Grow Tonic Transformative Treatment

Umberto Giannini

Grow Tonic Transformative Treatment

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About this product

The Umberto Giannini Grow Tonic Transformative Treatment is a misc. Our analysis of its 26 ingredients (18 low-risk) rates it Excellent (97/100). Based on its ingredients, it looks well-suited to oily / acne-prone and dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Misc
Ingredients
26
Low-risk
18
Fragrance
Contains fragrance
Origin
United Kingdom

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 3/3
Good for dry skin
Fucus Vesiculosus Extract Caprylyl Glycol Glycerin
Caution for dry skin
Glycerin Polysorbate 20 Alcohol Denat.
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Alcohol Denat.
Sensitive Skin 3/8
Good for sensitive skin
Fucus Vesiculosus Extract Glycerin Laminaria Digitata Extract
Caution for sensitive skin
Menthyl Lactate Caffeine Glycerin Citric Acid Sodium Benzoate Potassium Sorbate Alcohol Denat. Phenoxyethanol

Ingredients list

26 total
Lower hazard (1) Higher hazard (4)
All26 Skin Conditioning14 Fragrance9 Solvent5 Masking5 Preservative5 Skin Protecting4 Humectant3 Hair Conditioning3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
4
Alcohol Denat.
(Antifoaming Agent, Antimicrobial, Astringent, Masking, Solvent, Viscosity Controlling)
Bad for Dry Skin
Bad for Dry Skin
Bad for Sensitive Skin
Bad for Sensitive Skin
3
B
Polysorbate 20
(Emulsifying, Surfactant)
Fungal Acne
Fungal Acne Trigger
1
Menthyl Lactate
(Flavoring Agent, Fragrance, Masking, Refreshing)
1
B
Polyquaternium-37
(Antistatic Agent, Film Forming, Hair Fixing)
PARFUM
(Fragrance, Perfuming)
1
A
Pentylene Glycol
(Skin Conditioning, Solvent)
2
A
Chlorphenesin
(Cosmetic Biocide, Antimicrobial, Preservative)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
1
Caffeine
(Fragrance, Skin Conditioning, Masking)
1
B
Hydrolyzed Wheat Protein
(Film Forming, Hair Conditioning, Skin Conditioning, Antistatic Agent)
2
Piroctone Olamine
(Cosmetic Biocide, Preservative)
triticum vulgare bran extract
(Skin Conditioning, Skin Protecting)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
3
A
Sodium Benzoate
(Fragrance, Preservative, Anticorrosive, Masking)
Pisum Sativum Extract
(Skin Conditioning, Skin Protecting)
Coffea Arabica Seed Extract
(Fragrance, Skin Conditioning)
1
A
1,2-Hexanediol
(Solvent)
1
A
Caprylyl Glycol
(Hair Conditioning, Skin Conditioning, Emollient, Humectant)
Chondrus Crispus Extract
(Skin Conditioning, Viscosity Controlling)
1
Coffea Robusta Seed Extract
(Skin Conditioning)
1
Fucus Vesiculosus Extract
(Emollient, Skin Conditioning, Smoothing, Soothing)
1
Laminaria Digitata Extract
(Skin Protecting)
Maris Sal
(Skin Conditioning)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
3
A
Potassium Sorbate
(Fragrance, Preservative)

My Ingredient Notes

No personal ingredient notes yet. Save ingredients to your profile to get good/bad alerts here.

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Key ingredients

Alcohol Denat.
Astringent
Pentylene Glycol
Skin Conditioning
Glycerin
Humectant, Skin Protecting
Caffeine
Skin Conditioning
Hydrolyzed Wheat Protein
Skin Conditioning
triticum vulgare bran extract
Skin Conditioning, Skin Protecting

Benefits

Good for oily/acne-prone skin

Concerns

Contains paraben
Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Menthyl Lactate
Flavoring agent, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 1 Flavoring agentFragranceMaskingRefreshing
Polyquaternium-37
Antistatic agent, Film forming
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Antistatic agentFilm formingHair fixing
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Pentylene Glycol
Skin conditioning, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningSolvent
Chlorphenesin
Cosmetic biocide, Antimicrobial
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A Cosmetic biocideAntimicrobialPreservative
Caffeine
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 FragranceSkin conditioningMasking
Hydrolyzed Wheat Protein
Film forming, Hair conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Film formingHair conditioningSkin conditioningAntistatic agent
Piroctone Olamine
Cosmetic biocide, Preservative
Low-hazard ingredient.Read moreShow less
EWG 2 Cosmetic biocidePreservative
triticum vulgare bran extract
Skin conditioning, Skin protecting
Limited public safety data.Read moreShow less
EWG N/A Skin conditioningSkin protecting
Sodium Benzoate
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR A FragrancePreservativeAnticorrosiveMasking
Pisum Sativum Extract
Skin conditioning, Skin protecting
Limited public safety data.Read moreShow less
EWG N/A Skin conditioningSkin protecting
Coffea Arabica Seed Extract
Fragrance, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A FragranceSkin conditioning
1,2-Hexanediol
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Solvent
Caprylyl Glycol
Hair conditioning, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Hair conditioningSkin conditioningEmollientHumectant
+ 6 more — see the full ingredients list above
Alcohol Denat.
Antifoaming agent, Antimicrobial
Causes moisture evaporation - prone to dry out skinRead moreShow less
EWG 4 Antifoaming agentAntimicrobialAstringentMaskingSolventViscosity controlling Bad for Dry SkinBad for Sensitive Skin
Polysorbate 20
Emulsifying, Surfactant
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B EmulsifyingSurfactant Fungal-acne trigger
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin

How to use

How to use

  • 1 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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