Refreshing Cleansing Water

Shiseido

Where to buy Possibly in stock

About this product

The Shiseido Refreshing Cleansing Water is a makeup remover. Our analysis of its 22 ingredients (11 low-risk) rates it Excellent (90/100). Based on its ingredients, it looks well-suited to dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Makeup Removers
Ingredients
22
Low-risk
11
Fragrance
Contains fragrance
Origin
Japan

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 2/1
Good for dry skin
Betaine Butylene Glycol
Caution for dry skin
PPG-13-Decyltetradeceth-24
Oily/Acne-Prone Skin No data
Sensitive Skin 0/10
Caution for sensitive skin
Dipropylene Glycol Sodium Citrate Butylene Glycol Citric Acid Benzoic Acid Methylparaben Phenoxyethanol Linalool Citronellol Limonene

Ingredients list

22 total
Lower hazard (1) Higher hazard (6)
All22 Fragrance11 Skin Conditioning8 Masking7 Solvent4 Humectant3 Viscosity Controlling3 Buffering Agent3 Ph Adjuster3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
A
Dipropylene Glycol
(Fragrance, Solvent, Viscosity Decreasing Agent, Masking, Viscosity Controlling)
PEG/PPG-50/40 Dimethyl Ether
(Skin Conditioning)
1
B
PPG-13-Decyltetradeceth-24
(Emulsifying, Surfactant)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
4
A
Methylparaben
(Fragrance, Preservative)
Paraben
Paraben
1
Tetrahydroxypropyl Ethylenediamine
(Chelating Agent)
1
B
Betaine
(Hair Conditioning, Humectant, Antistatic Agent, Skin Conditioning, Viscosity Controlling)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Sodium Citrate
(Ph Adjuster, Buffering Agent, Chelating, Masking)
PARFUM
(Fragrance, Perfuming)
Dimorpholinopyridazinone
(Uv Absorber)
1
B
Sodium Metaphosphate
(Buffering Agent, Chelating Agent, Oral Care Agent)
5
Citronellol
(Fragrance, Masking)
Allergens
Allergens
5
Linalool
(Fragrance, Deodorant, Masking)
Allergens
Allergens
6
Limonene
(Deodorant, Perfuming, Solvent)
Allergens
Allergens
1
Paeonia Albiflora Root Extract
(Skin Conditioning)
TOCOPHEROL
(Antioxidant, Fragrance, Skin Conditioning)
HAMAMELIS VIRGINIANA LEAF EXTRACT
(Skin Conditioning)
rosmarinus officinalis leaf extract
(Antimicrobial, Fragrance, Skin Conditioning)
3
A
Benzoic Acid
(Fragrance, Ph Adjuster, Preservative, Bulking Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin

My Ingredient Notes

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Key ingredients

Butylene Glycol
Skin Conditioning, Humectant
PEG/PPG-50/40 Dimethyl Ether
Skin Conditioning
Betaine
Humectant, Skin Conditioning
Dimorpholinopyridazinone
Uv Absorber
Paeonia Albiflora Root Extract
Skin Conditioning
TOCOPHEROL
Antioxidant, Skin Conditioning

Benefits

Fungal-acne (Malassezia) safe
Good for dry skin

Concerns

Contains paraben
Contains eu allergen
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Dipropylene Glycol
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSolventViscosity decreasing agentMaskingViscosity controlling
PEG/PPG-50/40 Dimethyl Ether
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
PPG-13-Decyltetradeceth-24
Emulsifying, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B EmulsifyingSurfactant
Tetrahydroxypropyl Ethylenediamine
Chelating agent
Low-hazard ingredient.Read moreShow less
EWG 1 Chelating agent
Betaine
Hair conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningHumectantAntistatic agentSkin conditioningViscosity controlling
Sodium Citrate
Ph adjuster, Buffering agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Ph adjusterBuffering agentChelatingMasking
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Dimorpholinopyridazinone
Uv absorber
Limited public safety data.Read moreShow less
EWG N/A Uv absorber
Sodium Metaphosphate
Buffering agent, Chelating agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Buffering agentChelating agentOral care agent
Paeonia Albiflora Root Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
TOCOPHEROL
Antioxidant, Fragrance
Limited public safety data.Read moreShow less
EWG N/A AntioxidantFragranceSkin conditioning
HAMAMELIS VIRGINIANA LEAF EXTRACT
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
rosmarinus officinalis leaf extract
Antimicrobial, Fragrance
Limited public safety data.Read moreShow less
EWG N/A AntimicrobialFragranceSkin conditioning
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Methylparaben
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Citronellol
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens
Linalool
Fragrance, Deodorant
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceDeodorantMasking Allergens
Limonene
Deodorant, Perfuming
Moderate-hazard ingredient.Read moreShow less
EWG 6 DeodorantPerfumingSolvent Allergens
Benzoic Acid
Fragrance, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePh adjusterPreservativeBulking agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Where it fits: Use as the first step, on clean hands, before the rest of your routine.
  • 2 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Officially notified as a cosmetic in Malaysia (NPRA). Government registration record.

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