Recover & Restore Damage Repair Shampoo

Saltair

Recover & Restore Damage Repair Shampoo

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About this product

The Saltair Recover & Restore Damage Repair Shampoo is a misc. Our analysis of its 36 ingredients (25 low-risk) rates it Excellent (90/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
36
Low-risk
25
Fragrance
Contains fragrance
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 4/7
Good for dry skin
Glycol Distearate Salvia Hispanica Seed Extract Caprylyl Glycol Glycerin
Caution for dry skin
Sodium Methyl Cocoyl Taurate Sodium Cocoyl Isethionate Glycerin Coco-glucoside Polyglyceryl-10 Laurate Sodium C14-16 Olefin Sulfonate PEG-150 Distearate
Oily/Acne-Prone Skin No data
Sensitive Skin 4/10
Good for sensitive skin
Ulva Lactuca Extract Spirulina Platensis Extract Glycerin Laminaria Digitata Extract
Caution for sensitive skin
Arginine Glycerin Citric Acid Sodium Benzoate Phenoxyethanol Linalool Benzyl Alcohol Citronellol Hexyl Cinnamal Hydroxycitronellal

Ingredients list

36 total
Lower hazard (1) Higher hazard (7)
All36 Skin Conditioning18 Fragrance11 Hair Conditioning8 Masking8 Antistatic Agent6 Surfactant6 Film Forming5 Viscosity Controlling5
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
4
B
Cocamidopropyl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
1
B
Sodium Cocoyl Isethionate
(Cleansing, Hair Conditioning, Surfactant)
Fungal Acne
Fungal Acne Trigger
2
B
Sodium C14-16 Olefin Sulfonate
(Cleansing, Foaming, Surfactant)
Sulfate
Sulfate
1
A
Glycol Distearate
(Opacifying, Viscosity Increasing Agent, Emollient, Emulsifying, Skin Conditioning, Viscosity Controlling)
Fungal Acne
Fungal Acne Trigger
PARFUM
(Fragrance, Perfuming)
Aspergillus Ferment
(Skin Conditioning)
1
A
Arginine
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent, Masking)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
Itaconic Acid
(Antimicrobial, Buffering, Skin Conditioning, Skin Conditioning Emollient)
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
Linum Usitatissimum Seed Extract
(Perfuming, Skin Conditioning)
1
Salvia Hispanica Seed Extract
(Emollient, Skin Conditioning)
1
B
Polyglyceryl-10 Laurate
(Skin Conditioning, Emulsifying, Surfactant)
1
Lactobacillus Ferment Lysate
(Skin Conditioning)
1
Ulva Lactuca Extract
(Skin Conditioning, Skin Protecting)
1
Laminaria Digitata Extract
(Skin Protecting)
1
Spirulina Platensis Extract
(Skin Protecting)
1
B
Sodium Methyl Cocoyl Taurate
(Cleansing, Foaming, Surfactant)
Fungal Acne
Fungal Acne Trigger
3
A
Polyquaternium-7
(Antistatic Agent, Film Forming, Hair Fixing)
2
B
Acrylamidopropyltrimonium Chloride/Acrylamide Copolymer
(Antistatic Agent, Film Forming, Hair Fixing)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
1
B
Coco-glucoside
(Cleansing, Foaming, Surfactant)
1
B
Brassicamidopropyl Dimethylamine
(Hair Conditioning, Skin Conditioning)
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
1
Acrylates/C10-30 Alkyl Acrylate Crosspolymer
(Emulsion Stabilising, Film Forming, Viscosity Controlling)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
3
B
PEG-150 Distearate
(Emulsifying, Surfactant, Viscosity Controlling)
1
A
Guar Hydroxypropyltrimonium Chloride
(Antistatic Agent, Hair Conditioning, Viscosity Increasing Agent, Film Forming, Skin Conditioning, Viscosity Controlling)
1
Tetrasodium Glutamate Diacetate
(Chelating Agent)
1
A
Caprylyl Glycol
(Hair Conditioning, Skin Conditioning, Emollient, Humectant)
5
Citronellol
(Fragrance, Masking)
Allergens
Allergens
5
Hexyl Cinnamal
(Fragrance, Masking)
Allergens
Allergens
7
Hydroxycitronellal
(Fragrance, Masking)
Allergens
Allergens
5
Linalool
(Fragrance, Deodorant, Masking)
Allergens
Allergens
5
A
Benzyl Alcohol
(External Analgesic, Fragrance, Oral Health Care Drug, Preservative, Solvent, Viscosity Decreasing Agent, Masking)
Allergens
Allergens

My Ingredient Notes

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Key ingredients

Cocamidopropyl Betaine
Skin Conditioning
Glycol Distearate
Emollient, Skin Conditioning
Aspergillus Ferment
Skin Conditioning
Arginine
Skin Conditioning
Glycerin
Humectant, Skin Protecting
Itaconic Acid
Skin Conditioning

Benefits

No standout benefits flagged for this product.

Concerns

Contains paraben
Contains sulfate
Contains eu allergen
Not fungal acne (malassezia) safe
Hydroxycitronellal — higher EWG
May not suit dry skin
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cocamidopropyl Betaine
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Aspergillus Ferment
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Arginine
Fragrance, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceHair conditioningSkin conditioningAntistatic agentMasking
Itaconic Acid
Antimicrobial, Buffering
Limited public safety data.Read moreShow less
EWG N/A AntimicrobialBufferingSkin conditioningSkin conditioning emollient
Linum Usitatissimum Seed Extract
Perfuming, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A PerfumingSkin conditioning
Salvia Hispanica Seed Extract
Emollient, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 EmollientSkin conditioning
Polyglyceryl-10 Laurate
Skin conditioning, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Skin conditioningEmulsifyingSurfactant
Lactobacillus Ferment Lysate
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Ulva Lactuca Extract
Skin conditioning, Skin protecting
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioningSkin protecting
Laminaria Digitata Extract
Skin protecting
Low-hazard ingredient.Read moreShow less
EWG 1 Skin protecting
Spirulina Platensis Extract
Skin protecting
Low-hazard ingredient.Read moreShow less
EWG 1 Skin protecting
Polyquaternium-7
Antistatic agent, Film forming
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Antistatic agentFilm formingHair fixing
Acrylamidopropyltrimonium Chloride/Acrylamide Copolymer
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B Antistatic agentFilm formingHair fixing
+ 8 more — see the full ingredients list above
Sodium Cocoyl Isethionate
Cleansing, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingHair conditioningSurfactant Fungal-acne trigger
Sodium C14-16 Olefin Sulfonate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B CleansingFoamingSurfactant Sulfate
Glycol Distearate
Opacifying, Viscosity increasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A OpacifyingViscosity increasing agentEmollientEmulsifyingSkin conditioningViscosity controlling Fungal-acne trigger
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Sodium Methyl Cocoyl Taurate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingFoamingSurfactant Fungal-acne trigger
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Citronellol
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens
Hexyl Cinnamal
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens
Hydroxycitronellal
Fragrance, Masking
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceMasking Allergens
Linalool
Fragrance, Deodorant
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceDeodorantMasking Allergens
Benzyl Alcohol
External analgesic, Fragrance
Moderate-hazard ingredient.Read moreShow less
EWG 5 CIR A External analgesicFragranceOral health care drugPreservativeSolventViscosity decreasing agentMasking Allergens

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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