H2R Molecular Bond Repair Leave-In Hair Mask

Rida Hair Research Institute

H2R Molecular Bond Repair Leave-In Hair Mask

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About this product

The Rida Hair Research Institute H2R Molecular Bond Repair Leave-In Hair Mask is a misc. Our analysis of its 30 ingredients (20 low-risk) rates it Excellent (88/100). Based on its ingredients, it looks well-suited to dry skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
30
Low-risk
20
Fragrance
Fragrance-free
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 3/1
Good for dry skin
Dicaprylyl Ether Cetyl Esters Hydrolyzed Wheat Starch
Caution for dry skin
Polysorbate 20
Oily/Acne-Prone Skin No data
Sensitive Skin 3/12
Good for sensitive skin
Ascorbyl Palmitate Pentaerythrityl Tetra-di-t-butyl Hydroxyhydrocinnamate Tocopheryl Acetate
Caution for sensitive skin
Disodium Phosphate Ascorbyl Palmitate Citric Acid Isopropyl Alcohol Potassium Sorbate Phenoxyethanol Linalool Benzyl Alcohol Hexyl Cinnamal Limonene Benzyl Benzoate Citral

Ingredients list

30 total
Lower hazard (1) Higher hazard (7)
All30 Skin Conditioning18 Fragrance11 Masking8 Solvent6 Antioxidant4 Preservative4 Deodorant3 Emollient2
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
3
Tocopheryl Acetate
(Antioxidant, Skin Conditioning)
Bad for Oily Skin
Bad for Oily Skin
1
PPG-3 Benzyl Ether Myristate
(Plasticizer, Skin Conditioning)
1
Litchi Chinensis Pericarp Extract
(Skin Conditioning)
1
Moringa Oleifera Seed Extract
(Skin Conditioning)
5
A
Benzyl Alcohol
(External Analgesic, Fragrance, Oral Health Care Drug, Preservative, Solvent, Viscosity Decreasing Agent, Masking)
Allergens
Allergens
1
A
Ascorbyl Palmitate
(Antioxidant, Masking)
Fungal Acne
Fungal Acne Trigger
Retinyl Palmitate
(Skin Conditioning, Skin Conditioning Miscellaneous)
1
B
Disodium Phosphate
(Buffering Agent, Anticorrosive, Fragrance, Ph Adjuster, Masking)
1
A
Pentaerythrityl Tetra-di-t-butyl Hydroxyhydrocinnamate
(Antioxidant)
6
A
Benzyl Benzoate
(Fragrance, Solvent, Antimicrobial, Masking)
Allergens
Allergens
6
Limonene
(Deodorant, Perfuming, Solvent)
Allergens
Allergens
5
Linalool
(Fragrance, Deodorant, Masking)
Allergens
Allergens
5
Hexyl Cinnamal
(Fragrance, Masking)
Allergens
Allergens
7
Citral
(Flavoring Agent, Fragrance, Masking)
Allergens
Allergens
2
Mica
(Cosmetic Colorant, Opacifying)
CI 77891
(Colorant)
1
Dicaprylyl Ether
(Skin Conditioning, Emollient, Solvent)
1
B
Cetyl Esters
(Skin Conditioning, Emollient)
3
B
Behentrimonium Chloride
(Antistatic Agent, Hair Conditioning, Preservative)
3
B
Polysorbate 20
(Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
B
Hydrolyzed Wheat Protein
(Film Forming, Hair Conditioning, Skin Conditioning, Antistatic Agent)
1
A
Hydrolyzed Wheat Starch
(Humectant, Skin Conditioning, Viscosity Controlling)
2
A
Isopropyl Alcohol
(Antifoaming Agent, Fragrance, Solvent, Viscosity Decreasing Agent, Perfuming, Viscosity Controlling)
Bad for Sensitive Skin
Bad for Sensitive Skin
TOCOPHEROL
(Antioxidant, Fragrance, Skin Conditioning)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
3
A
Potassium Sorbate
(Fragrance, Preservative)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Copper Tripeptide-1
(Skin Conditioning)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Ethylhexylglycerin
Skin Conditioning
Tocopheryl Acetate
Antioxidant, Skin Conditioning
PPG-3 Benzyl Ether Myristate
Skin Conditioning
Litchi Chinensis Pericarp Extract
Skin Conditioning
Moringa Oleifera Seed Extract
Skin Conditioning
Ascorbyl Palmitate
Antioxidant

Benefits

Good for dry skin

Concerns

Contains paraben
Contains eu allergen
Not fungal acne (malassezia) safe
Citral — higher EWG
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
PPG-3 Benzyl Ether Myristate
Plasticizer, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 PlasticizerSkin conditioning
Litchi Chinensis Pericarp Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Moringa Oleifera Seed Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Retinyl Palmitate
Skin conditioning, Skin conditioning miscellaneous
Limited public safety data.Read moreShow less
EWG N/A Skin conditioningSkin conditioning miscellaneous
Disodium Phosphate
Buffering agent, Anticorrosive
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Buffering agentAnticorrosiveFragrancePh adjusterMasking
Pentaerythrityl Tetra-di-t-butyl Hydroxyhydrocinnamate
Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antioxidant
Mica
Cosmetic colorant, Opacifying
Low-hazard ingredient.Read moreShow less
EWG 2 Cosmetic colorantOpacifying
CI 77891
Colorant
Limited public safety data.Read moreShow less
EWG N/A Colorant
Dicaprylyl Ether
Skin conditioning, Emollient
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioningEmollientSolvent
Cetyl Esters
Skin conditioning, Emollient
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Skin conditioningEmollient
Behentrimonium Chloride
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B Antistatic agentHair conditioningPreservative
Hydrolyzed Wheat Protein
Film forming, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Film formingHair conditioningSkin conditioningAntistatic agent
Hydrolyzed Wheat Starch
Humectant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A HumectantSkin conditioningViscosity controlling
+ 3 more — see the full ingredients list above
Tocopheryl Acetate
Antioxidant, Skin conditioning
Potentially comedogenic - can block poresRead moreShow less
EWG 3 AntioxidantSkin conditioning Bad for Oily Skin
Benzyl Alcohol
External analgesic, Fragrance
Moderate-hazard ingredient.Read moreShow less
EWG 5 CIR A External analgesicFragranceOral health care drugPreservativeSolventViscosity decreasing agentMasking Allergens
Ascorbyl Palmitate
Antioxidant, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A AntioxidantMasking Fungal-acne trigger
Benzyl Benzoate
Fragrance, Solvent
Moderate-hazard ingredient.Read moreShow less
EWG 6 CIR A FragranceSolventAntimicrobialMasking Allergens
Limonene
Deodorant, Perfuming
Moderate-hazard ingredient.Read moreShow less
EWG 6 DeodorantPerfumingSolvent Allergens
Linalool
Fragrance, Deodorant
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceDeodorantMasking Allergens
Hexyl Cinnamal
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens
Citral
Flavoring agent, Fragrance
Higher-hazard ingredient.Read moreShow less
EWG 7 Flavoring agentFragranceMasking Allergens
Polysorbate 20
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant Fungal-acne trigger
Isopropyl Alcohol
Antifoaming agent, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Antifoaming agentFragranceSolventViscosity decreasing agentPerfumingViscosity controlling Bad for Sensitive Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Evening: Use at night — start 2–3× a week and build up as your skin tolerates it.
  • 2 Wear SPF the next day: Acids and retinoids increase sun sensitivity — daily sunscreen is a must while using this.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Pregnancy & breastfeeding

Contains ingredients some choose to avoid or double-check while pregnant or nursing.

Often avoided
Retinoids (Vitamin A) (Retinyl Palmitate)

Topical retinoids (retinol, retinaldehyde, retinyl esters) are widely advised against in pregnancy as a precaution. The strongest evidence is for ORAL retinoids; topical absorption is low, but most clinicians err on the side of caution.

This is general information, not medical advice. Pregnancy guidance varies and depends on concentration and your individual situation — always check with your doctor, midwife or pharmacist. How we flag this.

Effective levels — general guide

The concentrations these actives are typically effective at in research — not a measurement of this product.

Retinoids (Vitamin A) 0.01–1%

Most studied between 0.1% and 1%. Higher is not automatically better — irritation climbs with dose, so a well-formulated lower strength is often the sweet spot.

Retinyl Palmitate

Vitamin C (ascorbic) 5–20%

L-ascorbic acid is usually used at 5–20% (around 10–15% is common). Above ~20% adds little and tends to irritate more; it also needs a low pH to work.

Ascorbyl Palmitate

INCI lists don't disclose amounts, and we don't claim to know this product's levels — these are the ranges these ingredients are usually effective at, so you can tell a real formula from "fairy-dusting" a marketed active. How we estimate this.

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