Shiseido IBUKI Gentle Cleanser

Shiseido

Shiseido IBUKI Gentle Cleanser

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About this product

The Shiseido IBUKI Gentle Cleanser is a cleanser. Our analysis of its 22 ingredients (16 low-risk) rates it Excellent (83/100). Based on its ingredients, it looks well-suited to oily / acne-prone skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Cleansers
Ingredients
22
Low-risk
16
Fragrance
Contains fragrance
Origin
Japan

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

PH Level

(Know the PH? Submit it here! )

N/A - No submissions yet

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 5/6
Good for dry skin
Betaine Butylene Glycol Glycerin Trehalose PEG-8
Caution for dry skin
Glyceryl Stearate SE Lauric Acid Sodium Methyl Cocoyl Taurate Stearic Acid Glycerin Alcohol Denat.
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Alcohol Denat.
Sensitive Skin 1/11
Good for sensitive skin
Glycerin
Caution for sensitive skin
Lauric Acid Myristic Acid Stearic Acid Butylene Glycol Glycerin Sodium Benzoate Alcohol Denat. Hexyl Cinnamal Limonene Butylphenyl Methylpropional Fragrance

Ingredients list

22 total
Lower hazard (1) Higher hazard (8)
All22 Fragrance7 Humectant7 Solvent6 Masking6 Viscosity Controlling5 Perfuming5 Skin Conditioning4 Emulsifying4
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
A
Stearic Acid
(Fragrance, Sufactant, Emulsifying, Surfactantsurfactant Cleansing Agent Is Included As A Function For The Soap Form Of Stearic Acid., Emulsion Stabilising, Masking, Refatting)
Bad for Oily Skin
Bad for Oily Skin
Fungal Acne
Fungal Acne Trigger
3
A
PEG-8
(Humectant, Solvent)
1
A
Myristic Acid
(Fragrance, Opacifying, Sufactant, Emulsifying, Perfuming)
Bad for Oily Skin
Bad for Oily Skin
Fungal Acne
Fungal Acne Trigger
3
B
Potassium Hydroxide
(Ph Adjuster, Buffering Agent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
A
Lauric Acid
(Fragrance, Sufactantsurfactant Cleansing Agent Is Included As A Function For The Soap Form Of Lauric Acid., Emulsifying)
Bad for Oily Skin
Bad for Oily Skin
Fungal Acne
Fungal Acne Trigger
4
Alcohol Denat.
(Antifoaming Agent, Antimicrobial, Astringent, Masking, Solvent, Viscosity Controlling)
Bad for Dry Skin
Bad for Dry Skin
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
A
Glyceryl Stearate SE
(Emulsifying, Surfactant)
Bad for Oily Skin
Bad for Oily Skin
1
A
Trehalose
(Flavoring Agent, Humectant, Moisturising)
3
A
Polyquaternium-7
(Antistatic Agent, Film Forming, Hair Fixing)
4
B
Cocamidopropyl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
1
B
Sodium Methyl Cocoyl Taurate
(Cleansing, Foaming, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
Tocopherol (Vitamin E) Good for Dry Skin
Good for Dry Skin
8
Fragrance
(Deodorant, Masking, Perfuming)
1
A
Disodium EDTA
(Chelating Agent, Viscosity Controlling)
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
6
Limonene
(Deodorant, Perfuming, Solvent)
Allergens
Allergens
5
Hexyl Cinnamal
(Fragrance, Masking)
Allergens
Allergens
7
Butylphenyl Methylpropional
(Perfuming)
Allergens
Allergens
1
B
Betaine
(Hair Conditioning, Humectant, Antistatic Agent, Skin Conditioning, Viscosity Controlling)

My Ingredient Notes

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Key ingredients

PEG-8
Humectant
Glycerin
Humectant, Skin Protecting
Alcohol Denat.
Astringent
Butylene Glycol
Skin Conditioning, Humectant
Trehalose
Humectant, Moisturising
Cocamidopropyl Betaine
Skin Conditioning

Benefits

Good for oily/acne-prone skin

Concerns

Contains eu allergen
Not fungal acne (malassezia) safe
Fragrance — higher EWG
Butylphenyl Methylpropional — higher EWG
May not suit dry skin
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
PEG-8
Humectant, Solvent
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A HumectantSolvent
Potassium Hydroxide
Ph adjuster, Buffering agent
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B Ph adjusterBuffering agent
Trehalose
Flavoring agent, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Flavoring agentHumectantMoisturising
Polyquaternium-7
Antistatic agent, Film forming
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Antistatic agentFilm formingHair fixing
Cocamidopropyl Betaine
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Disodium EDTA
Chelating agent, Viscosity controlling
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentViscosity controlling
Sodium Benzoate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservativeAnticorrosiveMasking
Betaine
Hair conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningHumectantAntistatic agentSkin conditioningViscosity controlling
Stearic Acid
Fragrance, Sufactant
Potentially comedogenic - can block poresRead moreShow less
EWG 1 CIR A FragranceSufactantEmulsifyingSurfactantsurfactant-cleansing agent is included as a function for the soap form of stearic acid.Emulsion stabilisingMaskingRefatting Bad for Oily SkinFungal-acne trigger
Myristic Acid
Fragrance, Opacifying
Potentially comedogenic - can block poresRead moreShow less
EWG 1 CIR A FragranceOpacifyingSufactantEmulsifyingPerfuming Bad for Oily SkinFungal-acne trigger
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Lauric Acid
Fragrance, Sufactantsurfactant-cleansing agent is included as a function for the soap form of lauric acid.
Potentially comedogenic - can block poresRead moreShow less
EWG 1 CIR A FragranceSufactantsurfactant-cleansing agent is included as a function for the soap form of lauric acid.Emulsifying Bad for Oily SkinFungal-acne trigger
Alcohol Denat.
Antifoaming agent, Antimicrobial
Causes moisture evaporation - prone to dry out skinRead moreShow less
EWG 4 Antifoaming agentAntimicrobialAstringentMaskingSolventViscosity controlling Bad for Dry SkinBad for Sensitive Skin
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Glyceryl Stearate SE
Emulsifying, Surfactant
Potentially comedogenic - can block poresRead moreShow less
EWG 1 CIR A EmulsifyingSurfactant Bad for Oily Skin
Sodium Methyl Cocoyl Taurate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingFoamingSurfactant Fungal-acne trigger
Tocopherol (Vitamin E)
Other
Low-hazard ingredient.Read moreShow less
EWG 1 Good for Dry Skin
Fragrance
Deodorant, Masking
Higher-hazard ingredient.Read moreShow less
EWG 8 DeodorantMaskingPerfuming
Limonene
Deodorant, Perfuming
Moderate-hazard ingredient.Read moreShow less
EWG 6 DeodorantPerfumingSolvent Allergens
Hexyl Cinnamal
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens
Butylphenyl Methylpropional
Perfuming
Higher-hazard ingredient.Read moreShow less
EWG 7 Perfuming Allergens

How to use

How to use

  • 1 Where it fits: Use as the first step, on clean hands, before the rest of your routine.
  • 2 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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