Kind & Free Clean Plant Based Nail Polish Top Coat

Rimmel London

Kind & Free Clean Plant Based Nail Polish Top Coat

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About this product

The Rimmel London Kind & Free Clean Plant Based Nail Polish Top Coat is a misc. Our analysis of its 5 ingredients (5 low-risk) rates it Excellent (100/100). Based on its ingredients, it looks well-suited to dry skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
5
Low-risk
5
Fragrance
Fragrance-free
Origin
United Kingdom

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe Minimal Ingredients

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 1/1
Good for dry skin
Cetyl Acetate
Caution for dry skin
Nitrocellulose
Oily/Acne-Prone Skin No data
Sensitive Skin 0/3
Caution for sensitive skin
Butyl Acetate Cetyl Acetate Ethyl Acetate

Ingredients list

5 total
Lower hazard (1) Higher hazard (1)
All5 Fragrance3 Film Forming3 Solvent2 Masking2 Skin Conditioning2 Perfuming1 Suspending Agent - Nonsurfactant1 Emollient1
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Ethyl Acetate
(Fragrance, Solvent, Perfuming)
1
A
Butyl Acetate
(Fragrance, Solvent, Masking)
1
Nitrocellulose
(Film Forming, Suspending Agent Nonsurfactant)
1
Adipic Acid/Neopentyl Glycol/Trimellitic Anhydride Copolymer
(Film Forming)
1
A
Cetyl Acetate
(Fragrance, Skin Conditioning, Emollient, Masking)
Bad for Oily Skin
Bad for Oily Skin

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Cetyl Acetate
Skin Conditioning, Emollient

Benefits

Fungal-acne (Malassezia) safe

Concerns

May not suit sensitive skin

Ingredients explained

Ethyl Acetate
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 FragranceSolventPerfuming
Butyl Acetate
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSolventMasking
Nitrocellulose
Film forming, Suspending agent - nonsurfactant
Low-hazard ingredient.Read moreShow less
EWG 1 Film formingSuspending agent - nonsurfactant
Adipic Acid/Neopentyl Glycol/Trimellitic Anhydride Copolymer
Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 Film forming
Cetyl Acetate
Fragrance, Skin conditioning
Potentially comedogenic - can block poresRead moreShow less
EWG 1 CIR A FragranceSkin conditioningEmollientMasking Bad for Oily Skin

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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