Scalp Mist SPF 30

Sun Bum

Where to buy Possibly in stock

About this product

The Sun Bum Scalp Mist SPF 30 is a sunscreen. Our analysis of its 14 ingredients (8 low-risk) rates it Excellent (90/100). Based on its ingredients, it looks well-suited to oily / acne-prone and dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Sunscreen
Ingredients
14
Low-risk
8
Fragrance
Contains fragrance
Origin
United States
SPF
30 · blocks 96.7% UVB

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe Minimal Ingredients

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 3/2
Good for dry skin
Algae Extract Caprylic/Capric Triglyceride Glycerin
Caution for dry skin
Glycerin Alcohol Denat.
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Alcohol Denat.
Sensitive Skin 2/5
Good for sensitive skin
Glycerin Laminaria Digitata Extract
Caution for sensitive skin
Algae Extract Caprylic/Capric Triglyceride Glycerin Alcohol Denat. Homosalate

Ingredients list

14 total
Lower hazard (1) Higher hazard (4)
All14 Skin Conditioning8 Uv Absorber5 Fragrance4 Uv Filter4 Solvent4 Perfuming3 Humectant3 Skin Protecting2
EWG CIR Ingredient Name & Cosmetic Functions Notes
4
Homosalate
(Fragrance, Sunscreen Agent, Uv Absorber, Skin Conditioning, Uv Filter)
4
Ethylhexyl Salicylate
(Uv Absorber, Uv Filter)
3
Octocrylene
(Sunscreen Agent, Uv Absorber, Uv Filter)
2
Butyl Methoxydibenzoylmethane
(Uv Absorber, Uv Filter)
4
Alcohol Denat.
(Antifoaming Agent, Antimicrobial, Astringent, Masking, Solvent, Viscosity Controlling)
Bad for Dry Skin
Bad for Dry Skin
Bad for Sensitive Skin
Bad for Sensitive Skin
1
Acrylates/Octylacrylamide Copolymer
(Film Forming, Hair Fixing)
Polyester-8
(Film Forming, Skin Conditioning)
1
B
Butyloctyl Salicylate
(Hair Conditioning, Skin Conditioning, Solvent)
1
Algae Extract
(Fragrance, Humectant, Oral Care Agent, Skin Conditioning, Emollient)
1
Laminaria Digitata Extract
(Skin Protecting)
Helianthus Annuus Seed Extract
(Skin Conditioning)
1
A
Caprylic/Capric Triglyceride
(Emollient, Masking, Perfuming, Skin Conditioning, Solvent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
PARFUM
(Fragrance, Perfuming)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Homosalate
Uv Absorber, Skin Conditioning
Ethylhexyl Salicylate
Uv Absorber, Uv Filter
Octocrylene
Uv Absorber, Uv Filter
Butyl Methoxydibenzoylmethane
Uv Absorber, Uv Filter
Alcohol Denat.
Astringent
Polyester-8
Skin Conditioning

Benefits

Good for dry skin
Good for oily/acne-prone skin

Concerns

Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Homosalate
Fragrance, Sunscreen agent
Low-to-moderate hazard.Read moreShow less
EWG 4 FragranceSunscreen agentUv absorberSkin conditioningUv filter
Ethylhexyl Salicylate
Uv absorber, Uv filter
Low-to-moderate hazard.Read moreShow less
EWG 4 Uv absorberUv filter
Octocrylene
Sunscreen agent, Uv absorber
Low-to-moderate hazard.Read moreShow less
EWG 3 Sunscreen agentUv absorberUv filter
Butyl Methoxydibenzoylmethane
Uv absorber, Uv filter
Low-hazard ingredient.Read moreShow less
EWG 2 Uv absorberUv filter
Acrylates/Octylacrylamide Copolymer
Film forming, Hair fixing
Low-hazard ingredient.Read moreShow less
EWG 1 Film formingHair fixing
Polyester-8
Film forming, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Film formingSkin conditioning
Butyloctyl Salicylate
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningSkin conditioningSolvent
Algae Extract
Fragrance, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 FragranceHumectantOral care agentSkin conditioningEmollient
Laminaria Digitata Extract
Skin protecting
Low-hazard ingredient.Read moreShow less
EWG 1 Skin protecting
Helianthus Annuus Seed Extract
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Caprylic/Capric Triglyceride
Emollient, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A EmollientMaskingPerfumingSkin conditioningSolvent
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Alcohol Denat.
Antifoaming agent, Antimicrobial
Causes moisture evaporation - prone to dry out skinRead moreShow less
EWG 4 Antifoaming agentAntimicrobialAstringentMaskingSolventViscosity controlling Bad for Dry SkinBad for Sensitive Skin
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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