Green Flavonoid 2.5 Solution

THE LAB by blanc doux

Where to buy Possibly in stock

About this product

THE LAB by blanc doux Green Flavonoid 2.5 Solution is a toner. Our analysis of its 18 ingredients (17 low-risk) rates it Excellent (100/100). Based on its ingredients, it looks well-suited to dry skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Toners
Ingredients
18
Low-risk
17
Fragrance
Fragrance-free
Origin
South Korea

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 3/3
Good for dry skin
Glucosyl Hesperidin Butylene Glycol Glycerin
Caution for dry skin
Centella Asiatica Extract Glycerin Hydrogenated Lecithin
Oily/Acne-Prone Skin No data
Sensitive Skin 3/5
Good for sensitive skin
Centella Asiatica Extract Glycerin Hydroxyacetophenone
Caution for sensitive skin
Citrus Unshiu Peel Extract Sodium Citrate Butylene Glycol Glycerin Citric Acid

Ingredients list

18 total
Lower hazard (1) Higher hazard (2)
All18 Skin Conditioning11 Solvent6 Humectant5 Masking4 Fragrance3 Viscosity Controlling3 Ph Adjuster2 Buffering Agent2
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
Methylpropanediol
(Solvent)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
A
1,2-Hexanediol
(Solvent)
1
Propanediol
(Solvent, Viscosity Decreasing Agent, Viscosity Controlling)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
Portulaca Oleracea Extract
(Skin Conditioning)
1
B
Citrus Unshiu Peel Extract
(Masking)
1
Glucosyl Hesperidin
(Humectant, Skin Conditioning)
1
B
Centella Asiatica Extract
(Cleansing, Skin Conditioning, Smoothing, Soothing, Tonic)
Ficus Carica Fruit Extract
(Humectant)
2
A
Hydrogenated Lecithin
(Skin Conditioning, Emulsifying, Surfactant, Suspending Agent Nonsurfactant)
1
A
Sodium Citrate
(Ph Adjuster, Buffering Agent, Chelating, Masking)
1
Ceramide NP
(Hair Conditioning, Skin Conditioning)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Disodium EDTA
(Chelating Agent, Viscosity Controlling)
1
Hydroxyacetophenone
(Antioxidant)
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Butylene Glycol
Skin Conditioning, Humectant
Glycerin
Humectant, Skin Protecting
Portulaca Oleracea Extract
Skin Conditioning
Glucosyl Hesperidin
Humectant, Skin Conditioning
Centella Asiatica Extract
Skin Conditioning, Soothing
Ficus Carica Fruit Extract
Humectant

Benefits

No standout benefits flagged for this product.

Concerns

Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Methylpropanediol
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
1,2-Hexanediol
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Solvent
Propanediol
Solvent, Viscosity decreasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 SolventViscosity decreasing agentViscosity controlling
Portulaca Oleracea Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Citrus Unshiu Peel Extract
Masking
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Masking
Glucosyl Hesperidin
Humectant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 HumectantSkin conditioning
Centella Asiatica Extract
Cleansing, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingSkin conditioningSmoothingSoothingTonic
Ficus Carica Fruit Extract
Humectant
Limited public safety data.Read moreShow less
EWG N/A Humectant
Hydrogenated Lecithin
Skin conditioning, Emulsifying
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Skin conditioningEmulsifyingSurfactantSuspending agent- nonsurfactant
Sodium Citrate
Ph adjuster, Buffering agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Ph adjusterBuffering agentChelatingMasking
Ceramide NP
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Hair conditioningSkin conditioning
Disodium EDTA
Chelating agent, Viscosity controlling
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentViscosity controlling
Hydroxyacetophenone
Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 Antioxidant
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Where it fits: Use right after cleansing, before serums.
  • 2 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Officially notified as a cosmetic in Malaysia (NPRA). Government registration record.

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