Me Espresso Eau De Parfum

Sabrina Carpenter Parfums

Where to buy Possibly in stock

About this product

The Sabrina Carpenter Parfums Me Espresso Eau De Parfum is a misc. Our analysis of its 12 ingredients (7 low-risk) rates it Excellent (89/100). Based on its ingredients, it looks well-suited to oily / acne-prone skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
12
Low-risk
7
Fragrance
Contains fragrance
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe Minimal Ingredients

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 0/1
Caution for dry skin
Alcohol Denat.
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Alcohol Denat.
Sensitive Skin 0/5
Caution for sensitive skin
Linalyl Acetate Vanillin Tetramethyl Acetyloctahydronaphthalenes Citric Acid Alcohol Denat.

Ingredients list

12 total
Lower hazard (1) Higher hazard (6)
All12 Masking5 Fragrance4 Perfuming3 Uv Absorber3 Uv Filter3 Solvent2 Chelating Agent2 Antifoaming Agent1
EWG CIR Ingredient Name & Cosmetic Functions Notes
4
Alcohol Denat.
(Antifoaming Agent, Antimicrobial, Astringent, Masking, Solvent, Viscosity Controlling)
Bad for Dry Skin
Bad for Dry Skin
Bad for Sensitive Skin
Bad for Sensitive Skin
1
Water
(Solvent)
PARFUM
(Fragrance, Perfuming)
6
Ethylhexyl Methoxycinnamate
(Uv Absorber, Uv Filter)
Bad for Oily Skin
Bad for Oily Skin
Bad for Sensitive Skin
Bad for Sensitive Skin
2
Butyl Methoxydibenzoylmethane
(Uv Absorber, Uv Filter)
4
Ethylhexyl Salicylate
(Uv Absorber, Uv Filter)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
Tetrahydroxypropyl Ethylenediamine
(Chelating Agent)
1
Linalyl Acetate
(Fragrance, Masking)
Rose Ketone-4
(Perfuming)
1
Tetramethyl Acetyloctahydronaphthalenes
(Masking, Perfuming, Skin Conditioning)
1
Vanillin
(Flavoring Agent, Fragrance, Masking)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Alcohol Denat.
Astringent
Ethylhexyl Methoxycinnamate
Uv Absorber, Uv Filter
Butyl Methoxydibenzoylmethane
Uv Absorber, Uv Filter
Ethylhexyl Salicylate
Uv Absorber, Uv Filter
Tetramethyl Acetyloctahydronaphthalenes
Skin Conditioning

Benefits

Fungal-acne (Malassezia) safe
Good for oily/acne-prone skin

Concerns

May not suit dry skin
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Butyl Methoxydibenzoylmethane
Uv absorber, Uv filter
Low-hazard ingredient.Read moreShow less
EWG 2 Uv absorberUv filter
Ethylhexyl Salicylate
Uv absorber, Uv filter
Low-to-moderate hazard.Read moreShow less
EWG 4 Uv absorberUv filter
Tetrahydroxypropyl Ethylenediamine
Chelating agent
Low-hazard ingredient.Read moreShow less
EWG 1 Chelating agent
Linalyl Acetate
Fragrance, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 FragranceMasking
Rose Ketone-4
Perfuming
Limited public safety data.Read moreShow less
EWG N/A Perfuming
Tetramethyl Acetyloctahydronaphthalenes
Masking, Perfuming
Low-hazard ingredient.Read moreShow less
EWG 1 MaskingPerfumingSkin conditioning
Vanillin
Flavoring agent, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 1 Flavoring agentFragranceMasking
Alcohol Denat.
Antifoaming agent, Antimicrobial
Causes moisture evaporation - prone to dry out skinRead moreShow less
EWG 4 Antifoaming agentAntimicrobialAstringentMaskingSolventViscosity controlling Bad for Dry SkinBad for Sensitive Skin
Ethylhexyl Methoxycinnamate
Uv absorber, Uv filter
Potentially a skin irritantRead moreShow less
EWG 6 Uv absorberUv filter Bad for Oily SkinBad for Sensitive Skin
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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