Mugwort Calming Cleanser

Round Lab

Where to buy Possibly in stock

About this product

The Round Lab Mugwort Calming Cleanser is a cleanser. Our analysis of its 27 ingredients (26 low-risk) rates it Excellent (100/100). Based on its ingredients, it looks well-suited to oily / acne-prone, dry, and sensitive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Cleansers
Ingredients
27
Low-risk
26
Fragrance
Fragrance-free
Origin
South Korea

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

PH Level

(Know the PH? Submit it here! )

N/A - No submissions yet

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 5/4
Good for dry skin
Betaine Caprylyl Glycol Butylene Glycol Glycerin Camellia Sinensis Leaf Extract
Caution for dry skin
Sodium Lauroyl Glutamate Sodium Cocoyl Glycinate Glycerin Camellia Sinensis Leaf Extract
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Camellia Sinensis Leaf Extract
Sensitive Skin 7/7
Good for sensitive skin
Madecassoside Malt Extract Asiaticoside Melia Azadirachta Leaf Extract Glycerin Camellia Sinensis Leaf Extract Allantoin
Caution for sensitive skin
Sodium Chloride Aspartic Acid Asiaticoside Butylene Glycol Glycerin Citric Acid Camellia Sinensis Leaf Extract

Ingredients list

27 total
Lower hazard (1) Higher hazard (2)
All27 Skin Conditioning26 Hair Conditioning9 Humectant7 Skin Protecting7 Antistatic Agent6 Viscosity Controlling5 Masking5 Fragrance5
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
B
Sodium Cocoyl Glycinate
(Hair Conditioning, Skin Conditioning, Surfactant Cleansingagent)
1
B
Sodium Lauroyl Glutamate
(Antistatic Agent, Hair Conditioning, Surfactant)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
B
Coco-Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
1
B
Betaine
(Hair Conditioning, Humectant, Antistatic Agent, Skin Conditioning, Viscosity Controlling)
1
Hydroxypropyl Starch Phosphate
(Bulking Agent, Viscosity Increasing Agent, Viscosity Controlling)
1
Artemisia Vulgaris Extract
(Skin Conditioning)
1
A
Aspartic Acid
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent, Masking)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling)
1
A
Caprylyl Glycol
(Hair Conditioning, Skin Conditioning, Emollient, Humectant)
1
Polyquaternium-67
(Antistatic Agent, Film Forming, Hair Conditioning)
1
Artemisia Princeps Leaf Extract
(Skin Conditioning)
1
Melia Azadirachta Leaf Extract
(Antimicrobial, Skin Protecting)
1
Malt Extract
(Skin Conditioning, Skin Protecting, Tonic)
1
A
1,2-Hexanediol
(Solvent)
1
Melia Azadirachta Flower Extract
(Skin Conditioning)
1
B
Camellia Sinensis Leaf Extract
(Antimicrobial, Antioxidant, Astringent, Emollient, Humectant, Masking, Oral Care Agent, Skin Conditioning, Skin Protecting, Tonic, Uv Absorber)
Good for Oily Skin
Good for Oily Skin
Salvia Officinalis Oil
(Fragrance, Tonic)
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
1
A
Allantoin
(Skin Conditioning, Skin Protecting, Soothing)
Good for Oily Skin
Good for Oily Skin
Good for Sensitive Skin
Good for Sensitive Skin
1
Madecassoside
(Antioxidant, Skin Conditioning)
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
1
Asiaticoside
(Antioxidant, Skin Conditioning, Perfuming)
1
Asiatic Acid
(Skin Conditioning, Stabilising)

My Ingredient Notes

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Key ingredients

Glycerin
Humectant, Skin Protecting
Sodium Cocoyl Glycinate
Skin Conditioning
Butylene Glycol
Skin Conditioning, Humectant
Coco-Betaine
Skin Conditioning
Betaine
Humectant, Skin Conditioning
Artemisia Vulgaris Extract
Skin Conditioning

Benefits

Good for dry skin
Good for oily/acne-prone skin

Concerns

Not fungal acne (malassezia) safe

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Sodium Cocoyl Glycinate
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningSkin conditioningSurfactant - cleansingagent
Sodium Lauroyl Glutamate
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Antistatic agentHair conditioningSurfactant
Coco-Betaine
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Betaine
Hair conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningHumectantAntistatic agentSkin conditioningViscosity controlling
Hydroxypropyl Starch Phosphate
Bulking agent, Viscosity increasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 Bulking agentViscosity increasing agentViscosity controlling
Artemisia Vulgaris Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Aspartic Acid
Fragrance, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceHair conditioningSkin conditioningAntistatic agentMasking
Sodium Chloride
Bulking agent, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 Bulking agentMaskingOral care agentViscosity controlling
Caprylyl Glycol
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Hair conditioningSkin conditioningEmollientHumectant
Polyquaternium-67
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 Antistatic agentFilm formingHair conditioning
Artemisia Princeps Leaf Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Melia Azadirachta Leaf Extract
Antimicrobial, Skin protecting
Low-hazard ingredient.Read moreShow less
EWG 1 AntimicrobialSkin protecting
Malt Extract
Skin conditioning, Skin protecting
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioningSkin protectingTonic
1,2-Hexanediol
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Solvent
+ 6 more — see the full ingredients list above
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Camellia Sinensis Leaf Extract
Antimicrobial, Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B AntimicrobialAntioxidantAstringentEmollientHumectantMaskingOral care agentSkin conditioningSkin protectingTonicUv absorber Good for Oily Skin
Allantoin
Skin conditioning, Skin protecting
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningSkin protectingSoothing Good for Oily SkinGood for Sensitive Skin
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin

How to use

How to use

  • 1 Where it fits: Use as the first step, on clean hands, before the rest of your routine.
  • 2 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Officially notified as a cosmetic in Malaysia (NPRA). Government registration record.

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