Studio 35 Cleansing Towelettes

Studio 35

Studio 35 Cleansing Towelettes

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About this product

The Studio 35 Cleansing Towelettes is a cleanser. Our analysis of its 16 ingredients (12 low-risk) rates it Excellent (82/100). Based on its ingredients, it looks well-suited to dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Cleansers
Ingredients
16
Low-risk
12
Fragrance
Contains fragrance
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

PH Level

(Know the PH? Submit it here! )

N/A - No submissions yet

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 5/3
Good for dry skin
Glyceryl Stearate Cetyl Palmitate Ethylhexyl Palmitate Octyldodecanol Dimethicone
Caution for dry skin
Ceteth-2 Ceteareth-25 Polysorbate 20
Oily/Acne-Prone Skin No data
Sensitive Skin 1/7
Good for sensitive skin
Dimethicone
Caution for sensitive skin
Cetyl Palmitate Ethylhexyl Palmitate Octyldodecanol Citric Acid Phenoxyethanol DMDM Hydantoin Fragrance

Ingredients list

16 total
Lower hazard (1) Higher hazard (8)
All16 Skin Conditioning5 Fragrance5 Emollient5 Emulsifying4 Film Forming3 Surfactant3 Preservative3 Masking3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
A
Guar Hydroxypropyltrimonium Chloride
(Antistatic Agent, Hair Conditioning, Viscosity Increasing Agent, Film Forming, Skin Conditioning, Viscosity Controlling)
3
B
Polysorbate 20
(Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
7
A
DMDM Hydantoin
(Preservative)
4
6
B
Iodopropynyl Butylcarbamate
(Preservative)
3
A
Polyquaternium-7
(Antistatic Agent, Film Forming, Hair Fixing)
2
Ceteth-2
(Emulsifying, Surfactant)
3
B
Ceteareth-25
(Cleansing, Emulsifying, Surfactant)
1
A
Glyceryl Stearate
(Emollient, Emulsifying)
Fungal Acne
Fungal Acne Trigger
1
A
Octyldodecanol
(Fragrance, Skin Conditioning, Emollient, Perfuming, Solvent)
3
A
Dimethicone
(Antifoaming Agent, Skin Protecting, Emollient, Skin Conditioning)
Silicone
Silicone
1
B
Cetyl Palmitate
(Fragrance, Emollient, Masking, Skin Conditioning)
1
B
Ethylhexyl Palmitate
(Fragrance, Skin Conditioning, Emollient, Perfuming)
Fungal Acne
Fungal Acne Trigger
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
8
Fragrance
(Deodorant, Masking, Perfuming)

My Ingredient Notes

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Key ingredients

Guar Hydroxypropyltrimonium Chloride
Skin Conditioning
Glyceryl Stearate
Emollient
Octyldodecanol
Skin Conditioning, Emollient
Dimethicone
Skin Protecting, Emollient
Cetyl Palmitate
Emollient, Skin Conditioning
Ethylhexyl Palmitate
Skin Conditioning, Emollient

Benefits

Good for dry skin

Concerns

Contains paraben
Contains silicone
Not fungal acne (malassezia) safe
DMDM Hydantoin — higher EWG
Fragrance — higher EWG
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Guar Hydroxypropyltrimonium Chloride
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningViscosity increasing agentFilm formingSkin conditioningViscosity controlling
Polyquaternium-7
Antistatic agent, Film forming
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Antistatic agentFilm formingHair fixing
Ceteth-2
Emulsifying, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 2 EmulsifyingSurfactant
Ceteareth-25
Cleansing, Emulsifying
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B CleansingEmulsifyingSurfactant
Octyldodecanol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningEmollientPerfumingSolvent
Cetyl Palmitate
Fragrance, Emollient
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B FragranceEmollientMaskingSkin conditioning
Polysorbate 20
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant Fungal-acne trigger
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
DMDM Hydantoin
Preservative
Higher-hazard ingredient.Read moreShow less
EWG 7 CIR A Preservative
Iodopropynyl Butylcarbamate
Preservative
Moderate-hazard ingredient.Read moreShow less
EWG 4–6 CIR B Preservative
Glyceryl Stearate
Emollient, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmollientEmulsifying Fungal-acne trigger
Dimethicone
Antifoaming agent, Skin protecting
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Antifoaming agentSkin protectingEmollientSkin conditioning Silicone
Ethylhexyl Palmitate
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B FragranceSkin conditioningEmollientPerfuming Fungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Fragrance
Deodorant, Masking
Higher-hazard ingredient.Read moreShow less
EWG 8 DeodorantMaskingPerfuming

How to use

How to use

  • 1 Where it fits: Use as the first step, on clean hands, before the rest of your routine.
  • 2 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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