Shiseido Pureness Refreshing Cleansing Water, Oil-Free, Alcohol-Free

Shiseido

Shiseido Pureness Refreshing Cleansing Water, Oil-Free, Alcohol-Free

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About this product

The Shiseido Pureness Refreshing Cleansing Water, Oil-Free, Alcohol-Free is a cleanser. Our analysis of its 18 ingredients (12 low-risk) rates it Excellent (87/100). Based on its ingredients, it looks well-suited to dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Cleansers
Ingredients
18
Low-risk
12
Fragrance
Contains fragrance
Origin
Japan

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

PH Level

(Know the PH? Submit it here! )

N/A - No submissions yet

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 3/2
Good for dry skin
Betaine Rose Extract Butylene Glycol
Caution for dry skin
PPG-13-Decyltetradeceth-24 Poloxamer 184
Oily/Acne-Prone Skin 0/1
Caution for oily/acne-prone skin
Rose Extract
Sensitive Skin 0/9
Caution for sensitive skin
Dipropylene Glycol Sodium Citrate Butylene Glycol Sodium Hexametaphosphate Citric Acid Benzoic Acid Methylparaben Phenoxyethanol Fragrance

Ingredients list

18 total
Lower hazard (1) Higher hazard (8)
All18 Fragrance7 Masking7 Skin Conditioning5 Solvent3 Humectant3 Viscosity Controlling3 Ph Adjuster3 Chelating Agent3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
A
Dipropylene Glycol
(Fragrance, Solvent, Viscosity Decreasing Agent, Masking, Viscosity Controlling)
Pinus Pinaster Wood Extract
(Skin Conditioning)
5
A
Poloxamer 184
(Emulsifying, Surfactant)
1
B
PPG-13-Decyltetradeceth-24
(Emulsifying, Surfactant)
1
B
Betaine
(Hair Conditioning, Humectant, Antistatic Agent, Skin Conditioning, Viscosity Controlling)
1
Tetrahydroxypropyl Ethylenediamine
(Chelating Agent)
1
A
Sodium Citrate
(Ph Adjuster, Buffering Agent, Chelating, Masking)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
Dimorpholinopyridazinone
(Uv Absorber)
2
B
Sodium Hexametaphosphate
(Chelating Agent, Anticorrosive, Fragrance, Masking)
1
Oak Root Extract
(Skin Conditioning)
1
Rose Extract
(Skin Conditioning Agent Occlusive)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
4
A
Methylparaben
(Fragrance, Preservative)
Paraben
Paraben
3
A
Benzoic Acid
(Fragrance, Ph Adjuster, Preservative, Bulking Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
8
Fragrance
(Deodorant, Masking, Perfuming)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Butylene Glycol
Skin Conditioning, Humectant
Pinus Pinaster Wood Extract
Skin Conditioning
Betaine
Humectant, Skin Conditioning
Dimorpholinopyridazinone
Uv Absorber
Oak Root Extract
Skin Conditioning

Benefits

Fungal-acne (Malassezia) safe
Good for dry skin

Concerns

Contains paraben
Fragrance — higher EWG
May not suit oily/acne-prone skin
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Dipropylene Glycol
Fragrance, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSolventViscosity decreasing agentMaskingViscosity controlling
Pinus Pinaster Wood Extract
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
PPG-13-Decyltetradeceth-24
Emulsifying, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B EmulsifyingSurfactant
Betaine
Hair conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningHumectantAntistatic agentSkin conditioningViscosity controlling
Tetrahydroxypropyl Ethylenediamine
Chelating agent
Low-hazard ingredient.Read moreShow less
EWG 1 Chelating agent
Sodium Citrate
Ph adjuster, Buffering agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Ph adjusterBuffering agentChelatingMasking
Dimorpholinopyridazinone
Uv absorber
Limited public safety data.Read moreShow less
EWG N/A Uv absorber
Sodium Hexametaphosphate
Chelating agent, Anticorrosive
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B Chelating agentAnticorrosiveFragranceMasking
Oak Root Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Rose Extract
Skin-conditioning agent - occlusive
Low-hazard ingredient.Read moreShow less
EWG 1 Skin-conditioning agent - occlusive
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Poloxamer 184
Emulsifying, Surfactant
Moderate-hazard ingredient.Read moreShow less
EWG 5 CIR A EmulsifyingSurfactant
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Methylparaben
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Benzoic Acid
Fragrance, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePh adjusterPreservativeBulking agentMasking Bad for Sensitive Skin
Fragrance
Deodorant, Masking
Higher-hazard ingredient.Read moreShow less
EWG 8 DeodorantMaskingPerfuming

How to use

How to use

  • 1 Where it fits: Use as the first step, on clean hands, before the rest of your routine.
  • 2 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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