Anti-Mark Serum with 14% PHA + Centella Asiatica

Typology

Anti-Mark Serum with 14% PHA + Centella Asiatica

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About this product

The Typology Anti-Mark Serum with 14% PHA + Centella Asiatica is a serums, essence, ampoule. Our analysis of its 14 ingredients (12 low-risk) rates it Excellent (100/100). Based on its ingredients, it looks well-suited to dry skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Serums, Essence, Ampoules
Ingredients
14
Low-risk
12
Fragrance
Fragrance-free
Origin
France

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe Minimal Ingredients

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 3/3
Good for dry skin
Gluconolactone Butylene Glycol Glycerin
Caution for dry skin
Xanthan Gum Glycerin Sodium Hydroxide
Oily/Acne-Prone Skin No data
Sensitive Skin 3/6
Good for sensitive skin
Asiaticoside Glycerin Centella Asiatica Leaf Cell Extract
Caution for sensitive skin
Gluconolactone Sodium Citrate Asiaticoside Butylene Glycol Glycerin Citric Acid

Ingredients list

14 total
Lower hazard (1) Higher hazard (3)
All14 Skin Conditioning12 Solvent5 Fragrance4 Humectant4 Masking3 Perfuming3 Ph Adjuster3 Buffering Agent3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
Gluconolactone
(Fragrance, Humectant, Solvent)
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
A
Pentylene Glycol
(Skin Conditioning, Solvent)
1
A
Sodium Citrate
(Ph Adjuster, Buffering Agent, Chelating, Masking)
3
B
Sodium Hydroxide
(Denaturant, Ph Adjuster, Buffering Agent)
Centella Asiatica Leaf Cell Extract
(Antioxidant, Skin Protecting)
1
Asiaticoside
(Antioxidant, Skin Conditioning, Perfuming)
1
Madecassic Acid
(Skin Conditioning)
glycyrrhiza glabra root extract
(Bleaching, Perfuming, Skin Conditioning, Skin Conditioning Emollient, Smoothing, Soothing)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
Asiatic Acid
(Skin Conditioning, Stabilising)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Xanthan Gum
(Binding Agent, Emulsion Stabilising, Skin Conditioning, Surfactant Emulsifying Agent, Viscosity Increasing Agent, Binding, Gel Forming, Viscosity Controlling)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Gluconolactone
Humectant
Butylene Glycol
Skin Conditioning, Humectant
Pentylene Glycol
Skin Conditioning
Centella Asiatica Leaf Cell Extract
Antioxidant, Skin Protecting
Asiaticoside
Antioxidant, Skin Conditioning
Madecassic Acid
Skin Conditioning

Benefits

No standout benefits flagged for this product.

Concerns

Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Gluconolactone
Fragrance, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 FragranceHumectantSolvent
Pentylene Glycol
Skin conditioning, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningSolvent
Sodium Citrate
Ph adjuster, Buffering agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Ph adjusterBuffering agentChelatingMasking
Sodium Hydroxide
Denaturant, Ph adjuster
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B DenaturantPh adjusterBuffering agent
Centella Asiatica Leaf Cell Extract
Antioxidant, Skin protecting
Limited public safety data.Read moreShow less
EWG N/A AntioxidantSkin protecting
Asiaticoside
Antioxidant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 AntioxidantSkin conditioningPerfuming
Madecassic Acid
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
glycyrrhiza glabra root extract
Bleaching, Perfuming
Limited public safety data.Read moreShow less
EWG N/A BleachingPerfumingSkin conditioningSkin conditioning emollientSmoothingSoothing
Asiatic Acid
Skin conditioning, Stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioningStabilising
Xanthan Gum
Binding agent, Emulsion stabilising
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Binding agentEmulsion stabilisingSkin conditioningSurfactant -emulsifying agentViscosity increasing agentBindingGel formingViscosity controlling
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Where it fits: Apply after toner and before moisturiser — thinnest to thickest.
  • 2 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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