Medicated Cica Remover Cream

Slash

Medicated Cica Remover Cream

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About this product

The Slash Medicated Cica Remover Cream is a misc. Our analysis of its 21 ingredients (11 low-risk) rates it Excellent (96/100). Based on its ingredients, it looks well-suited to oily / acne-prone and dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
21
Low-risk
11
Fragrance
Contains fragrance
Origin
Japan

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 6/6
Good for dry skin
Cetearyl Alcohol Oleyl Alcohol Butylene Glycol Glycerin Scutellaria Baicalensis Root Extract Urea
Caution for dry skin
Centella Asiatica Extract Glycerin Scutellaria Baicalensis Root Extract Sodium Hydroxide PPG-8-Ceteth-20 Sodium Methyl Myristoyl Taurate
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Scutellaria Baicalensis Root Extract
Sensitive Skin 3/4
Good for sensitive skin
Centella Asiatica Extract Glycerin Scutellaria Baicalensis Root Extract
Caution for sensitive skin
Oleyl Alcohol Butylene Glycol Glycerin Phenoxyethanol

Ingredients list

21 total
Lower hazard (1) Higher hazard (4)
All21 Skin Conditioning10 Humectant6 Solvent5 Fragrance5 Viscosity Controlling3 Emulsifying3 Soothing3 Perfuming3
EWG CIR Ingredient Name & Cosmetic Functions Notes
4
Calcium Thioglycolate
(Depilatory, Exfoliant, Keratolytic, Reducing)
3
A
Urea
(Buffering Agent, Humectant, Antistatic Agent, Skin Conditioning)
Glycine Soja Extract
(Skin Conditioning)
1
B
Centella Asiatica Extract
(Cleansing, Skin Conditioning, Smoothing, Soothing, Tonic)
1
Scutellaria Baicalensis Root Extract
(Astringent, Humectant, Soothing)
1
Houttuynia Cordata Extract
(Skin Conditioning)
glycyrrhiza glabra root extract
(Bleaching, Perfuming, Skin Conditioning, Skin Conditioning Emollient, Smoothing, Soothing)
Camellia Sinensis Extract
(Antioxidant, Bleaching, Skin Conditioning)
rosmarinus officinalis extract
(Antimicrobial, Refreshing, Tonic)
Chamomilla Recutita Extract
(Skin Conditioning)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
Sodium Methyl Myristoyl Taurate
(Cleansing, Foaming, Surfactant)
1
A
Oleyl Alcohol
(Fragrance, Skin Conditioning, Emollient, Solvent, Viscosity Increasingagent Nonaqueous, Emulsifying, Opacifying, Viscosity Controlling)
Bad for Oily Skin
Bad for Oily Skin
1
A
Cetearyl Alcohol
(Emulsion Stabilising, Opacifying, Foam Boosting, Viscosity Increasingagent Aqueous, Viscosity Increasing Agent, Emollient, Emulsifying, Viscosity Controlling)
3
PPG-8-Ceteth-20
(Emulsifying, Surfactant)
PARAFFINUM LIQUIDUM
(Antistatic, Skin Conditioning Emollient, Skin Protecting, Solvent)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
3
B
Sodium Hydroxide
(Denaturant, Ph Adjuster, Buffering Agent)
1
Water
(Solvent)
PARFUM
(Fragrance, Perfuming)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Calcium Thioglycolate
Exfoliant
Urea
Humectant, Skin Conditioning
Glycine Soja Extract
Skin Conditioning
Centella Asiatica Extract
Skin Conditioning, Soothing
Scutellaria Baicalensis Root Extract
Astringent, Humectant
Houttuynia Cordata Extract
Skin Conditioning

Benefits

Good for oily/acne-prone skin

Concerns

Contains paraben
Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Calcium Thioglycolate
Depilatory, Exfoliant
Low-to-moderate hazard.Read moreShow less
EWG 4 DepilatoryExfoliantKeratolyticReducing
Urea
Buffering agent, Humectant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Buffering agentHumectantAntistatic agentSkin conditioning
Glycine Soja Extract
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Centella Asiatica Extract
Cleansing, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingSkin conditioningSmoothingSoothingTonic
Scutellaria Baicalensis Root Extract
Astringent, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 AstringentHumectantSoothing
Houttuynia Cordata Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
glycyrrhiza glabra root extract
Bleaching, Perfuming
Limited public safety data.Read moreShow less
EWG N/A BleachingPerfumingSkin conditioningSkin conditioning emollientSmoothingSoothing
Camellia Sinensis Extract
Antioxidant, Bleaching
Limited public safety data.Read moreShow less
EWG N/A AntioxidantBleachingSkin conditioning
rosmarinus officinalis extract
Antimicrobial, Refreshing
Limited public safety data.Read moreShow less
EWG N/A AntimicrobialRefreshingTonic
Chamomilla Recutita Extract
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Sodium Methyl Myristoyl Taurate
Cleansing, Foaming
Limited public safety data.Read moreShow less
EWG N/A CleansingFoamingSurfactant
Cetearyl Alcohol
Emulsion stabilising, Opacifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Emulsion stabilisingOpacifyingFoam boostingViscosity increasingagent - aqueousViscosity increasing agentEmollientEmulsifyingViscosity controlling
PPG-8-Ceteth-20
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 EmulsifyingSurfactant
PARAFFINUM LIQUIDUM
Antistatic, Skin conditioning emollient
Limited public safety data.Read moreShow less
EWG N/A AntistaticSkin conditioning emollientSkin protectingSolvent
Sodium Hydroxide
Denaturant, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B DenaturantPh adjusterBuffering agent
+ 2 more — see the full ingredients list above
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Oleyl Alcohol
Fragrance, Skin conditioning
Potentially comedogenic - can block poresRead moreShow less
EWG 1 CIR A FragranceSkin conditioningEmollientSolventViscosity increasingagent - nonaqueousEmulsifyingOpacifyingViscosity controlling Bad for Oily Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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