxyethylcellulose
Binding agent, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Binding agentEmulsion stabilisingFilm formingViscosity increasing agentBindingStabilisingViscosity controlling
Polyquaternium-10
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
PEG-12 Allyl Ether
Binding
Limited public safety data.Read moreShow less
EWG N/A Binding
Potassium Sorbate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservative
PEG-12
Humectant, Solvent
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A HumectantSolvent
Eclipta Prostrata Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Melia Azadirachta Leaf Extract
Antimicrobial, Skin protecting
Low-hazard ingredient.Read moreShow less
EWG 1 AntimicrobialSkin protecting
Saccharomyces/Xylinum/Black Tea Ferment
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Sodium Citrate
Ph adjuster, Buffering agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Ph adjusterBuffering agentChelatingMasking
Moringa Oleifera Seed Oil
Emollient, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmollientSkin conditioning
Prunus Persica Leaf Extract
Moisturising, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A MoisturisingSkin conditioningSkin conditioning emollient
Propylene Glycol
Fragrance, Humectant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B FragranceHumectantSkin-conditioningagent - miscellaneousSolventViscosity decreasing agentSkin conditioningViscosity controlling Good for Dry Skin
Polysorbate 80
Denaturant, Emulsifying
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B DenaturantEmulsifyingSurfactant Fungal-acne trigger
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Tocopheryl Acetate
Antioxidant, Skin conditioning
Potentially comedogenic - can block poresRead moreShow less
EWG 3 AntioxidantSkin conditioning Bad for Oily Skin
Limonene
Deodorant, Perfuming
Moderate-hazard ingredient.Read moreShow less
EWG 6 DeodorantPerfumingSolvent Allergens

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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