Premium Goat Milk Body Wash

TONYMOLY

Premium Goat Milk Body Wash

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About this product

The TONYMOLY Premium Goat Milk Body Wash is a misc. Our analysis of its 24 ingredients (20 low-risk) rates it Excellent (100/100). Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
24
Low-risk
20
Fragrance
Contains fragrance
Origin
South Korea

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 3/5
Good for dry skin
Sodium Hyaluronate Glycerin Tetradecene
Caution for dry skin
Lauryl Glucoside Glycerin Coco-glucoside Sodium C14-16 Olefin Sulfonate PEG-60 Hydrogenated Castor Oil
Oily/Acne-Prone Skin No data
Sensitive Skin 2/5
Good for sensitive skin
Glycerin Hydroxyacetophenone
Caution for sensitive skin
Sodium Chloride Glycerin Citric Acid Benzoic Acid PEG-60 Hydrogenated Castor Oil

Ingredients list

24 total
Lower hazard (1) Higher hazard (3)
All24 Skin Conditioning10 Solvent5 Fragrance5 Surfactant4 Hair Conditioning4 Viscosity Controlling3 Masking3 Humectant3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
2
B
Sodium C14-16 Olefin Sulfonate
(Cleansing, Foaming, Surfactant)
Sulfate
Sulfate
1
B
Lauryl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
B
Lauryl Glucoside
(Cleansing, Surfactant)
2
B
Disodium Laureth Sulfosuccinate
(Sufactant, Foam Boosting, Hydrotrope, Foaming)
1
Sodium Chloride
(Bulking Agent, Masking, Oral Care Agent, Viscosity Controlling)
3
B
PEG-60 Hydrogenated Castor Oil
(Fragrance, Sufactant, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
Hydroxyacetophenone
(Antioxidant)
Tetradecene
(Emollient, Solvent, Viscosity Controlling)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
Hexadecene
(Solvent)
2
A
Styrene/Acrylates Copolymer
(Film Forming, Opacifying)
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
1
A
Disodium EDTA
(Chelating Agent, Viscosity Controlling)
1
B
Coco-glucoside
(Cleansing, Foaming, Surfactant)
1
A
1,2-Hexanediol
(Solvent)
Goat Milk Extract
(Not Reported)
1
A
Panthenol
(Antistatic Agent, Hair Conditioning, Skin Conditioning)
Good for Dry Skin
Good for Dry Skin
3
A
Benzoic Acid
(Fragrance, Ph Adjuster, Preservative, Bulking Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
Ceramide NP
(Hair Conditioning, Skin Conditioning)
1
Propolis Extract
(Skin Conditioning)
1
A
Sodium Hyaluronate
(Skin Conditioning, Humectant)
Good for Dry Skin
Good for Dry Skin
PARFUM
(Fragrance, Perfuming)

My Ingredient Notes

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Key ingredients

Lauryl Betaine
Skin Conditioning
Glycerin
Humectant, Skin Protecting
Hydroxyacetophenone
Antioxidant
Tetradecene
Emollient
Ethylhexylglycerin
Skin Conditioning
Panthenol
Skin Conditioning

Benefits

No standout benefits flagged for this product.

Concerns

Contains sulfate
Not fungal acne (malassezia) safe
May not suit dry skin
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Lauryl Betaine
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agent
Lauryl Glucoside
Cleansing, Surfactant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingSurfactant
Disodium Laureth Sulfosuccinate
Sufactant, Foam boosting
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B SufactantFoam boostingHydrotropeFoaming
Sodium Chloride
Bulking agent, Masking
Low-hazard ingredient.Read moreShow less
EWG 1 Bulking agentMaskingOral care agentViscosity controlling
Hydroxyacetophenone
Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 Antioxidant
Tetradecene
Emollient, Solvent
Limited public safety data.Read moreShow less
EWG N/A EmollientSolventViscosity controlling
Hexadecene
Solvent
Limited public safety data.Read moreShow less
EWG N/A Solvent
Styrene/Acrylates Copolymer
Film forming, Opacifying
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Film formingOpacifying
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Disodium EDTA
Chelating agent, Viscosity controlling
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentViscosity controlling
Coco-glucoside
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingFoamingSurfactant
1,2-Hexanediol
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Solvent
Goat Milk Extract
Not reported
Limited public safety data.Read moreShow less
EWG N/A Not reported
Ceramide NP
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Hair conditioningSkin conditioning
+ 2 more — see the full ingredients list above
Sodium C14-16 Olefin Sulfonate
Cleansing, Foaming
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B CleansingFoamingSurfactant Sulfate
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
PEG-60 Hydrogenated Castor Oil
Fragrance, Sufactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B FragranceSufactantSurfactant Fungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Panthenol
Antistatic agent, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentHair conditioningSkin conditioning Good for Dry Skin
Benzoic Acid
Fragrance, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePh adjusterPreservativeBulking agentMasking Bad for Sensitive Skin
Sodium Hyaluronate
Skin conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningHumectant Good for Dry Skin

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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