UV Mild Milk SPF 50 PA++++

SKIN AQUA

Where to buy Possibly in stock

About this product

The SKIN AQUA UV Mild Milk SPF 50 PA++++ is a sunscreen. Our analysis of its 21 ingredients (16 low-risk) rates it Excellent (89/100). Based on its ingredients, it looks well-suited to dry skin.

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Sunscreen
Ingredients
21
Low-risk
16
Fragrance
Fragrance-free
Origin
Japan
SPF
50 · blocks 98.0% UVB · PA++++

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 7/3
Good for dry skin
Cetyl Alcohol Squalane Sodium Hyaluronate Triethylhexanoin Polyquaternium-51 Hydrolyzed Collagen Cyclomethicone
Caution for dry skin
Cetyl Alcohol Xanthan Gum PEG-60 Hydrogenated Castor Oil
Oily/Acne-Prone Skin No data
Sensitive Skin 0/7
Caution for sensitive skin
Cetyl Alcohol Arginine Triethylhexanoin PEG-60 Hydrogenated Castor Oil Methylparaben Phenoxyethanol Propylparaben

Ingredients list

21 total
Lower hazard (1) Higher hazard (7)
All21 Skin Conditioning11 Fragrance7 Emollient5 Hair Conditioning5 Viscosity Controlling5 Emulsion Stabilising5 Solvent4 Antistatic Agent4
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
6
Ethylhexyl Methoxycinnamate
(Uv Absorber, Uv Filter)
Bad for Oily Skin
Bad for Oily Skin
Bad for Sensitive Skin
Bad for Sensitive Skin
1
Ethylhexyl Triazone
(Uv Absorber, Uv Filter)
2
A
Cyclomethicone
(Antistatic Agent, Emollient, Hair Conditioning, Humectant, Solvent, Viscosity Controlling)
Silicone
Silicone
3
B
PEG-60 Hydrogenated Castor Oil
(Fragrance, Sufactant, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
A
Sodium Hyaluronate
(Skin Conditioning, Humectant)
Good for Dry Skin
Good for Dry Skin
1
A
Hydrolyzed Collagen
(Hair Conditioning, Nail Conditioning Agent, Skin Conditioning, Antistatic Agent, Emollient, Film Forming, Humectant)
1
A
Arginine
(Fragrance, Hair Conditioning, Skin Conditioning, Antistatic Agent, Masking)
1
A
Squalane
(Emollient, Hair Conditioning, Refatting, Skin Conditioning)
1
Polyquaternium-51
(Film Forming, Humectant, Skin Conditioning)
1
A
Triethylhexanoin
(Fragrance, Hair Conditioning, Antistatic Agent, Emollient, Masking, Refatting, Skin Conditioning, Solvent)
1
A
1,2-Hexanediol
(Solvent)
1
A
Cetyl Alcohol
(Emulsion Stabilising, Fragrance, Opacifying, Emulsifying, Surfactant, Foam Boosting, Viscosity Increasing Agent, Emollient, Masking, Viscosity Controlling)
1
Acrylates/C10-30 Alkyl Acrylate Crosspolymer
(Emulsion Stabilising, Film Forming, Viscosity Controlling)
1
A
Xanthan Gum
(Binding Agent, Emulsion Stabilising, Skin Conditioning, Surfactant Emulsifying Agent, Viscosity Increasing Agent, Binding, Gel Forming, Viscosity Controlling)
2
Diethylamino Hydroxybenzoyl Hexyl Benzoate
(Uv Absorber, Uv Filter)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
Melaleuca Alternifolia Leaf Oil
(Antioxidant, Perfuming)
1
A
Disodium EDTA
(Chelating Agent, Viscosity Controlling)
7
A
Propylparaben
(Fragrance, Preservative, Perfuming)
Paraben
Paraben
4
A
Methylparaben
(Fragrance, Preservative)
Paraben
Paraben

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Ethylhexyl Methoxycinnamate
Uv Absorber, Uv Filter
Ethylhexyl Triazone
Uv Absorber, Uv Filter
Cyclomethicone
Emollient, Humectant
Sodium Hyaluronate
Skin Conditioning, Humectant
Hydrolyzed Collagen
Skin Conditioning, Emollient
Arginine
Skin Conditioning

Benefits

Good for dry skin

Concerns

Contains paraben
Contains silicone
Not fungal acne (malassezia) safe
Propylparaben — higher EWG
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Ethylhexyl Triazone
Uv absorber, Uv filter
Low-hazard ingredient.Read moreShow less
EWG 1 Uv absorberUv filter
Hydrolyzed Collagen
Hair conditioning, Nail conditioning agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Hair conditioningNail conditioning agentSkin conditioningAntistatic agentEmollientFilm formingHumectant
Arginine
Fragrance, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceHair conditioningSkin conditioningAntistatic agentMasking
Squalane
Emollient, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmollientHair conditioningRefattingSkin conditioning
Polyquaternium-51
Film forming, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 Film formingHumectantSkin conditioning
Triethylhexanoin
Fragrance, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceHair conditioningAntistatic agentEmollientMaskingRefattingSkin conditioningSolvent
1,2-Hexanediol
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Solvent
Cetyl Alcohol
Emulsion stabilising, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Emulsion stabilisingFragranceOpacifyingEmulsifyingSurfactantFoam boostingViscosity increasing agentEmollientMaskingViscosity controlling
Acrylates/C10-30 Alkyl Acrylate Crosspolymer
Emulsion stabilising, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 Emulsion stabilisingFilm formingViscosity controlling
Xanthan Gum
Binding agent, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Binding agentEmulsion stabilisingSkin conditioningSurfactant -emulsifying agentViscosity increasing agentBindingGel formingViscosity controlling
Diethylamino Hydroxybenzoyl Hexyl Benzoate
Uv absorber, Uv filter
Low-hazard ingredient.Read moreShow less
EWG 2 Uv absorberUv filter
Melaleuca Alternifolia Leaf Oil
Antioxidant, Perfuming
Limited public safety data.Read moreShow less
EWG N/A AntioxidantPerfuming
Disodium EDTA
Chelating agent, Viscosity controlling
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentViscosity controlling
Ethylhexyl Methoxycinnamate
Uv absorber, Uv filter
Potentially a skin irritantRead moreShow less
EWG 6 Uv absorberUv filter Bad for Oily SkinBad for Sensitive Skin
Cyclomethicone
Antistatic agent, Emollient
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Antistatic agentEmollientHair conditioningHumectantSolventViscosity controlling Silicone
PEG-60 Hydrogenated Castor Oil
Fragrance, Sufactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B FragranceSufactantSurfactant Fungal-acne trigger
Sodium Hyaluronate
Skin conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningHumectant Good for Dry Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Propylparaben
Fragrance, Preservative
Higher-hazard ingredient.Read moreShow less
EWG 7 CIR A FragrancePreservativePerfuming Paraben
Methylparaben
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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