Nameraka Honpo Q10 Soy Milk Moisturizing Lotion Toner

SANA

Nameraka Honpo Q10 Soy Milk Moisturizing Lotion Toner

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About this product

The SANA Nameraka Honpo Q10 Soy Milk Moisturizing Lotion Toner is a toner. Our analysis of its 18 ingredients (14 low-risk) rates it Excellent (95/100). Based on its ingredients, it looks well-suited to oily / acne-prone and dry skin.

Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Toners
Ingredients
18
Low-risk
14
Fragrance
Fragrance-free
Origin
Japan

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 6/4
Good for dry skin
Methyl Gluceth-10 Caprylic/Capric Triglyceride Butylene Glycol Glycerin Polyquaternium-51 Lecithin
Caution for dry skin
Glycerin PEG-60 Hydrogenated Castor Oil Alcohol Denat. Lecithin
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Alcohol Denat.
Sensitive Skin 3/8
Good for sensitive skin
Ubiquinone Glycerin Tocopheryl Acetate
Caution for sensitive skin
Sodium Citrate Caprylic/Capric Triglyceride Butylene Glycol Glycerin Citric Acid PEG-60 Hydrogenated Castor Oil Methylparaben Alcohol Denat.

Ingredients list

18 total
Lower hazard (1) Higher hazard (4)
All18 Skin Conditioning12 Film Forming5 Masking5 Humectant5 Solvent5 Fragrance5 Viscosity Controlling3 Surfactant2
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
4
Alcohol Denat.
(Antifoaming Agent, Antimicrobial, Astringent, Masking, Solvent, Viscosity Controlling)
Bad for Dry Skin
Bad for Dry Skin
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Methyl Gluceth-10
(Emulsifying, Humectant, Moisturising)
Milk Ferment
(Skin Conditioning)
Glycine Max Seed Extract
(Hair Conditioning, Skin Conditioning, Skin Protecting)
1
Ubiquinone
(Antioxidant, Skin Conditioning)
3
Tocopheryl Acetate
(Antioxidant, Skin Conditioning)
Bad for Oily Skin
Bad for Oily Skin
2
A
Styrene/Acrylates Copolymer
(Film Forming, Opacifying)
3
B
PEG-60 Hydrogenated Castor Oil
(Fragrance, Sufactant, Surfactant)
Fungal Acne
Fungal Acne Trigger
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Sodium Citrate
(Ph Adjuster, Buffering Agent, Chelating, Masking)
1
A
Caprylic/Capric Triglyceride
(Emollient, Masking, Perfuming, Skin Conditioning, Solvent)
1
A
Hydroxyethylcellulose
(Binding Agent, Emulsion Stabilising, Film Forming, Viscosity Increasing Agent, Binding, Stabilising, Viscosity Controlling)
1
Polyquaternium-51
(Film Forming, Humectant, Skin Conditioning)
2
3
Lecithin
(Skin Conditioning, Emulsifying, Surfactant, Antistatic Agent, Emollient)
4
A
Methylparaben
(Fragrance, Preservative)
Paraben
Paraben

My Ingredient Notes

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Key ingredients

Glycerin
Humectant, Skin Protecting
Butylene Glycol
Skin Conditioning, Humectant
Alcohol Denat.
Astringent
Methyl Gluceth-10
Humectant, Moisturising
Milk Ferment
Skin Conditioning
Glycine Max Seed Extract
Skin Conditioning, Skin Protecting

Benefits

Good for dry skin
Good for oily/acne-prone skin

Concerns

Contains paraben
Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Methyl Gluceth-10
Emulsifying, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmulsifyingHumectantMoisturising
Milk Ferment
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Glycine Max Seed Extract
Hair conditioning, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Hair conditioningSkin conditioningSkin protecting
Ubiquinone
Antioxidant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 AntioxidantSkin conditioning
Styrene/Acrylates Copolymer
Film forming, Opacifying
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Film formingOpacifying
Sodium Citrate
Ph adjuster, Buffering agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Ph adjusterBuffering agentChelatingMasking
Caprylic/Capric Triglyceride
Emollient, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmollientMaskingPerfumingSkin conditioningSolvent
Hydroxyethylcellulose
Binding agent, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Binding agentEmulsion stabilisingFilm formingViscosity increasing agentBindingStabilisingViscosity controlling
Polyquaternium-51
Film forming, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 Film formingHumectantSkin conditioning
Lecithin
Skin conditioning, Emulsifying
Low-to-moderate hazard.Read moreShow less
EWG 2–3 Skin conditioningEmulsifyingSurfactantAntistatic agentEmollient
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Alcohol Denat.
Antifoaming agent, Antimicrobial
Causes moisture evaporation - prone to dry out skinRead moreShow less
EWG 4 Antifoaming agentAntimicrobialAstringentMaskingSolventViscosity controlling Bad for Dry SkinBad for Sensitive Skin
Tocopheryl Acetate
Antioxidant, Skin conditioning
Potentially comedogenic - can block poresRead moreShow less
EWG 3 AntioxidantSkin conditioning Bad for Oily Skin
PEG-60 Hydrogenated Castor Oil
Fragrance, Sufactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B FragranceSufactantSurfactant Fungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Methylparaben
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben

How to use

How to use

  • 1 Where it fits: Use right after cleansing, before serums.
  • 2 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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