Clear Wellness Gentle Wash

Sekkisei

Where to buy Possibly in stock

About this product

The Sekkisei Clear Wellness Gentle Wash is a cleanser. Our analysis of its 16 ingredients (13 low-risk) rates it Excellent (97/100). Based on its ingredients, it looks well-suited to oily / acne-prone, dry, and sensitive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Cleansers
Ingredients
16
Low-risk
13
Fragrance
Fragrance-free
Origin
Japan

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

PH Level

(Know the PH? Submit it here! )

N/A - No submissions yet

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 6/4
Good for dry skin
Glycosyl Trehalose Maltitol Equisetum Arvense Extract Butylene Glycol Glycerin Hydrolyzed Starch
Caution for dry skin
Sodium Methyl Cocoyl Taurate Equisetum Arvense Extract Glycerin Potassium Cocoyl Glycinate
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Equisetum Arvense Extract
Sensitive Skin 4/4
Good for sensitive skin
Glycosyl Trehalose Equisetum Arvense Extract Glycerin Hydrolyzed Starch
Caution for sensitive skin
Maltitol Butylene Glycol Glycerin Phenoxyethanol

Ingredients list

16 total
Lower hazard (1) Higher hazard (4)
All16 Skin Conditioning8 Humectant7 Solvent3 Fragrance3 Hair Conditioning3 Skin Protecting3 Film Forming2 Emulsion Stabilising2
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
B
Potassium Cocoyl Glycinate
(Hair Conditioning, Surfactant)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
B
Sodium Methyl Cocoyl Taurate
(Cleansing, Foaming, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
A
Sodium Cocoamphoacetate
(Hair Conditioning, Sufactant, Foam Boosting, Foaming)
1
Glycosyl Trehalose
(Binding Agent, Emulsion Stabilising, Film Forming, Humectant, Skin Protecting)
Alpinia Zerumbet Leaf Extract
(Anti Sebum, Antimicrobial)
1
Houttuynia Cordata Extract
(Skin Conditioning)
1
Equisetum Arvense Extract
(Astringent, Emollient, Soothing, Tonic)
1
Coix Lacryma-Jobi Ma-yuen Seed Extract
(Skin Conditioning)
1
A
Maltitol
(Flavoring Agent, Humectant, Masking, Moisturising, Skin Conditioning)
1
Morinda Citrifolia Fruit Juice
(Skin Conditioning)
1
A
Disodium EDTA
(Chelating Agent, Viscosity Controlling)
Hydrolyzed Starch
(Humectant, Skin Conditioning, Skin Protecting)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben

My Ingredient Notes

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Key ingredients

Butylene Glycol
Skin Conditioning, Humectant
Glycerin
Humectant, Skin Protecting
Glycosyl Trehalose
Humectant, Skin Protecting
Houttuynia Cordata Extract
Skin Conditioning
Equisetum Arvense Extract
Astringent, Emollient
Coix Lacryma-Jobi Ma-yuen Seed Extract
Skin Conditioning

Benefits

Good for dry skin
Good for oily/acne-prone skin

Concerns

Contains paraben
Not fungal acne (malassezia) safe

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Potassium Cocoyl Glycinate
Hair conditioning, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningSurfactant
Sodium Cocoamphoacetate
Hair conditioning, Sufactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Hair conditioningSufactantFoam boostingFoaming
Glycosyl Trehalose
Binding agent, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 Binding agentEmulsion stabilisingFilm formingHumectantSkin protecting
Alpinia Zerumbet Leaf Extract
Anti sebum, Antimicrobial
Limited public safety data.Read moreShow less
EWG N/A Anti sebumAntimicrobial
Houttuynia Cordata Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Equisetum Arvense Extract
Astringent, Emollient
Low-hazard ingredient.Read moreShow less
EWG 1 AstringentEmollientSoothingTonic
Coix Lacryma-Jobi Ma-yuen Seed Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Maltitol
Flavoring agent, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Flavoring agentHumectantMaskingMoisturisingSkin conditioning
Morinda Citrifolia Fruit Juice
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Disodium EDTA
Chelating agent, Viscosity controlling
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentViscosity controlling
Hydrolyzed Starch
Humectant, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A HumectantSkin conditioningSkin protecting
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Sodium Methyl Cocoyl Taurate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingFoamingSurfactant Fungal-acne trigger
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben

How to use

How to use

  • 1 Where it fits: Use as the first step, on clean hands, before the rest of your routine.
  • 2 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Officially notified as a cosmetic in Malaysia (NPRA). Government registration record.

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