Studio 35 Coconut Moisture Face Mask

Studio 35

Studio 35 Coconut Moisture Face Mask

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About this product

The Studio 35 Coconut Moisture Face Mask is a moisturizer. Our analysis of its 20 ingredients (18 low-risk) rates it Excellent (90/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Moisturizers
Ingredients
20
Low-risk
18
Fragrance
Contains fragrance
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 3/5
Good for dry skin
Glucose Cetyl Palmitate Glycerin
Caution for dry skin
Sorbitan Olivate Sorbitan Palmitate Kaolin Glycerin Bentonite
Oily/Acne-Prone Skin No data
Sensitive Skin 2/7
Good for sensitive skin
Kaolin Glycerin
Caution for sensitive skin
Cetyl Palmitate Sodium Chloride Glycerin Cocos Nucifera (Coconut) Water Citric Acid Coumarin Fragrance

Ingredients list

20 total
Lower hazard (1) Higher hazard (8)
All20 Masking6 Fragrance5 Humectant4 Stabilising3 Skin Conditioning3 Bulking Agent3 Hair Conditioning3 Surfactant2
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
A
Kaolin
(Abrasive, Absorbent, Anticaking Agent, Bulking Agent, Opacifying, Skin Protecting, Slip Modifier)
2
A
Bentonite
(Absorbent, Bulking Agent, Emulsion Stabilising, Opacifying, Suspending Agent Nonsurfactant, Viscosity Increasing Agent, Viscosity Controlling)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
B
Cetearyl Olivate
(Hair Conditioning)
1
A
Sorbitan Olivate
(Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
A
Butyrospermum Parkii (Shea) Butter Bad for Oily Skin
Bad for Oily Skin
Fungal Acne
Fungal Acne Trigger
1
A
Theobroma Cacao (Cocoa) Seed Butter Bad for Oily Skin
Bad for Oily Skin
1
B
Cetyl Palmitate
(Fragrance, Emollient, Masking, Skin Conditioning)
1
Cocos Nucifera (Coconut) Water
(Fragrance, Masking)
1
A
Sorbitan Palmitate
(Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
A
Glucose
(Flavoring Agent, Humectant, Skin Conditioning Agent Miscellaneous)
8
Fragrance
(Deodorant, Masking, Perfuming)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
7
Coumarin
(Fragrance, Masking)
Allergens
Allergens
2
Potassium Iodide
(Antimicrobial)
1
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling)
1
Potassium Thiocyanate
(Stabilising)
1
Lactoperoxidase
(Skin Conditioning, Stabilising)
1
Glucose Oxidase
(Hair Conditioning, Skin Conditioning, Stabilising)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Kaolin
Skin Protecting
Glycerin
Humectant, Skin Protecting
Cetyl Palmitate
Emollient, Skin Conditioning
Glucose
Humectant
Lactoperoxidase
Skin Conditioning
Glucose Oxidase
Skin Conditioning

Benefits

No standout benefits flagged for this product.

Concerns

Contains eu allergen
Not fungal acne (malassezia) safe
Fragrance — higher EWG
Coumarin — higher EWG
May not suit dry skin
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Kaolin
Abrasive, Absorbent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A AbrasiveAbsorbentAnticaking agentBulking agentOpacifyingSkin protectingSlip modifier
Bentonite
Absorbent, Bulking agent
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A AbsorbentBulking agentEmulsion stabilisingOpacifyingSuspending agent -nonsurfactantViscosity increasing agentViscosity controlling
Cetearyl Olivate
Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioning
Cetyl Palmitate
Fragrance, Emollient
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B FragranceEmollientMaskingSkin conditioning
Cocos Nucifera (Coconut) Water
Fragrance, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 FragranceMasking
Glucose
Flavoring agent, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Flavoring agentHumectantSkin-conditioning agent- miscellaneous
Potassium Iodide
Antimicrobial
Low-hazard ingredient.Read moreShow less
EWG 2 Antimicrobial
Sodium Chloride
Bulking agent, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 Bulking agentMaskingOral care agentViscosity controlling
Potassium Thiocyanate
Stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 Stabilising
Lactoperoxidase
Skin conditioning, Stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioningStabilising
Glucose Oxidase
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Hair conditioningSkin conditioningStabilising
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Sorbitan Olivate
Emulsifying, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmulsifyingSurfactant Fungal-acne trigger
Butyrospermum Parkii (Shea) Butter
Other
Potentially comedogenic - can block poresRead moreShow less
EWG 1 CIR A Bad for Oily SkinFungal-acne trigger
Theobroma Cacao (Cocoa) Seed Butter
Other
Potentially comedogenic - can block poresRead moreShow less
EWG 1 CIR A Bad for Oily Skin
Sorbitan Palmitate
Emulsifying, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmulsifyingSurfactant Fungal-acne trigger
Fragrance
Deodorant, Masking
Higher-hazard ingredient.Read moreShow less
EWG 8 DeodorantMaskingPerfuming
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Coumarin
Fragrance, Masking
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceMasking Allergens

How to use

How to use

  • 1 Where it fits: Apply near the end of your routine, after thinner serums.
  • 2 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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