Nail Polish Remover Solution

up&up

Nail Polish Remover Solution

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About this product

The up&up Nail Polish Remover Solution is a emulsion. Our analysis of its 10 ingredients (4 low-risk) rates it Excellent (96/100). Based on its ingredients, it looks well-suited to oily / acne-prone skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Emulsion
Ingredients
10
Low-risk
4
Fragrance
Contains fragrance
Origin
United States

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe Minimal Ingredients

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 1/3
Good for dry skin
Camellia Sinensis Leaf Extract
Caution for dry skin
Denatonium Benzoate Camellia Sinensis Leaf Extract Acetone
Oily/Acne-Prone Skin 1/0
Good for oily/acne-prone skin
Camellia Sinensis Leaf Extract
Sensitive Skin 1/3
Good for sensitive skin
Camellia Sinensis Leaf Extract
Caution for sensitive skin
Denatonium Benzoate Camellia Sinensis Leaf Extract Acetone

Ingredients list

10 total
Lower hazard (1) Higher hazard (4)
All10 Fragrance5 Skin Conditioning4 Perfuming3 Uv Absorber2 Masking2 Solvent2 Denaturant2 Hair Conditioning1
EWG CIR Ingredient Name & Cosmetic Functions Notes
3
Acetone
(Denaturant, Fragrance, Solvent)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
Water
(Solvent)
PERSEA GRATISSIMA OIL
(Skin Conditioning)
cocos nucifera oil
(Fragrance, Hair Conditioning, Perfuming, Skin Conditioning)
Olea Europaea Fruit Oil
(Fragrance, Perfuming, Skin Conditioning)
PARFUM
(Fragrance, Perfuming)
1
A
Denatonium Benzoate
(Denaturant, Fragrance, Masking)
Yellow 11
(Colorant)
1
B
Camellia Sinensis Leaf Extract
(Antimicrobial, Antioxidant, Astringent, Emollient, Humectant, Masking, Oral Care Agent, Skin Conditioning, Skin Protecting, Tonic, Uv Absorber)
Good for Oily Skin
Good for Oily Skin
4
A
Benzophenone-1
(Uv Absorber)

My Ingredient Notes

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Key ingredients

PERSEA GRATISSIMA OIL
Skin Conditioning
cocos nucifera oil
Skin Conditioning
Olea Europaea Fruit Oil
Skin Conditioning
Camellia Sinensis Leaf Extract
Antioxidant, Astringent
Benzophenone-1
Uv Absorber

Benefits

Fungal-acne (Malassezia) safe
Good for oily/acne-prone skin

Concerns

May not suit dry skin
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
PERSEA GRATISSIMA OIL
Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Skin conditioning
cocos nucifera oil
Fragrance, Hair conditioning
Limited public safety data.Read moreShow less
EWG N/A FragranceHair conditioningPerfumingSkin conditioning
Olea Europaea Fruit Oil
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfumingSkin conditioning
PARFUM
Fragrance, Perfuming
Limited public safety data.Read moreShow less
EWG N/A FragrancePerfuming
Denatonium Benzoate
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DenaturantFragranceMasking
Yellow 11
Colorant
Limited public safety data.Read moreShow less
EWG N/A Colorant
Benzophenone-1
Uv absorber
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A Uv absorber
Acetone
Denaturant, Fragrance
Low-to-moderate hazard.Read moreShow less
EWG 3 DenaturantFragranceSolvent Bad for Sensitive Skin
Camellia Sinensis Leaf Extract
Antimicrobial, Antioxidant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B AntimicrobialAntioxidantAstringentEmollientHumectantMaskingOral care agentSkin conditioningSkin protectingTonicUv absorber Good for Oily Skin

How to use

How to use

  • 1 Morning only: Apply as the last step of your AM routine, after moisturiser, and reapply every ~2 hours of sun exposure.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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