Cryptherapy Purifying Cleanser

rooTree

Cryptherapy Purifying Cleanser

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About this product

The rooTree Cryptherapy Purifying Cleanser is a cleanser. Our analysis of its 28 ingredients (21 low-risk) rates it Excellent (97/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Cleansers
Ingredients
28
Low-risk
21
Fragrance
Contains fragrance
Origin
South Korea

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

PH Level

(Know the PH? Submit it here! )

N/A - No submissions yet

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 4/5
Good for dry skin
Butylene Glycol Glycerin Hyaluronic Acid Cryptomeria Japonica Leaf Extract
Caution for dry skin
Sodium Lauroyl Glutamate Sodium Lauryl Sulfoacetate Sodium Carboxymethyl Beta-Glucan Glycerin Coco-glucoside
Oily/Acne-Prone Skin No data
Sensitive Skin 2/7
Good for sensitive skin
Undaria Pinnatifida Extract Glycerin
Caution for sensitive skin
Mentha Arvensis Leaf Extract Sodium Chloride Butylene Glycol Glycerin Citric Acid Phenoxyethanol Benzyl Alcohol

Ingredients list

28 total
Lower hazard (1) Higher hazard (5)
All28 Skin Conditioning18 Fragrance6 Solvent5 Hair Conditioning5 Humectant5 Masking5 Viscosity Controlling4 Antistatic Agent4
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
2
B
Disodium Laureth Sulfosuccinate
(Sufactant, Foam Boosting, Hydrotrope, Foaming)
1
B
Coco-glucoside
(Cleansing, Foaming, Surfactant)
1
A
Sodium Lauryl Sulfoacetate
(Cleansing, Foaming, Surfactant)
Sulfate
Sulfate
1
A
1,2-Hexanediol
(Solvent)
1
B
Sodium Lauroyl Glutamate
(Antistatic Agent, Hair Conditioning, Surfactant)
1
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling)
1
Lauryl Hydroxysultaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
1
Undaria Pinnatifida Extract
(Skin Conditioning, Skin Protecting)
1
B
Octyldodeceth-16
(Emulsifying)
1
A
Sodium Gluconate
(Chelating Agent, Skin Conditioning)
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
PARFUM
(Fragrance, Perfuming)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
Cryptomeria Japonica Leaf Extract
(Humectant)
Chamaecyparis Obtusa Leaf Extract
(Skin Conditioning)
1
Brassica Napus Extract
(Skin Conditioning)
1
Mentha Arvensis Leaf Extract
(Masking, Refreshing)
1
Ceramide NP
(Hair Conditioning, Skin Conditioning)
1
A
Sodium Carboxymethyl Beta-Glucan
(Binding, Cleansing, Viscosity Controlling)
5
A
Benzyl Alcohol
(External Analgesic, Fragrance, Oral Health Care Drug, Preservative, Solvent, Viscosity Decreasing Agent, Masking)
Allergens
Allergens
Bambusa Arundinacea Juice
(Abrasive, Skin Conditioning)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
Triticum Vulgare Sprout Extract
(Skin Conditioning, Skin Protecting)
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
1
A
Hyaluronic Acid
(Skin Conditioning, Viscosity Increasing Agent, Antistatic Agent, Humectant, Moisturising)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin

My Ingredient Notes

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Key ingredients

Glycerin
Humectant, Skin Protecting
Lauryl Hydroxysultaine
Skin Conditioning
Undaria Pinnatifida Extract
Skin Conditioning, Skin Protecting
Sodium Gluconate
Skin Conditioning
Panthenol
Skin Conditioning
Butylene Glycol
Skin Conditioning, Humectant

Benefits

No standout benefits flagged for this product.

Concerns

Contains paraben
Contains sulfate
Contains eu allergen
Not fungal acne (malassezia) safe
May not suit dry skin
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Disodium Laureth Sulfosuccinate
Sufactant, Foam boosting
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B SufactantFoam boostingHydrotropeFoaming
Coco-glucoside
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingFoamingSurfactant
1,2-Hexanediol
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Solvent
Sodium Lauroyl Glutamate
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Antistatic agentHair conditioningSurfactant
Sodium Chloride
Bulking agent, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 Bulking agentMaskingOral care agentViscosity controlling
Lauryl Hydroxysultaine
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Undaria Pinnatifida Extract
Skin conditioning, Skin protecting
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioningSkin protecting
Octyldodeceth-16
Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Emulsifying
Sodium Gluconate
Chelating agent, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentSkin conditioning
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Cryptomeria Japonica Leaf Extract
Humectant
Limited public safety data.Read moreShow less
EWG N/A Humectant
Chamaecyparis Obtusa Leaf Extract
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Brassica Napus Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Mentha Arvensis Leaf Extract
Masking, Refreshing
Low-hazard ingredient.Read moreShow less
EWG 1 MaskingRefreshing
+ 6 more — see the full ingredients list above
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Sodium Lauryl Sulfoacetate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A CleansingFoamingSurfactant Sulfate
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Benzyl Alcohol
External analgesic, Fragrance
Moderate-hazard ingredient.Read moreShow less
EWG 5 CIR A External analgesicFragranceOral health care drugPreservativeSolventViscosity decreasing agentMasking Allergens
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Where it fits: Use as the first step, on clean hands, before the rest of your routine.
  • 2 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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