Moisture Toner

Village 11 Factory

Where to buy Possibly in stock

About this product

The Village 11 Factory Moisture Toner is a toner. Our analysis of its 24 ingredients (21 low-risk) rates it Excellent (98/100). Based on its ingredients, it looks well-suited to dry skin. Heads up: it contains fragrance, which can irritate sensitive or reactive skin.

Vegan-friendly Reef-safe

Summarised from our ingredient analysis — not brand marketing copy.

At a glance

Type
Toners
Ingredients
24
Low-risk
21
Fragrance
Contains fragrance
Origin
South Korea

The evidence

Quick Product Notes

Paraben-Free Sulfate-Free Alcohol-Free Silicone-Free EU Allergen-Free Fungal Acne (Malassezia) Safe

Notable Effects & Ingredients

No Notable Effects & Ingredients

Ingredients Related to Skin Types

Good   Bad — tap a skin type to see which ingredients · estimated from ingredient functions
Dry Skin 5/3
Good for dry skin
Betaine Salvia Hispanica Seed Extract Butylene Glycol Glycerin Polyquaternium-51
Caution for dry skin
Centella Asiatica Extract Glycerin PEG-40 Hydrogenated Castor Oil
Oily/Acne-Prone Skin No data
Sensitive Skin 2/7
Good for sensitive skin
Centella Asiatica Extract Glycerin
Caution for sensitive skin
Sodium Citrate Butylene Glycol Glycerin Citric Acid Potassium Sorbate PEG-40 Hydrogenated Castor Oil Phenoxyethanol

Ingredients list

24 total
Lower hazard (1) Higher hazard (4)
All24 Skin Conditioning15 Solvent8 Fragrance7 Humectant6 Viscosity Controlling4 Hair Conditioning3 Masking3 Perfuming3
EWG CIR Ingredient Name & Cosmetic Functions Notes
1
Water
(Solvent)
1
Methylpropanediol
(Solvent)
1
B
Betaine
(Hair Conditioning, Humectant, Antistatic Agent, Skin Conditioning, Viscosity Controlling)
1
A
Pentylene Glycol
(Skin Conditioning, Solvent)
1
Polyquaternium-51
(Film Forming, Humectant, Skin Conditioning)
2
A
Glycerin
(Denaturant, Fragrance, Hair Conditioning, Humectant, Oral Care Agent, Oral Health Care Drug, Skin Protecting, Viscosity Decreasing Agent, Perfuming, Solvent)
Good for Dry Skin
Good for Dry Skin
Fungal Acne
Fungal Acne Trigger
3
PEG/PPG-17/6 Copolymer
(Solvent)
3
B
PEG-40 Hydrogenated Castor Oil
(Fragrance, Emulsifying, Surfactant, Perfuming)
Fungal Acne
Fungal Acne Trigger
1
Salvia Hispanica Seed Extract
(Emollient, Skin Conditioning)
1
B
Centella Asiatica Extract
(Cleansing, Skin Conditioning, Smoothing, Soothing, Tonic)
1
Houttuynia Cordata Extract
(Skin Conditioning)
1
Bifida Ferment Lysate
(Skin Conditioning)
1
A
Sodium Citrate
(Ph Adjuster, Buffering Agent, Chelating, Masking)
1
Propanediol
(Solvent, Viscosity Decreasing Agent, Viscosity Controlling)
1
A
Ethylhexylglycerin
(Deodorant, Skin Conditioning)
2
A
Citric Acid
(Chelating Agent, Fragrance, Ph Adjuster, Buffering Agent, Masking)
Bad for Sensitive Skin
Bad for Sensitive Skin
1
A
Butylene Glycol
(Fragrance, Skin Conditioning, Solvent, Viscositydecreasing Agent, Humectant, Masking, Viscosity Controlling)
Good for Dry Skin
Good for Dry Skin
1
A
Disodium EDTA
(Chelating Agent, Viscosity Controlling)
Ceramide AP
(Hair Conditioning, Skin Conditioning)
1
A
1,2-Hexanediol
(Solvent)
3
A
Potassium Sorbate
(Fragrance, Preservative)
1
Harpagophytum Procumbens Root Extract
(Skin Conditioning)
4
A
Phenoxyethanol
(Fragrance, Preservative)
Paraben
Paraben
PARFUM
(Fragrance, Perfuming)

My Ingredient Notes

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Key ingredients

Betaine
Humectant, Skin Conditioning
Pentylene Glycol
Skin Conditioning
Polyquaternium-51
Humectant, Skin Conditioning
Glycerin
Humectant, Skin Protecting
Salvia Hispanica Seed Extract
Emollient, Skin Conditioning
Centella Asiatica Extract
Skin Conditioning, Soothing

Benefits

Good for dry skin

Concerns

Contains paraben
Not fungal acne (malassezia) safe
May not suit sensitive skin

Ingredients explained

Water
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Methylpropanediol
Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 Solvent
Betaine
Hair conditioning, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B Hair conditioningHumectantAntistatic agentSkin conditioningViscosity controlling
Pentylene Glycol
Skin conditioning, Solvent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Skin conditioningSolvent
Polyquaternium-51
Film forming, Humectant
Low-hazard ingredient.Read moreShow less
EWG 1 Film formingHumectantSkin conditioning
PEG/PPG-17/6 Copolymer
Solvent
Low-to-moderate hazard.Read moreShow less
EWG 3 Solvent
Salvia Hispanica Seed Extract
Emollient, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 EmollientSkin conditioning
Centella Asiatica Extract
Cleansing, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR B CleansingSkin conditioningSmoothingSoothingTonic
Houttuynia Cordata Extract
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Bifida Ferment Lysate
Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 Skin conditioning
Sodium Citrate
Ph adjuster, Buffering agent
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Ph adjusterBuffering agentChelatingMasking
Propanediol
Solvent, Viscosity decreasing agent
Low-hazard ingredient.Read moreShow less
EWG 1 SolventViscosity decreasing agentViscosity controlling
Ethylhexylglycerin
Deodorant, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A DeodorantSkin conditioning
Disodium EDTA
Chelating agent, Viscosity controlling
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A Chelating agentViscosity controlling
Ceramide AP
Hair conditioning, Skin conditioning
Limited public safety data.Read moreShow less
EWG N/A Hair conditioningSkin conditioning
+ 4 more — see the full ingredients list above
Glycerin
Denaturant, Fragrance
Low-hazard ingredient.Read moreShow less
EWG 2 CIR A DenaturantFragranceHair conditioningHumectantOral care agentOral health care drugSkin protectingViscosity decreasing agentPerfumingSolvent Good for Dry SkinFungal-acne trigger
PEG-40 Hydrogenated Castor Oil
Fragrance, Emulsifying
Low-to-moderate hazard.Read moreShow less
EWG 3 CIR B FragranceEmulsifyingSurfactantPerfuming Fungal-acne trigger
Citric Acid
Chelating agent, Fragrance
Skin irritation can occur at high concentrationRead moreShow less
EWG 2 CIR A Chelating agentFragrancePh adjusterBuffering agentMasking Bad for Sensitive Skin
Butylene Glycol
Fragrance, Skin conditioning
Low-hazard ingredient.Read moreShow less
EWG 1 CIR A FragranceSkin conditioningSolventViscositydecreasing agentHumectantMaskingViscosity controlling Good for Dry Skin
Phenoxyethanol
Fragrance, Preservative
Low-to-moderate hazard.Read moreShow less
EWG 4 CIR A FragrancePreservative Paraben

How to use

How to use

  • 1 Where it fits: Use right after cleansing, before serums.
  • 2 Morning & evening: Suitable for both AM and PM use.

General guidance from this product's category and active ingredients — always follow the directions on the package.

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