Ultimate Revival Essence

SK-II

Where to buy Possibly in stock

About this product

The SK-II Ultimate Revival Essence is a serums, essence, ampoule. Our analysis of its 14 ingredients (12 low-risk) rates it Excellent (97/100). Based on its ingredients, it looks well-suited to dry skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Serums, Essence, Ampoules
Ingredients
14
Low-risk
12
Fragrance
Fragrance-free
Origin
Japan

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe Minimal Ingredients

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 5/1
Good for dry skin
Betaine Butylene Glycol Glycerin Hydroxyethyl Urea Galactomyces Ferment Filtrate
Caution for dry skin
Glycerin
Oily/Acne-Prone Skin No data
Sensitive Skin 2/7
Good for sensitive skin
Glycerin Triethyl Citrate
Caution for sensitive skin
Sodium Citrate Butylene Glycol Glycerin Triethyl Citrate Sodium Benzoate Sorbic Acid Methylparaben

Ingredients list

14 total
Lower hazard (1) Higher hazard (4)
All14 Humectant7 Skin Conditioning7 Fragrance6 Solvent5 Masking4 Preservative3 Hair Conditioning3 Viscosity Controlling2
EWG CIR Ingredient Name & Cosmetic Functions Notes
Galactomyces Ferment Filtrate
(Humectant)
Fungal Acne
Fungal Acne Trigger
1
Water
(Solvent)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
Hydroxyethyl Urea
(Hair Conditioning, Humectant, Skin Conditioning)
1
A
Pentylene Glycol
(Skin Conditioning, Solvent)
1
B
Betaine
(Hair Conditioning, Humectant, Antistatic Agent, Skin Conditioning, Viscosity Controlling)
1
A
Sodium Citrate
(Ph Adjuster, Buffering Agent, Chelating, Masking)
1
A
Triethyl Citrate
(Fragrance, Plasticizer, Antioxidant, Deodorant, Masking, Solvent)
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
4
A
Methylparaben
(Fragrance, Preservative)
Paraben
Paraben
1
B
Centella Asiatica Leaf Extract
(Skin Conditioning)
3
A
Sorbic Acid
(Fragrance, Preservative)
1
Saccharomyces Cerevisiae Extract
(Skin Conditioning)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

Browse similar serums, essence, ampoule
No close formula match yet — browse other products like this

Key ingredients

Galactomyces Ferment Filtrate
Humectant
Butylene Glycol
Skin Conditioning, Humectant
Glycerin
Humectant, Skin Protecting
Hydroxyethyl Urea
Humectant, Skin Conditioning
Pentylene Glycol
Skin Conditioning
Betaine
Humectant, Skin Conditioning

Benefits

Good for dry skin

Concerns

Contains paraben
Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Hydroxyethyl Urea
Hair conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 Hair conditioningHumectantSkin conditioning
Pentylene Glycol
Skin conditioning, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningSolvent
Betaine
Hair conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningHumectantAntistatic agentSkin conditioningViscosity controlling
Sodium Citrate
Ph adjuster, Buffering agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Ph adjusterBuffering agentChelatingMasking
Triethyl Citrate
Fragrance, Plasticizer
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragrancePlasticizerAntioxidantDeodorantMaskingSolvent
Sodium Benzoate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservativeAnticorrosiveMasking
Centella Asiatica Leaf Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Skin conditioning
Sorbic Acid
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservative
Saccharomyces Cerevisiae Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Galactomyces Ferment Filtrate
Humectant
Limited public safety data.Read moreShow less
EWG N/A Humectant Fungal-acne trigger
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Methylparaben
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben

How to use

How to use

  • 1 Where it fits: Apply after toner and before moisturiser — thinnest to thickest.
  • 2 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

From the community

0
Reviews
0
Saved by users
0
In collections

Ratings & reviews

Write a Review
0.0
from 0 ratings

Used this product? Rate it in 10 seconds

Alternatives