Hydrating Shampoo

Überliss

Where to buy Possibly in stock

About this product

The Überliss Hydrating Shampoo is a emulsion. Our analysis of its 26 ingredients (14 low-risk) rates it Excellent (85/100). Based on its ingredients, it looks well-suited to oily / acne-prone and dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Emulsion
Ingredients
26
Low-risk
14
Fragrance
Contains fragrance
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 5/4
Good for dry skin
Betaine Caprylyl Glycol Glycerin Hydroxypropyl Bispalmitamide MEA Camellia Sinensis Leaf Extract
Caution for dry skin
Glycerin Camellia Sinensis Leaf Extract PEG-100 Stearate Ceteareth-60 Myristyl Glycol
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Camellia Sinensis Leaf Extract
Sensitive Skin 2/9
Good for sensitive skin
Glycerin Camellia Sinensis Leaf Extract
Caution for sensitive skin
Glycerin Citric Acid Camellia Sinensis Leaf Extract Sodium Benzoate Phenoxyethanol Hexyl Cinnamal Benzyl Benzoate Benzyl Salicylate Ceteareth-60 Myristyl Glycol

Ingredients list

26 total
Lower hazard (1) Higher hazard (7)
All26 Skin Conditioning11 Fragrance9 Masking6 Foam Boosting6 Humectant6 Hair Conditioning4 Emollient3 Uv Absorber3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
4
B
Cocamidopropyl Betaine
(Antistatic Agent, Hair Conditioning, Skin Conditioning, Sufactant, Foam Boosting, Viscosity Increasing Agent, Viscosity Controlling)
2
B
Disodium Laureth Sulfosuccinate
(Sufactant, Foam Boosting, Hydrotrope, Foaming)
Ricinus Communis Seed Oil
(Fragrance, Perfuming, Skin Conditioning)
1
B
Betaine
(Hair Conditioning, Humectant, Antistatic Agent, Skin Conditioning, Viscosity Controlling)
1
Cocamide MIPA
(Foam Boosting, Viscosity Increasing Agent, Emulsifying, Emulsion Stabilising, Viscosity Controlling)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
Pyrus Malus Fruit Extract
(Skin Conditioning)
citrus limon peel extract
(Skin Conditioning, Skin Conditioning Emollient, Skin Protecting, Tonic)
Saccharum Officinarum Extract
(Moisturising, Skin Conditioning)
1
B
Camellia Sinensis Leaf Extract
(Antimicrobial, Antioxidant, Astringent, Emollient, Humectant, Masking, Oral Care Agent, Skin Conditioning, Skin Protecting, Tonic, Uv Absorber)
Good for Oily Skin
Good for Oily Skin
1
Hydroxypropyl Bispalmitamide MEA
(Skin Conditioning, Emollient)
Ceramide NG
(Skin Conditioning)
3
7
Ceteareth-60 Myristyl Glycol
(Emulsifying, Surfactant)
1
A
Polyquaternium-10
(Antistatic Agent, Film Forming, Hair Fixing)
2
A
Tetrasodium EDTA
(Chelating Agent)
PARFUM
(Fragrance, Perfuming)
2
Piroctone Olamine
(Cosmetic Biocide, Preservative)
1
A
Caprylyl Glycol
(Hair Conditioning, Skin Conditioning, Emollient, Humectant)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
3
A
PEG-100 Stearate
(Surfactant)
Fungal Acne
Fungal Acne Trigger
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
6
A
Benzyl Benzoate
(Fragrance, Solvent, Antimicrobial, Masking)
Allergens
Allergens
7
Benzyl Salicylate
(Fragrance, Uv Absorber, Masking)
Allergens
Allergens
5
Hexyl Cinnamal
(Fragrance, Masking)
Allergens
Allergens

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Cocamidopropyl Betaine
Skin Conditioning
Ricinus Communis Seed Oil
Skin Conditioning
Betaine
Humectant, Skin Conditioning
Glycerin
Humectant, Skin Protecting
Pyrus Malus Fruit Extract
Skin Conditioning
citrus limon peel extract
Skin Conditioning, Skin Protecting

Benefits

Good for dry skin
Good for oily/acne-prone skin

Concerns

Contains paraben
Contains eu allergen
Not fungal acne (malassezia) safe
Ceteareth-60 Myristyl Glycol — higher EWG
Benzyl Salicylate — higher EWG
May not suit sensitive skin

EWG flags hazard, not real-world risk — ratings don't account for how much of an ingredient a product contains. Treat these as things to research, not verdicts. How we score →

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Cocamidopropyl Betaine
Antistatic agent, Hair conditioning
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR B Antistatic agentHair conditioningSkin conditioningSufactantFoam boostingViscosity increasing agentViscosity controlling
Disodium Laureth Sulfosuccinate
Sufactant, Foam boosting
Low-hazard ingredient.Read moreShow less
EWG 2 CIR B SufactantFoam boostingHydrotropeFoaming
Ricinus Communis Seed Oil
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfumingSkin conditioning
Betaine
Hair conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningHumectantAntistatic agentSkin conditioningViscosity controlling
Cocamide MIPA
Foam boosting, Viscosity increasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 Foam boostingViscosity increasing agentEmulsifyingEmulsion stabilisingViscosity controlling
Pyrus Malus Fruit Extract
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
citrus limon peel extract
Skin conditioning, Skin conditioning emollient
Limited public safety data.Read moreShow less
EWG N/A Skin conditioningSkin conditioning emollientSkin protectingTonic
Saccharum Officinarum Extract
Moisturising, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A MoisturisingSkin conditioning
Hydroxypropyl Bispalmitamide MEA
Skin conditioning, Emollient
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioningEmollient
Ceramide NG
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
Polyquaternium-10
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Antistatic agentFilm formingHair fixing
Tetrasodium EDTA
Chelating agent
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Chelating agent
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Piroctone Olamine
Cosmetic biocide, Preservative
Low-hazard ingredient.Read moreShow less
EWG 2 Cosmetic biocidePreservative
+ 2 more — see the full ingredients list above
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Camellia Sinensis Leaf Extract
Antimicrobial, Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B AntimicrobialAntioxidantAstringentEmollientHumectantMaskingOral care agentSkin conditioningSkin protectingTonicUv absorber Good for Oily Skin
Ceteareth-60 Myristyl Glycol
Emulsifying, Surfactant
Higher-hazard ingredient.Read moreShow less
EWG 3–7 EmulsifyingSurfactant
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
PEG-100 Stearate
Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A Surfactant Fungal-acne trigger
Benzyl Benzoate
Fragrance, Solvent
Moderate-hazard ingredient.Read moreShow less
EWG 6 CIR A FragranceSolventAntimicrobialMasking Allergens
Benzyl Salicylate
Fragrance, Uv absorber
Higher-hazard ingredient.Read moreShow less
EWG 7 FragranceUv absorberMasking Allergens
Hexyl Cinnamal
Fragrance, Masking
Moderate-hazard ingredient.Read moreShow less
EWG 5 FragranceMasking Allergens

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

Trust & honesty

Officially notified as a cosmetic in Malaysia (NPRA). Government registration record.

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